Liquid-crystalline medium

ABSTRACT

Liquid-crystalline medium contains at least one compound of formula I, 
     
       
         
         
             
             
         
       
     
     and at least one compound formulae ST-1 to ST-17 and the use thereof for an active-matrix display, in particular based on the VA, PSA, PA-VA, SS-VA, SA-VA, PS-VA, PALC, IPS, PS-IPS, UB-FFS, U-IPS, FFS or PS-FFS effect.

The invention relates to a liquid-crystalline medium which comprises at least one compound of the formula I,

in which

-   R¹ and R^(1*) each, independently of one another, denote H, an alkyl     or alkoxy radical having 1 to 15 C atoms, where, in addition, one or     more CH₂ groups in these radicals may each be replaced,     independently of one another, by —C≡C—, —CF₂O—, —OCF₂—, —CH═CH—,

—O—, —CO—O—, —O—CO— in such a way that O atoms are not linked directly to one another, and in which, in addition, one or more H atoms may be replaced by halogen,

-   A¹ and A¹* each, independently of one another, denote     -   a) a 1,4-cyclohexenylene or 1,4-cyclohexylene radical, in which         one or two non-adjacent CH₂ groups may be replaced by —O— or         —S—,     -   b) a 1,4-phenylene radical, in which one or two CH groups may be         replaced by N,     -   c) a radical from the group piperidine-1,4-diyl,         1,4-bicyclo[2.2.2]-octylene, naphthalene-2,6-diyl,         decahydronaphthalene-2,6-diyl,         1,2,3,4-tetrahydronaphthalene-2,6-diyl, phenanthrene-2,7-diyl         and fluorene-2,7-diyl,     -   where the radicals a), b) and c) may be mono- or polysubstituted         by halogen atoms, -   Z¹ and Z¹* each, independently of one another, denote —CO—O—,     —O—CO—, —CF₂O—, —OCF₂—, —CH₂O—, —OCH₂—, —CH₂—, —CH₂CH₂—, —(CH₂)₄—,     —CH═CH—CH₂O—, —C₂F₄—, —CH₂CF₂—, —CF₂CH₂—, —CF═CF—, —CH═CF—, —CF═CH—,     —CH═CH—, —C≡C— or a single bond, -   X denotes-S— or —O—, and -   L¹ and L² each, independently of one another, denote F, Cl, CF₃ or     CHF₂,

and at least one compound selected from the group of the compounds of the formulae ST,

in which

-   R^(ST) denotes H, an alkyl or alkoxy radical having 1 to 15 C atoms,     where, in addition, one or more CH₂ groups in these radicals may     each be replaced, independently of one another, by —C≡C—, —CF₂O—,     —OCF₂—, —CH═CH—,

—CO—O—, —O—CO— in such a way that O atoms are not linked directly to one another, and in which, in addition, one or more H atoms may be replaced by halogen,

-   Z^(ST) each, independently of one another, denote —CO—O—, —O—CO—,     —CF₂O—, —OCF₂—, —CH₂O—, —OCH₂—, —CH₂—, —CH₂CH₂—, —(CH₂)₄—,     —CH═CH—CH₂O—, —C₂F₄—, —CH₂CF₂—, —CF₂CH₂—, —CF═CF—, —CH═CF—, —CF═CH—,     —CH═CH—, —C≡C— or a single bond, -   L¹ and L² each, independently of one another, denote F, Cl, CF₃ or     CHF₂, -   p denotes 1 or 2, -   q denotes 1, 2, 3, 4, 5, 6, 7, 8, 9 or 10.

Media of this type can be used, in particular, for electro-optical displays having active-matrix addressing based on the ECB effect and for IPS (in-plane switching) displays or FFS (fringe field switching) displays.

The principle of electrically controlled birefringence, the ECB effect or also DAP (deformation of aligned phases) effect, was described for the first time in 1971 (M. F. Schieckel and K. Fahrenschon, “Deformation of nematic liquid crystals with vertical orientation in electrical fields”, Appl. Phys. Lett. 19 (1971), 3912). This was followed by papers by J. F. Kahn (Appl. Phys. Lett. 20 (1972), 1193) and G. Labrunie and J. Robert (J. Appl. Phys. 44 (1973), 4869).

The papers by J. Robert and F. Clerc (SID 80 Digest Techn. Papers (1980), 30), J. Duchene (Displays 7 (1986), 3) and H. Schad (SID 82 Digest Techn. Papers (1982), 244) showed that liquid-crystalline phases must have high values for the ratio of the elastic constants K₃/K₁, high values for the optical anisotropy An and values for the dielectric anisotropy of Δε≦−0.5 in order to be suitable for use in high-information display elements based on the ECB effect. Electro-optical display elements based on the ECB effect have a homeotropic edge alignment (VA technology=vertically aligned). Dielectrically negative liquid-crystal media can also be used in displays which use the so-called IPS or FFS effect.

Displays which use the ECB effect, as so-called VAN (vertically aligned nematic) displays, for example in the MVA (multi-domain vertical alignment, for example: Yoshide, H. et al., paper 3.1: “MVA LCD for Notebook or Mobile PCs . . . ”, SID 2004 International Symposium, Digest of Technical Papers, XXXV, Book I, pp. 6 to 9, and Liu, C. T. et al., paper 15.1: “A 46-inch TFT-LCD HDTV Technology . . . ”, SID 2004 International Symposium, Digest of Technical Papers, XXXV, Book II, pp. 750 to 753), PVA (patterned vertical alignment, for example: Kim, Sang Soo, paper 15.4: “Super PVA Sets New State-of-the-Art for LCD-TV”, SID 2004 International Symposium, Digest of Technical Papers, XXXV, Book II, pp. 760 to 763), ASV (advanced super view, for example: Shigeta, Mitzuhiro and Fukuoka, Hirofumi, paper 15.2: “Development of High Quality LCDTV”, SID 2004 International Symposium, Digest of Technical Papers, XXXV, Book II, pp. 754 to 757) modes, have established themselves as one of the three more recent types of liquid-crystal display that are currently the most important, in particular for television applications, besides IPS (in-plane switching) displays (for example: Yeo, S. D., paper 15.3: “An LC Display for the TV Application”, SID 2004 International Symposium, Digest of Technical Papers, XXXV, Book II, pp. 758 & 759) and the long-known TN (twisted nematic) displays. The technologies are compared in general form, for example, in Souk, Jun, SID Seminar 2004, seminar M-6: “Recent Advances in LCD Technology”, Seminar Lecture Notes, M-6/1 to M-6/26, and Miller, Ian, SID Seminar 2004, seminar M-7: “LCD-Television”, Seminar Lecture Notes, M-7/1 to M-7/32. Although the response times of modern ECB displays have already been significantly improved by addressing methods with overdrive, for example: Kim, Hyeon Kyeong et al., paper 9.1: “A 57-in. Wide UXGA TFT-LCD for HDTV Application”, SID 2004 International Symposium, Digest of Technical Papers, XXXV, Book I, pp. 106 to 109, the achievement of video-compatible response times, in particular on switching of grey shades, is still a problem which has not yet been satisfactorily solved.

Industrial application of this effect in electro-optical display elements requires LC phases, which have to satisfy a multiplicity of requirements. Particularly important here are chemical resistance to moisture, air and physical influences, such as heat, infrared, visible and ultraviolet radiation and direct and alternating electric fields.

Furthermore, industrially usable LC phases are required to have a liquid-crystalline mesophase in a suitable temperature range and low viscosity.

None of the hitherto-disclosed series of compounds having a liquid-crystalline mesophase includes a single compound which meets all these requirements. Mixtures of two to 25, preferably three to 18, compounds are therefore generally prepared in order to obtain substances which can be used as LC phases. However, it has not been possible to prepare optimum phases easily in this way since no liquid-crystal materials having significantly negative dielectric anisotropy and adequate long-term stability were hitherto available.

Matrix liquid-crystal displays (MLC displays) are known. Non-linear elements which can be used for individual switching of the individual pixels are, for example, active elements (i.e. transistors). The term “active matrix” is then used, where a distinction can be made between two types:

-   1. MOS (metal oxide semiconductor) transistors on a silicon wafer as     substrate -   2. thin-film transistors (TFTs) on a glass plate as substrate.

In the case of type 1, the electro-optical effect used is usually dynamic scattering or the guest-host effect. The use of single-crystal silicon as substrate material restricts the display size, since even modular assembly of various part-displays results in problems at the joints.

In the case of the more promising type 2, which is preferred, the electrooptical effect used is usually the TN effect.

A distinction is made between two technologies: TFTs comprising compound semiconductors, such as, for example, CdSe, or TFTs based on polycrystalline or amorphous silicon. The latter technology is being worked on intensively worldwide.

The TFT matrix is applied to the inside of one glass plate of the display, while the other glass plate carries the transparent counterelectrode on its inside. Compared with the size of the pixel electrode, the TFT is very small and has virtually no adverse effect on the image. This technology can also be extended to fully colour-capable displays, in which a mosaic of red, green and blue filters is arranged in such a way that a filter element is opposite each switchable pixel.

The term MLC displays here covers any matrix display with integrated non-linear elements, i.e. besides the active matrix, also displays with passive elements, such as varistors or diodes (MIM=metal-insulator-metal).

MLC displays of this type are particularly suitable for TV applications (for example pocket TVs) or for high-information displays in automobile or air-craft construction. Besides problems regarding the angle dependence of the contrast and the response times, difficulties also arise in MLC displays due to insufficiently high specific resistance of the liquid-crystal mixtures [TOGASHI, S., SEKIGUCHI, K., TANABE, H., YAMAMOTO, E., SORIMACHI, K., TAJIMA, E., WATANABE, H., SHIMIZU, H., Proc. Eurodisplay 84, September 1984: A 210-288 Matrix LCD Controlled by Double Stage Diode Rings, pp. 141 ff., Paris; STROMER, M., Proc. Eurodisplay 84, September 1984: Design of Thin Film Transistors for Matrix Addressing of Television Liquid Crystal Displays, pp. 145 ff., Paris]. With decreasing resistance, the contrast of an MLC display deteriorates. Since the specific resistance of the liquid-crystal mixture generally drops over the life of an MLC display owing to interaction with the inside surfaces of the display, a high (initial) resistance is very important for displays that have to have acceptable resistance values over a long operating period.

There is thus still a great demand for MLC displays having very high specific resistance at the same time as a large working-temperature range, short response times and a low threshold voltage, with the aid of which various grey shades can be generated.

The disadvantage of the MLC-TN displays frequently used is due to their comparatively low contrast, the relatively high viewing-angle dependence and the difficulty of generating grey shades in these displays.

The market for VA, PS-VA, IPS, FFS and UB-FFS applications is looking for LC mixtures having fast response times and very high reliability. One approach for achieving fast response times is the identification of highly polar LC materials having low rotational viscosities, whose use in LC mixtures facilitates the desired effect. However, the use of highly polar LC materials of this type has an adverse effect on the reliability parameters, in particular after exposure to light.

The invention is based on the object of providing liquid-crystal mixtures, in particular for monitor and TV applications, based on the ECB, UB-FFS, IPS or FFS effect, which do not have the disadvantages indicated above, or only do so to a reduced extent. In particular, it must be ensured for monitors and televisions that they also work at extremely high and extremely low temperatures and at the same time have very short response times and at the same time have an improved reliability behaviour, in particular exhibit no or significantly reduced image sticking after long operating times.

Surprisingly, it is possible to obtain fast response times of LC mixtures at the same time as good reliability through the use of the compounds of the formula I if suitable stabilisers are added. A reliability parameter which can be specifically influenced here is the voltage holding ratio after exposure to light, such as, for example, exposure to UV light (sun test) or exposure by the backlighting of an LCD. The use of stabilisers of this type increases the voltage holding ratio after exposure to light.

The invention thus relates to a liquid-crystalline medium which comprises at least one compound of the formula I and at least one compound from the group of the compounds of the formulae ST-1 to ST-16.

The mixtures according to the invention preferably exhibit very broad nematic phase ranges with clearing points 70° C., preferably 75° C., in particular 80° C., very favourable values of the capacitive threshold, relatively high values of the holding ratio and at the same time very good low-temperature stabilities at −20° C. and −30° C., as well as very low rotational viscosity values and short response times. The mixtures according to the invention are furthermore distinguished by the fact that, in addition to the improvement in the rotational viscosity γ₁, relatively high values of the elastic constants K₃₃ for improving the response times can be observed. The use of the compounds of the formula I in LC mixtures, preferably having negative dielectric anisotropy, the ratio of rotational viscosity γ₁ and elastic constants K_(i) is reduced.

Some preferred embodiments of the mixtures according to the invention are indicated below.

In the compounds of the formula I, R¹ and R^(1*) preferably each, independently of one another, denote straight-chain alkoxy, in particular OCH₃, n-C₂H₅O, n-OC₃H₇, n-OC₄H₉, n-OC₅H₁₁, n-OC₆F₁₃, furthermore alkenyl, in particular CH₂═CH₂, CH₂CH═CH₂, CH₂CH═CHCH₃, CH₂CH═CHC₂H₅, branched alkoxy, in particular OC₃H₆CH(CH₃)₂, and alkenyloxy, in particular OCH═CH₂, OCH₂CH═CH₂, OCH₂CH═CHCH₃, OCH₂CH═CHC₂H₅.

R¹ and R^(1*) particularly preferably each, independently of one another, denote straight-chain alkoxy having 1-6 C atoms, in particular methoxy, ethoxy, propoxy, butoxy, pentoxy, hexoxy.

L¹ and L² in formula I preferably both denote F.

Preferred compounds of the formula I are the compounds of the formulae I-1 to I-20,

in which

alkyl and alkyl* each, independently of one another, denote a straight-chain alkyl radical having 1-6 C atoms, alkenyl and alkenyl* each, independently of one another, denote a straight-chain alkenyl radical having 2-6 C atoms, alkoxy and alkoxy* each, independently of one another, denote a straight-chain alkoxy radical having 1-6 C atoms, and L¹ and L² each, independently of one another, denote F or Cl.

In the compounds of the formulae I-1 to I-20, L¹ and L² preferably each, independently of one another, denote F or Cl, in particular L¹=L²=F. Particular preference is given to the compounds of the formulae I-2 and I-6. In the compounds of the formulae I-2 and I-6, preferably L¹=L²=F.

The mixture according to the invention very particularly preferably comprises at least one compound selected from the group of the compounds of the formulae I-1A, I-2A, I-4A, I-6A, I-6B, I-11A, I-12-A, I-14A and I-16A shown below:

Very particularly preferred mixtures comprise at least one compound selected from the group of the compounds of the formulae I-2.1 to I-2.49, I-6.1 to I-6.28, I-12.1 to I-12.49 and I-16.1 to I-16.28:

In the compounds of the formulae I-2.1 to I-2.49, I-6-1 to I-6-28, I-12.1 to I-12.49 and I-16-1 to I-16-28, L¹ and L² preferably both denote fluorine.

Preference is furthermore given to liquid-crystalline mixtures which comprise at least one compound selected from the group of the compounds of the formulae I-1.1 to I-1.28, I-6B.1 to I-6B.3 and I-11.1 to I-11.28:

in which L¹ and L² each, independently of one another, have the meanings given in Claim 1. In the compounds of the formulae I-1.1 to I-1.28, I-6B.1 to I-6B.3 and I-11.1 to I-11.28, preferably L¹=L²=F.

Very particularly preferred mixtures comprise at least one of the compounds shown below:

The compounds of the formula I can be prepared, for example, as described in US 2005/0258399 or WO 02/055463 A1.

The media according to the invention preferably comprise one, two, three, four or more, preferably one, two or three, compounds of the formula I.

The compounds of the formula I are preferably employed in the liquid-crystalline medium in amounts of ≧1, preferably ≧3% by weight, based on the mixture as a whole. Particular preference is given to liquid-crystalline media which comprise 1-40% by weight, very particularly preferably 2-30% by weight, of one or more compounds of the formula I.

Of the compounds of the formula ST, especial preference is given to the compounds of the formulae

where n=1, 2, 3, 4, 5, 6 or 7, preferably n=1 or 7

where n=1, 2, 3, 4, 5, 6 or 7, preferably n=3

where n=1, 2, 3, 4, 5, 6 or 7, preferably n=3

In the compounds of the formulae ST-3a and ST-3b, n preferably denotes 3. In the compounds of the formula ST-2a, n preferably denotes 7.

Very particularly preferred mixtures according to the invention comprise one or more stabilisers from the group of the compounds of the formulae ST-2a-1, ST-3a-1, ST-3b-1, ST-8-1, ST-9-1 and ST-12:

The compounds of the formulae ST-1 to ST-17 are preferably each present in the liquid-crystal mixtures according to the invention in amounts of 0.005-0.5%, based on the mixture.

If the mixtures according to the invention comprise two or more compounds from the group of the compounds of the formulae ST-1 to ST-17, the concentration correspondingly increases to 0.01-1% in the case of two compounds, based on the mixtures.

However, the total proportion of the compounds of the formulae ST-1 to ST-17, based on the mixture according to the invention, should not exceed 2%.

Preferred embodiments of the liquid-crystalline medium according to the invention are indicated below:

-   a) Liquid-crystalline medium which additionally comprises one or     more compounds selected from the group of the compounds of the     formulae IIA, IIB and IIC,

-   -   in which     -   R^(2A), R^(2B) and R^(2C) each, independently of one another,         denote H, an alkyl or alkenyl radical having up to 15 C atoms         which is unsubstituted, monosubstituted by CN or CF₃ or at least         monosubstituted by halogen, where, in addition, one or more CH₂         groups in these radicals may be replaced by —O—, —S≦,

—C≡C—, —CF₂O—, —OCF₂—, OC—O— or —O—CO— in such a way that O atoms are not linked directly to one another,

-   -   L¹⁻⁴ each, independently of one another, denote F, Cl, CF₃ or         CHF₂,     -   Z² and Z^(2′) each, independently of one another, denote a         single bond, —CH₂CH₂—, —CH═CH—, —CF₂O—, —OCF₂—, —CH₂O—, —OCH₂—,         —COO—, —OCO—, —C₂F₄—, —CF═CF—, —CH═CHCH₂O—,     -   denotes 0, 1 or 2,     -   q denotes 0 or 1, and     -   v denotes 1 to 6.

In the compounds of the formulae IIA and IIB, Z² may have identical or different meanings. In the compounds of the formula IIB, Z² and Z^(2′) may have identical or different meanings.

In the compounds of the formulae IIA, IIB and IIC, R^(2A), R^(2B) and R^(2C) each preferably denote alkyl having 1-6 C atoms, in particular CH₃, C₂H₅, n-C₃H₇, n-C₄H₉, n-C₅H₁₁.

In the compounds of the formulae IIA and IIB, L¹, L², L³ and L⁴ preferably denote L¹=L²=F and L³=L⁴=F, furthermore L¹=F and L²=Cl, L¹=Cl and L²=F, L³=F and L⁴=Cl, L³=Cl and L⁴=F. Z² and Z^(2′) in the formulae IIA and IIB preferably each, independently of one another, denote a single bond, furthermore a —C₂H₄— bridge.

If, in the formula IIB, Z²═—C₂H₄— or —CH₂O—, Z^(2′) is preferably a single bond or, if Z^(2′)═—C₂H₄— or —CH₂O—, Z² is preferably a single bond. In the compounds of the formulae IIA and IIB, (O)C_(v)H_(2v+1) preferably denotes OC_(v)H_(2v+1), furthermore C_(v)H_(2v+1). In the compounds of the formula IIC, (O)C_(v)H_(2v+1) preferably denotes C_(v)H_(2v+1). In the compounds of the formula IIC, L³ and L⁴ preferably each denote F.

Preferred compounds of the formulae IIA, IIB and IIC are indicated below:

in which

-   alkyl and alkyl* each, independently of one another, denote a     straight-chain alkyl radical having 1-6 C atoms, and -   alkenyl and alkenyl* each, independently of one another, denote a     straight-chain alkenyl radical having 2-6 C atoms.

Particularly preferred mixtures according to the invention comprise one or more compounds of the formulae IIA-2, IIA-8, IIA-14, IIA-26, II-28, IIA-33, IIA-39, IIA-45, IIA-46, IIA-47, IIA-50, IIB-2, 11B-11, IIB-16 and IIC-1.

The proportion of compounds of the formulae IIA and/or IIB in the mixture as a whole is preferably at least 20% by weight.

Particularly preferred media according to the invention comprise at least one compound of the formula IIC-1,

in which alkyl and alkyl* have the meanings indicated above, preferably in amounts of >3% by weight, in particular >5% by weight and particularly preferably 5-25% by weight.

-   b) Liquid-crystalline medium which additionally comprises one or     more compounds of the formula III,

in which

-   R³¹ and R³² each, independently of one another, denote a     straight-chain alkyl, alkoxy, alkenyl, alkoxyalkyl or alkoxy radical     having up to 12 C atoms, and

-   Z³ denotes a single bond, —CH₂CH₂—, —CH═CH—, —CF₂O—, —OCF₂—, —CH₂O—,     —OCH₂—, —COO—, —OCO—, —C₂F₄—, —C₄H₈—, —CF═CF—.

Preferred compounds of the formula Ill are indicated below:

in which

-   alkyl and -   alkyl* each, independently of one another, denote a straight-chain     alkyl radical having 1-6 C atoms.

The medium according to the invention preferably comprises at least one compound of the formula IIIa and/or formula IIIb.

The proportion of compounds of the formula III in the mixture as a whole is preferably at least 5% by weight

-   c) Liquid-crystalline medium additionally comprising a compound of     the formula

preferably in total amounts of 5% by weight, in particular ≧10% by weight.

Preference is furthermore given to mixtures according to the invention comprising the compound (acronym: CC-3-V1)

preferably in amounts of 2-15% by weight.

Preferred mixtures comprise 5-60% by weight, preferably 10-55% by weight, in particular 20-50% by weight, of the compound of the formula (acronym: CC-3-V)

Preference is furthermore given to mixtures which comprise a compound of the formula (acronym: CC-3-V)

and a compound of the formula (acronym: CC-3-V1)

preferably in amounts of 10-60% by weight.

-   d) Liquid-crystalline medium which additionally comprises one or     more tetracyclic compounds of the formulae

in which

-   R⁷⁻¹⁰ each, independently of one another, have one of the meanings     indicated for R^(2A) in claim 5, and -   w and x each, independently of one another, denote 1 to 6.

Particular preference is given to mixtures comprising at least one compound of the formula V-9.

-   e) Liquid-crystalline medium which additionally comprises one or     more compounds of the formulae Y-1 to Y-6,

in which R¹⁴-R¹⁹ each, independently of one another, denote an alkyl or alkoxy radical having 1-6 C atoms; z and m each, independently of one another, denote 1-6; x denotes 0, 1, 2 or 3.

The medium according to the invention particularly preferably comprises one or more compounds of the formulae Y-1 to Y-6, preferably in amounts of 5% by weight.

-   f) Liquid-crystalline medium additionally comprising one or more     fluorinated terphenyls of the formulae T-1 to T-21,

in which

R denotes a straight-chain alkyl or alkoxy radical having 1-6 C atoms, and m=0, 1, 2, 3, 4, 5 or 6 and n denotes 0, 1, 2, 3 or 4.

R preferably denotes methyl, ethyl, propyl, butyl, pentyl, hexyl, methoxy, ethoxy, propoxy, butoxy, pentoxy.

The medium according to the invention preferably comprises the terphenyls of the formulae T-1 to T-21 in amounts of 2-30% by weight, in particular 5-20% by weight.

Particular preference is given to compounds of the formulae T-1, T-2, T-4, T-20 and T-21. In these compounds, R preferably denotes alkyl, furthermore alkoxy, each having 1-5 C atoms. In the compounds of the formula T-20, R preferably denotes alkyl or alkenyl, in particular alkyl. In the compound of the formula T-21, R preferably denotes alkyl.

The terphenyls are preferably employed in the mixtures according to the invention if the An value of the mixture is to be ≧0.1. Preferred mixtures comprise 2-20% by weight of one or more terphenyl compounds selected from the group of the compounds T-1 to T-21.

-   g) Liquid-crystalline medium additionally comprising one or more     biphenyls of the formulae B-1 to B-3,

in which

-   alkyl and alkyl* each, independently of one another, denote a     straight-chain alkyl radical having 1-6 C atoms, and -   alkenyl and alkenyl* each, independently of one another, denote a     straight-chain alkenyl radical having 2-6 C atoms.

The proportion of the biphenyls of the formulae B-1 to B-3 in the mixture as a whole is preferably at least 3% by weight, in particular ≧5% by weight.

Of the compounds of the formulae B-1 to B-3, the compounds of the formula B-2 are particularly preferred.

Particularly preferred biphenyls are

in which alkyl* denotes an alkyl radical having 1-6 C atoms. The medium according to the invention particularly preferably comprises one or more compounds of the formulae B-1a and/or B-2c.

-   h) Liquid-crystalline medium comprising at least one compound of the     formulae Z-1 to Z-7,

in which R and alkyl have the meanings indicated above.

-   i) Liquid-crystalline medium additionally comprising at least one     compound of the formulae O-1 to O-18,

in which R¹ and R² have the meanings indicated for R^(2A). R¹ and R² preferably each, independently of one another, denote straight-chain alkyl or alkenyl.

Preferred media comprise one or more compounds of the formulae O-1, O-3, O-4, O-6, O-7, O-10, O-11, O-12, O-14, O-15, O-16 and/or O-17.

Mixtures according to the invention very particularly preferably comprise the compounds of the formula O-10, O-12, O-16 and/or O-17, in particular in amounts of 5-30%.

Preferred compounds of the formulae O-10 and O-17 are indicated below:

The medium according to the invention particularly preferably comprises the tricyclic compounds of the formula 0-10a and/or of the formula O-10b in combination with one or more bicyclic compounds of the formulae O-17a to O-17d. The total proportion of the compounds of the formulae O-10a and/or O-10b in combination with one or more compounds selected from the bicyclic compounds of the formulae O-17a to O-17d is 5-40%, very particularly preferably 15-35%.

Very particularly preferred mixtures comprise compounds O-10a and O-17a:

The compounds O-10a and O-17a are preferably present in the mixture in a concentration of 15-35%, particularly preferably 15-25% and especially preferably 18-22%, based on the mixture as a whole.

Very particularly preferred mixtures comprise the compounds O-10b and O-17a:

The compounds O-10b and O-17a are preferably present in the mixture in a concentration of 15-35%, particularly preferably 15-25% and especially preferably 18-22%, based on the mixture as a whole.

Very particularly preferred mixtures comprise the following three compounds:

The compounds O-10a, O-10b and O-17a are preferably present in the mixture in a concentration of 15-35%, particularly preferably 15-25% and especially preferably 18-22%, based on the mixture as a whole.

Preferred mixtures comprise at least one compound selected from the group of the compounds

in which R¹ and R² have the meanings indicated above. Preferably in the compounds O-6, O-7 and O-17, R¹ denotes alkyl or alkenyl having 1-6 or 2-6 C atoms respectively and R² denotes alkenyl having 2-6 C atoms.

Preferred mixtures comprise at least one compound of the formulae O-6a, O-6b, O-7a, O-7b, O-17e, O-17f, O-17g and O-17h:

in which alkyl denotes an alkyl radical having 1-6 C atoms.

The compounds of the formulae O-6, O-7 and O-17e-h are preferably present in the mixtures according to the invention in amounts of 1-40% by weight, preferably 2-35% by weight and very particularly preferably 2-30% by weight.

-   j) Preferred liquid-crystalline media according to the invention     comprise one or more substances which contain a tetrahydronaphthyl     or naphthyl unit, such as, for example, the compounds of the     formulae N-1 to N-5,

in which R^(1N) and R^(2N) each, independently of one another, have the meanings indicated for R^(2A), preferably denote straight-chain alkyl, straight-chain alkoxy or straight-chain alkenyl, and

-   Z¹ and Z² each, independently of one another, denote —C₂H₄—,     —CH═CH—, —(CH₂)₄—, —(CH₂)₃O—, —O(CH₂)₃—, —CH═CHCH₂CH₂—,     —CH₂CH₂CH═CH—, —CH₂O—, —OCH₂—, —COO—, —OCO—, —C₂F₄—, —CF═CF—,     —CF═CH—, —CH═CF—, —CF₂O—, —OCF₂—, —CH₂— or a single bond. -   k) Preferred mixtures comprise one or more compounds selected from     the group of the difluorodibenzochroman compounds of the formula BC,     chromans of the formula CR, fluorinated phenanthrenes of the     formulae PH-1 and PH-2, fluorinated dibenzofurans of the formula     BF-1 and BF-2,

in which

R^(B1), R^(B2), R^(CR1), R^(CR2), R¹, R² each, independently of one another, have the meaning of R^(2A). c is 0, 1 or 2 and d denotes 1 or 2. R¹ and R² preferably, independently of one another, denote alkyl or alkoxy having 1 to 6 C atoms. The compounds of the formulae BF-1 and BF-2 should not be identical to one or more compounds of the formula I.

The mixtures according to the invention preferably comprise the compounds of the formulae BC, CR, PH-1, PH-2 and/or BF in amounts of 3 to 20% by weight, in particular in amounts of 3 to 15% by weight.

Particularly preferred compounds of the formulae BC and CR are the compounds BC-1 to BC-7 and CR-1 to CR-5,

in which

-   alkyl and alkyl* each, independently of one another, denote a     straight-chain alkyl radical having 1-6 C atoms, and -   alkenyl and -   alkenyl* each, independently of one another, denote a straight-chain     alkenyl radical having 2-6 C atoms.

Very particular preference is given to mixtures comprising one, two or three compounds of the formula BC-2, BF-1 and/or BF-2.

-   l) Preferred mixtures comprise one or more indane compounds of the     formula In,

in which

-   R¹¹, R¹², -   R¹³ each, independently of one another, denote a straight-chain     alkyl, alkoxy, alkoxyalkyl or alkenyl radical having 1-6 C atoms, -   R¹² and R¹³ additionally denote halogen, preferably F,

-   i denotes 0, 1 or 2.

Preferred compounds of the formula In are the compounds of the formulae In-1 to In-16 indicated below:

Particular preference is given to the compounds of the formulae In-1, In-2, In-3 and In-4.

The compounds of the formula In and the sub-formulae In-1 to In-16 are preferably employed in the mixtures according to the invention in concentrations 5% by weight, in particular 5-30% by weight and very particularly preferably 5-25% by weight.

-   m) Preferred mixtures additionally comprise one or more compounds of     the formulae L-1 to L-11,

in which

-   -   R, R¹ and R² each, independently of one another, have the         meanings indicated for R^(2A) in claim 5 and alkyl denotes an         alkyl radical having 1-6 C atoms. s denotes 1 or 2.     -   Particular preference is given to the compounds of the formulae         L-1 and L-4, in particular L-4.     -   The compounds of the formulae L-1 to L-11 are preferably         employed in concentrations of 5-50% by weight, in particular         5-40% by weight and very particularly preferably 10-40% by         weight.

Particularly preferred mixture concepts are indicated below: (the acronyms used are explained in Table A. n and m here each, independently of one another, denote 1-15, preferably 1-6).

The mixtures according to the invention preferably comprise

-   -   one or more compounds of the formula I in which L¹=L²=F and         R¹=R^(1*)=alkoxy;     -   CPY-n-Om, in particular CPY-2-O2, CPY-3-O2 and/or CPY-5-O2,         preferably in concentrations >5%, in particular 10-30%, based on         the mixture as a whole, and/or     -   CY-n-Om, preferably CY-3-O2, CY-3-O4, CY-5-O2 and/or CY-5-O4,         preferably in concentrations >5%, in particular 15-50%, based on         the mixture as a whole, and/or     -   CCY-n-Om, preferably CCY-4-O2, CCY-3-O2, CCY-3-O3, CCY-3-O1         and/or CCY-5-O2, preferably in concentrations >5%, in particular         10-30%, based on the mixture as a whole, and/or     -   CLY-n-Om, preferably CLY-2-O4, CLY-3-O2 and/or CLY-3-O3,         preferably in concentrations >5%, in particular 10-30%, based on         the mixture as a whole, and/or     -   CK-n-F, preferably CK-3-F, CK-4-F and/or CK-5-F, preferably >5%,         in particular 5-25%, based on the mixture as a whole.

Preference is furthermore given to mixtures according to the invention which comprise the following mixture concepts:

(n and m each, independently of one another, denote 1-6.)

-   -   CPY-n-Om and CY-n-Om, preferably in concentrations of 10-80%,         based on the mixture as a whole, and/or     -   CPY-n-Om and CK-n-F, preferably in concentrations of 10-70%,         based on the mixture as a whole, and/or     -   CPY-n-Om and PY-n-Om, preferably CPY-2-O2 and/or CPY-3-O2 and         PY-3-O2, preferably in concentrations of 10-45%, based on the         mixture as a whole, and/or     -   CPY-n-Om and CLY-n-Om, preferably in concentrations of 10-80%,         based on the mixture as a whole, and/or     -   CCVC-n-V, preferably CCVC-3-V, preferably in concentrations of         2-10%, based on the mixture as a whole, and/or     -   CCC-n-V, preferably CCC-2-V and/or CCC-3-V, preferably in         concentrations of 2-10%, based on the mixture as a whole, and/or     -   CC-V-V, preferably in concentrations of 5-50%, based on the         mixture as a whole.

The invention furthermore relates to an electro-optical display having active-matrix addressing based on the dem ECB, VA, PS-VA, PA-VA, IPS, PS-IPS, FFS or PS-FFS effect, characterised in that it contains, as dielectric, a liquid-crystalline medium according to one or more of claims 1 to 16.

The liquid-crystalline medium according to the invention preferably has a nematic phase from ≦−20° C. to ≧70° C., particularly preferably from ≦−30° C. to ≧80° C., very particularly preferably from ≦−40° C. to ≧90° C.

The expression “have a nematic phase” here means on the one hand that no smectic phase and no crystallisation are observed at low temperatures at the corresponding temperature and on the other hand that clearing still does not occur on heating from the nematic phase. The investigation at low temperatures is carried out in a flow viscometer at the corresponding temperature and checked by storage in test cells having a layer thickness corresponding to the electro-optical use for at least 100 hours. If the storage stability at a temperature of −20° C. in a corresponding test cell is 1000 h or more, the medium is referred to as stable at this temperature. At temperatures of −30° C. and −40° C., the corresponding times are 500 h and 250 h respectively. At high temperatures, the clearing point is measured by conventional methods in capillaries.

The liquid-crystal mixture preferably has a nematic phase range of at least 60 K and a flow viscosity ν₂₀ of at most 30 mm²·s⁻¹ at 20° C.

The values of the birefringence Δn in the liquid-crystal mixture are generally between 0.07 and 0.16, preferably between 0.08 and 0.13.

The liquid-crystal mixture according to the invention has a Δε of −0.5 to −8.0, in particular −2.5 to −6.0, where Δε denotes the dielectric anisotropy. The rotational viscosity γ₁ at 20° C. is preferably ≦150 mPa·s, in particular 120 mPa·s.

The liquid-crystal media according to the invention have relatively low values for the threshold voltage (V₀). They are preferably in the range from 1.7 V to 3.0 V, particularly preferably ≦2.5 V and very particularly preferably ≦2.3 V.

For the present invention, the term “threshold voltage” relates to the capacitive threshold (V₀), also called the Freedericks threshold, unless explicitly indicated otherwise.

In addition, the liquid-crystal media according to the invention have high values for the voltage holding ratio in liquid-crystal cells.

In general, liquid-crystal media having a low addressing voltage or threshold voltage exhibit a lower voltage holding ratio than those having a higher addressing voltage or threshold voltage and vice versa.

For the present invention, the term “dielectrically positive compounds” denotes compounds having a Δε>1.5, the term “dielectrically neutral compounds” denotes those having −1.5≦Δε1.5 and the term “dielectrically negative compounds” denotes those having Δε<−1.5. The dielectric anisotropy of the compounds is determined here by dissolving 10% of the compounds in a liquid-crystalline host and determining the capacitance of the resultant mixture in at least one test cell in each case having a layer thickness of 20 μm with homeotropic and with homogeneous surface alignment at 1 kHz. The measurement voltage is typically 0.5 V to 1.0 V, but is always lower than the capacitive threshold of the respective liquid-crystal mixture investigated.

All temperature values indicated for the present invention are in ° C.

The mixtures according to the invention are suitable for all VA-TFT applications, such as, for example, VAN, MVA, (S)-PVA, ASV, PSA (polymer sustained VA) and PS-VA (polymer stabilized VA). They are furthermore suitable for IPS (in-plane switching) and FFS (fringe field switching) applications having negative Δε.

The nematic liquid-crystal mixtures in the displays according to the invention generally comprise two components A and B, which themselves consist of one or more individual compounds.

Component A has significantly negative dielectric anisotropy and gives the nematic phase a dielectric anisotropy of ≦−0.5. Besides one or more compounds of the formula I, it preferably comprises the compounds of the formulae IIA, IIB and/or IIC, furthermore one or more compounds of the formula O-17.

The proportion of component A is preferably between 45 and 100%, in particular between 60 and 100%.

For component A, one (or more) individual compound(s) which has (have) a value of Δε≦−0.8 is (are) preferably selected. This value must be more negative, the smaller the proportion A in the mixture as a whole.

Component B has pronounced nematogeneity and a flow viscosity of not greater than 30 mm²·s⁻¹, preferably not greater than 25 mm²·s⁻¹, at 20° C.

A multiplicity of suitable materials is known to the person skilled in the art from the literature. Particular preference is given to compounds of the formula O-17.

Particularly preferred individual compounds in component B are extremely low-viscosity nematic liquid crystals having a flow viscosity of not greater than 18 mm²·s⁻¹, preferably not greater than 12 mm²·s⁻¹, at 20° C.

Component B is monotropically or enantiotropically nematic, has no smectic phases and is able to prevent the occurrence of smectic phases down to very low temperatures in liquid-crystal mixtures. For example, if various materials of high nematogeneity are added to a smectic liquid-crystal mixture, the nematogeneity of these materials can be compared through the degree of suppression of smectic phases that is achieved.

The mixture may optionally also comprise a component C, comprising compounds having a dielectric anisotropy of Δε≧1.5. These so-called positive compounds are generally present in a mixture of negative dielectric anisotropy in amounts of 20% by weight, based on the mixture as a whole.

If the mixture according to the invention comprises one or more compounds having a dielectric anisotropy of Δε≧1.5, these are preferably one or more compounds selected from the group of the compounds of the formulae P-1 to P-4,

in which

-   R denotes straight-chain alkyl, alkoxy or alkenyl, each having 1 or     2 to 6 C atoms respectively, and -   X denotes F, Cl, CF₃, OCF₃, OCHFCF₃ or CCF₂CHFCF₃, preferably F or     OCF₃.

The compounds of the formulae P-1 to P-4 are preferably employed in the mixtures according to the invention in concentrations of 0.1-15%, in particular 0.1-10%.

Particular preference is given to the compound of the formula

which is preferably employed in the mixtures according to the invention in amounts of 0.1-15%.

In addition, these liquid-crystal phases may also comprise more than 18 components, preferably 18 to 25 components.

Besides one or more compounds of the formula I, the phases preferably comprise 4 to 15, in particular 5 to 12, and particularly preferably <10, compounds of the formulae IIA, IIB and/or IIC and optionally one or more compounds of the formula O-17.

Besides compounds of the formula I and the compounds of the formulae IIA, IIB and/or IIC and optionally O-17, other constituents may also be present, for example in an amount of up to 45% of the mixture as a whole, but preferably up to 35%, in particular up to 10%.

The other constituents are preferably selected from nematic or nematogenic substances, in particular known substances, from the classes of the azoxybenzenes, benzylideneanilines, biphenyls, terphenyls, phenyl or cyclohexyl benzoates, phenyl or cyclohexyl cyclohexanecarboxylates, phenylcyclohexanes, cyclohexylbiphenyls, cyclohexylcyclohexanes, cyclohexylnaphthalenes, 1,4-biscyclohexylbiphenyls or cyclohexylpyrimidines, phenyl- or cyclohexyldioxanes, optionally halogenated stilbenes, benzyl phenyl ethers, tolanes and substituted cinnamic acid esters.

The most important compounds which are suitable as constituents of liquid-crystal phases of this type can be characterised by the formula IV

R²⁰-L-G-E-R²¹   IV

in which L and E each denote a carbo- or heterocyclic ring system from the group formed by 1,4-disubstituted benzene and cyclohexane rings, 4,4′-disubstituted biphenyl, phenylcyclohexane and cyclohexylcyclohexane systems, 2,5-disubstituted pyrimidine and 1,3-dioxane rings, 2,6-disubstituted naphthalene, di- and tetrahydronaphthalene, quinazoline and tetrahydroquinazoline,

G denotes —CH═CH— —N(O)═N—

-   -   —CH═CQ- —CH═N(O)—     -   —C≡C— —CH₂—CH₂—     -   —CO—O— —CH₂—O—     -   —CO—S— —CH₂—S—     -   —CH═N— —COO-Phe-COO—     -   —CF₂O— —CF═CF—     -   —OCF₂— —OCH₂—     -   —(CH₂)₄— —(CH₂)₃O—

or a C—C single bond, Q denotes halogen, preferably chlorine, or —CN, and R²⁰ and R²¹ each denote alkyl, alkenyl, alkoxy, alkoxyalkyl or alkoxycarbonyloxy having up to 18, preferably up to 8, carbon atoms, or one of these radicals alternatively denotes CN, NC, NO₂, NCS, CF₃, SF₅, OCF₃, F, Cl or Br.

In most of these compounds, R²⁰ and R²¹ are different from one another, one of these radicals usually being an alkyl or alkoxy group. Other variants of the proposed substituents are also common. Many such substances or also mixtures thereof are commercially available. All these substances can be prepared by methods known from the literature.

It goes without saying for the person skilled in the art that the VA, IPS or FFS mixture according to the invention may also comprise compounds in which, for example, H, N, O, Cl and F have been replaced by the corresponding isotopes.

Polymerisable compounds, so-called reactive mesogens (RMs), for example as disclosed in U.S. Pat. No. 6,861,107, may furthermore be added to the mixtures according to the invention in concentrations of preferably 0.01-5% by weight, particularly preferably 0.2-2% by weight, based on the mixture. These mixtures may optionally also comprise an initiator, as described, for example, in U.S. Pat. No. 6,781,665. The initiator, for example Irganox-1076 from BASF, is preferably added to the mixture comprising polymerisable compounds in amounts of 0-1%. Mixtures of this type can be used for so-called polymer-stabilised VA modes (PS-VA) or PSA (polymer sustained VA), in which polymerisation of the reactive mesogens is intended to take place in the liquid-crystalline mixture. The prerequisite for this is that the liquid-crystalline compounds of the LC host do not react under the polymerisation conditions of the reactive mesogens, i.e. generally on exposure to UV in the wavelength range from 320-360 nm. Liquid-crystalline compounds containing an alkenyl side chain, such as, for example, CC-3-V, exhibit no reaction under the polymerisation conditions (UV polymerisation) for the RMs.

In a preferred embodiment of the invention, the polymerisable compounds are selected from the compounds of the formula M

R^(Ma)-A^(M1)-(Z^(M1)-A^(M2))_(m1)-R^(Mb)   M

in which the individual radicals have the following meanings:

-   R^(Ma) and R^(Mb) each, independently of one another, denote P,     P-Sp-, H, halogen, SF₅, NO₂, an alkyl, alkenyl or alkynyl group,     where at least one of the radicals R^(Ma) and R^(Mb) preferably     denotes or contains a group P or P-Sp-, -   P denotes a polymerisable group, -   Sp denotes a spacer group or a single bond, -   A^(M1) and A^(M2) each, independently of one another, denote an     aromatic, heteroaromatic, alicyclic or heterocyclic group,     preferably having 4 to 25 ring atoms, preferably C atoms, which also     includes or may contain annellated rings, and which may optionally     be mono- or polysubstituted by L, -   L denotes P, P-Sp-, OH, CH₂OH, F, Cl, Br, I, —CN, —NO₂, —NCO, —NCS,     —OCN, —SCN, —C(═O)N(R^(x))₂, —C(═O)Y¹, —C(═O)R^(x), —N(R^(x))₂,     optionally substituted silyl, optionally substituted aryl having 6     to 20 C atoms, or straight-chain or branched alkyl, alkoxy,     alkylcarbonyl, alkoxycarbonyl, alkylcarbonyloxy or alkoxycarbonyloxy     having 1 to 25 C atoms, in which, in addition, one or more H atoms     may be replaced by F, Cl, P or P-Sp-, preferably P, P-Sp-, H, OH,     CH₂OH, halogen, SF₅, NO₂, an alkyl, alkenyl or alkynyl group, -   Y¹ denotes halogen, -   Z^(M1) denotes —O—, —S—, —CO—, —CO—O—, —OCO—, —O—CO—O—, —OCH₂—,     —CH₂O—, —SCH₂—, —CH₂S—, —CF₂O—, —OCF₂—, —CF₂S—, —SCF₂—,     —(CH₂)_(n1)—, —CF₂CH₂—, —CH₂CF₂—, —(CF₂)_(n1)—, —CH═CH—, —CF═CF—,     —C≡C—, —CH═CH—, —COO—, —OCO—CH═CH—, CR⁰R⁰⁰ or a single bond, -   R⁰ and R⁰⁰ each, independently of one another, denote H or alkyl     having 1 to 12 C atoms, -   R^(x) denotes P, P-Sp-, H, halogen, straight-chain, branched or     cyclic alkyl having 1 to 25 C atoms, in which, in addition, one or     more non-adjacent CH₂ groups may be replaced by —O—, —S—, —CO—,     —CO—O—, —O—CO—, —O—CO—O— in such a way that O and/or S atoms are not     linked directly to one another, and in which, in addition, one or     more H atoms may be replaced by F, Cl, P or P-Sp-, an optionally     substituted aryl or aryloxy group having 6 to 40 C atoms, or an     optionally substituted heteroaryl or heteroaryloxy group having 2 to     40 C atoms, -   m1 denotes 0, 1, 2, 3 or 4 and -   n1 denotes 1, 2, 3 or 4,     -   where at least one, preferably one, two or three, particularly         preferably one or two, from the group R^(Ma), R^(Mb) and the         substituents L present denotes a group P or P-Sp- or contains at         least one group P or P-Sp-.

Particularly preferred compounds of the formula M are those in which

-   R^(Ma) and R^(Mb) each, independently of one another, denote P,     P-Sp-, H, F, Cl, Br, I, —CN, —NO₂, —NCO, —NCS, —OCN, —SCN, SF₅ or     straight-chain or branched alkyl having 1 to 25 C atoms, in which,     in addition, one or more non-adjacent CH₂ groups may each be     replaced, independently of one another, by —C(R⁰)═C(R⁰⁰)—, —C≡C—,     —N(R⁰⁰)—, —O—, —S—, —CO—, —CO—O—, —O—CO—, —O—CO—O— in such a way     that O and/or S atoms are not linked directly to one another, and in     which, in addition, one or more H atoms may be replaced by F, Cl,     Br, I, CN, P or P-Sp-, where at least one of the radicals R^(Ma) and     R^(Mb) preferably denotes or contains a group P or P-Sp-, -   A^(M1) and A^(M2) each, independently of one another, denote     1,4-phenylene, naphthalene-1,4-diyl, naphthalene-2,6-diyl,     phenanthrene-2,7-diyl, anthracene-2,7-diyl, fluorene-2,7-diyl,     coumarine, flavone, where, in addition, one or more CH groups in     these groups may be replaced by N, cyclohexane-1,4-diyl, in which,     in addition, one or more non-adjacent CH₂ groups may be replaced by     O and/or S, 1,4-cyclohexenylene, bicyclo[1.1.1]-pentane-1,3-diyl,     bicyclo[2.2.2]octane-1,4-diyl, spiro[3.3]heptane-2,6-diyl,     piperidine-1,4-diyl, decahydronaphthalene-2,6-diyl,     1,2,3,4-tetrahydronaphthalene-2,6-diyl, indane-2,5-diyl or     octahydro-4,7-methanoindane-2,5-diyl, where all these groups may be     unsubstituted or mono- or polysubstituted by L, -   L denotes P, P-Sp-, OH, CH₂OH, F, Cl, Br, I, —CN, —NO₂, —NCO, —NCS,     —OCN, —SCN, —C(═O)N(R^(x))₂, —C(═O)Y¹, —C(═O)R^(x), —N(R^(x))₂,     optionally substituted silyl, optionally substituted aryl having 6     to 20 C atoms, or straight-chain or branched alkyl, alkoxy,     alkylcarbonyl, alkoxycarbonyl, alkylcarbonyloxy or alkoxycarbonyloxy     having 1 to 25 C atoms, in which, in addition, one or more H atoms     may be replaced by F, Cl, P or P-Sp-, -   P denotes a polymerisable group, -   Y¹ denotes halogen, -   R^(x) denotes P, P-Sp-, H, halogen, straight-chain, branched or     cyclic alkyl having 1 to 25 C atoms, in which, in addition, one or     more non-adjacent CH₂ groups may be replaced by —O—, —S—, —CO—,     —CO—O—, —O—CO—, —O—CO—O— in such a way that O and/or S atoms are not     linked directly to one another, and in which, in addition, one or     more H atoms may be replaced by F, Cl, P or P-Sp-, an optionally     substituted aryl or aryloxy group having 6 to 40 C atoms, or an     optionally substituted heteroaryl or heteroaryloxy group having 2 to     40 C atoms.

Very particular preference is given to compounds of the formula M in which one of R^(Ma) and R^(Mb) or both denote P or P-Sp-.

Suitable and preferred RMs or monomers or comonomers for use in liquid-crystalline media and PS-VA displays or PSA displays according to the invention are selected, for example from the following formulae:

in which the individual radicals have the following meanings:

-   P¹, P² and P³ each, identically or differently, denote a     polymerisable group, preferably having one of the meanings indicated     above and below for P, particularly preferably an acrylate,     methacrylate, fluoroacrylate, oxetane, vinyloxy or epoxy group, -   Sp¹, Sp² and Sp³ each, independently of one another, denote a single     bond or a spacer group, preferably having one of the meanings     indicated above and below for Sp^(a), and particularly preferably     —(CH₂)_(p1)—, —(CH₂)_(p1)—O—, —(CH₂)_(p1)—CO—O— or     —(CH₂)_(p1)—O—CO—O—, in which p1 is an integer from 1 to 12, and     where in the last-mentioned groups the linking to the adjacent ring     takes place via the O atom,     -   where one or more of the radicals P¹-Sp¹-, P²-Sp²- and P³-Sp³-         may also denote R^(aa), with the proviso that at least one of         the radicals P¹-Sp¹-, P²-Sp²- and P³-Sp³- present does not         denote R^(aa), -   R^(aa) denotes H, F, Cl, CN or straight-chain or branched alkyl     having 1 to 25 C atoms, in which, in addition, one or more     non-adjacent CH₂ groups may each be replaced, independently of one     another, by C(R⁰)═C(R⁰⁰)—, —C≡C—, —N(R⁰)—, —O—, —S—, —CO—, —CO—O—,     —O—CO—, —O—CO—O— in such a way that O and/or S atoms are not linked     directly to one another, and in which, in addition, one or more H     atoms may be replaced by F, Cl, CN or P¹-Sp¹-, particularly     preferably straight-chain or branched, optionally mono- or     polyfluorinated, alkyl, alkoxy, alkenyl, alkynyl, alkylcarbonyl,     alkoxycarbonyl or alkylcarbonyloxy having 1 to 12 C atoms (where the     alkenyl and alkynyl radicals have at least two and the branched     radicals at least three C atoms), -   R⁰, R⁰⁰ each, independently of one another and on each occurrence     identically or differently, denote H or alkyl having 1 to 12 C     atoms, -   R^(y) and R^(z) each, independently of one another, denote H, F, CH₃     or CF₃, -   X¹, X² and X³ each, independently of one another, denote —CO—O—,     O—CO— or a single bond, -   Z¹ denotes-O—, —CO—, —C(R^(y)R^(z))— or —CF₂CF₂—, -   Z² and Z³ each, independently of one another, denote —CO—O—, —O—CO—,     —CH₂O—, —OCH₂—, —CF₂O—, —OCF₂— or —(CH₂)_(n)—, where n is 2, 3 or 4, -   L on each occurrence, identically or differently, denotes F, Cl, CN,     SCN, SF₅ or straight-chain or branched, optionally mono- or     polyfluorinated, alkyl, alkoxy, alkenyl, alkynyl, alkylcarbonyl,     alkoxycarbonyl, alkylcarbonyloxy or alkoxycarbonyloxy having 1 to 12     C atoms, preferably F, -   L′ and L″ each, independently of one another, denote H, F or Cl, -   r denotes 0, 1, 2, 3 or 4, -   s denotes 0, 1, 2 or 3, -   t denotes 0, 1 or 2, -   x denotes 0 or 1.

In the compounds of the formulae M1 to M36,

preferably denotes

in which L, identically or differently on each occurrence, has one of the above meanings and preferably denotes F, Cl, CN, NO₂, CH₃, C₂H₅, C(CH₃)₃, CH(CH₃)₂, CH₂CH(CH₃)C₂H₅, OCH₃, OC₂H₅, COCH₃, COC₂H₅, COOCH₃, COOC₂H₅, CF₃, OCF₃, OCHF₂, OC₂F₅ or P-Sp-, particularly preferably F, Cl, CN, CH₃, C₂H₅, OCH₃, COCH₃, OCF₃ or P-Sp-, very particularly preferably F, Cl, CH₃, OCH₃, COCH₃ or OCF₃, in particular F or CH₃.

Suitable polymerisable compounds are listed, for example, in Table D.

The liquid-crystalline media in accordance with the present application preferably comprise in total 0.1 to 10%, preferably 0.2 to 4.0%, particularly preferably 0.2 to 2.0%, of polymerisable compounds.

Particular preference is given to the polymerisable compounds of the formula M and the formulae RM-1 to RM-99.

The mixtures according to the invention may furthermore comprise conventional additives, such as, for example, stabilisers, antioxidants, UV absorbers, nanoparticles, microparticles, etc.

The structure of the liquid-crystal displays according to the invention corresponds to the usual geometry, as described, for example, in EP-A 0 240 379.

The following examples are intended to explain the invention without limiting it. Above and below, per cent data denote per cent by weight; all temperatures are indicated in degrees Celsius.

Throughout the patent application, 1,4-cyclohexylene rings and 1,4-phenylene rings are depicted as follows:

The cyclohexylene rings are trans-1,4-cyclohexylene rings.

Throughout the patent application and in the working examples, the structures of the liquid-crystal compounds are indicated by means of acronyms. Unless indicated otherwise, the transformation into chemical formulae is carried out in accordance with Tables 1-3. All radicals C_(n)H_(2n+1), C_(m)H_(2m+1) and C_(m′)H_(2m′+1) or C_(n)H_(2n) and C_(m)H_(2m) are straight-chain alkyl radicals or alkylene radicals respectively in each case having n, m, m′ or z C atoms respectively. n, m, m′, z each denote, independently of one another, 1, 2, 3, 4, 5, 6, 7, 8, 9, 10, 11 or 12, preferably 1, 2, 3, 4, 5 or 6. In Table 1 the ring elements of the respective compound are coded, in Table 2 the bridging members are listed and in Table 3 the meanings of the symbols for the left-hand or right-hand side chains of the compounds are indicated.

TABLE 1 Ring elements

A

AI

B

B(S)

C

D

DI

F

FI

G

GI

K

L

LI

M

MI

N

NI

P

S

U

UI

Y

Y(F,CI)

Y(CI,F)

TABLE 2 Bridging members E —CH₂CH₂— V —CH═CH— T —C≡C— W —CF₂CF₂— Z —COO— ZI —OCO— O —CH₂O— OI —OCH₂— Q —CF₂O— QI —OCF₂—

TABLE 3 Side chains Left-hand side chain Right-hand side chain n- C_(n)H_(2n+1)— -n —C_(n)H_(2n+1) nO- C_(n)H_(2n+1)—O— -On —O—C_(n)H_(2n+1) V— CH₂═CH— —V —CH═CH₂ nV- C_(n)H_(2n+1)—CH═CH— -nV —CnH_(2n)—CH═CH₂ Vn- CH₂═CH—C_(n)H_(2n)— -Vn —CH═CH—C_(n)H_(2n+1) nVm- C_(n)H_(2n+1)—CH═CH—C_(m)H_(2m)— -nVm —C_(n)H_(2n)—CH═CH—C_(m)H_(2m+1) N— N≡C— —N —C≡N F— F— —F —F Cl— Cl— —Cl —Cl M- CFH₂— -M —CFH₂ D- CF₂H— -D —CF₂H T- CF₃— -T —CF₃ MO- CFH₂O— -OM —OCFH₂ DO- CF₂HO— -OD —OCF₂H TO- CF₃O— -OT —OCF₃ T- CF₃— -T —CF₃ A- H—C≡C— -A —C≡C—H

Besides one or more compounds of the formula I, the mixtures according to the invention preferably comprise one or more compounds of the compounds mentioned below from Table A.

TABLE A The following abbreviations are used: (n, m, m′, z: each, independently of one another, 1, 2, 3, 4, 5 or 6; (O)C_(m)H_(2m+1) means OC_(m)H_(2m+1) or C_(m)H_(2m+1))

AIK-n-F

AIY-n-Om

AY-n-Om

B-nO-Om

B-n-Om

B-n-m

B(S)-nO-Om

B(S)-n-Om

B(S)-n-m

CB(S)-n-(O)m

CB-n-m

CB-n-Om

PB-n-m

PB-nO-Om

PB-n-Om

BCH-nm

BCH-nmF

BCN-nm

C-1V-V1

CY-n-Om

CY(F,CI)-n-Om

CY(CI,F)-n-Om

CCY-n-Om

CAIY-n-Om

CCY(F,CI)-n-Om

CCY(CI,F)-n-Om

CCY-n-m

CCY-V-m

CCY-Vn-m

CCY-n-OmV

CBC-nmF

CBC-nm

CCP-V-m

CCP-Vn-m

CCP-nV-m

CCP-n-m

CPYP-n-(O)m

CYYC-n-m

CCYY-n-(O)m

CCY-n-O2V

CCH-nOm

CCC-n-m

CCC-n-V

CY-n-m

CCH-nm

CC-n-V

CC-n-V1

CC-n-Vm

CC-V-V

CC-V-V1

CC-2V-V2

CVC-n-m

CC-n-mV

CC-n-mV1

CCOC-n-m

CP-nOmFF

CH-nm

CEY-n-Om

CEY-V-n

CVY-V-n

CY-V-On

CY-n-O1V

CY-n-OC(CH₃)═CH₂

CCN-nm

CY-n-OV

CCPC-nm

CCY-n-zOm

CPY-n-Om

CPY-n-m

CPY-V-Om

CQY-n-(O)m

CQIY-n-(O)m

CCQY-n-(O)m

CCQIY-n-(O)m

CPQY-n-(O)m

CPQIY-n-(O)m

CPYG-n-(O)m

CCY-V-Om

CCY-V2-(O)m

CCY-1V2-(O)m

CCY-3V-(O)m

CCVC-n-V

CCVC-V-V

CPGP-n-m

CY-nV-(O)m

CENaph-n-Om

COChrom-n-Om

COChrom-n-m

CCOChrom-n-Om

CCOChrom-n-m

CONaph-n-Om

CCONaph-n-Om

CCNaph-n-Om

CNaph-n-Om

CETNaph-n-Om

CTNaph-n-Om

CK-n-F

CLY-n-Om

CLY-n-m

LYLI-n-m

CYLI-n-m

LY-n-(O)m

COYOICC-n-m

COYOIC-n-V

CCOY-V-O2V

CCOY-V-O3V

COY-n-Om

CCOY-n-Om

COY-V-Om

COY-1V-Om

CCOY-V-Om

CCOY-1V-Om

CPP-V-m

CCEY-n-Om

CZYY-n-Om

D-nOmFF

PCH-nm

PCH-nOm

PGIGI-n-F

PGP-n-m

PP-n-m

PP-n-2V1

PPP-n-2V1

PGP-n-2V1

PGP-n-2V

PYP-n-mV

PYP-n-m

PGIY-n-Om

PYP-n-Om

PPYY-n-m

PPGU-n-F

YPY-n-m

YPY-n-mV

PY-n-Om

PY-n-m

PY-V2-Om

DFDBC-n(O)-(O)m

Y-nO-Om

Y-nO-OmV

Y-nO-OmVm′

YG-n-Om

YG-nO-om

YGI-n-Om

YGI-nO-Om

YY-n-Om

YY-nO-Om

The liquid-crystal mixtures which can be used in accordance with the invention are prepared in a manner which is conventional per se. In general, the desired amount of the components used in lesser amount is dissolved in the components making up the principal constituent, advantageously at elevated temperature. It is also possible to mix solutions of the components in an organic solvent, for example in acetone, chloroform or methanol, and to remove the solvent again, for example by distillation, after thorough mixing.

By means of suitable additives, the liquid-crystal phases according to the invention can be modified in such a way that they can be employed in any type of, for example, ECB, VAN, IPS, GH or ASM-VA LCD display that has been disclosed to date.

The dielectrics may also comprise further additives known to the person skilled in the art and described in the literature, such as, for example, UV absorbers, antioxidants, nanoparticles and free-radical scavengers. For example, 0-15% of pleochroic dyes, stabilisers, such as, for example, phenols, HALS (hindered amine light stabilisers), or chiral dopants may be added. Suitable stabilisers for the mixtures according to the invention are, in particular, those listed in Table C.

For example, 0-15% of pleochroic dyes may be added, furthermore conductive salts, preferably ethyldimethyldodecylammonium 4-hexoxybenzoate, tetrabutylammonium tetraphenylboranate or complex salts of crown ethers (cf., for example, Haller et al., Mol. Cryst. Liq. Cryst., Volume 24, pages 249-258 (1973)), may be added in order to improve the conductivity or substances may be added in order to modify the dielectric anisotropy, the viscosity and/or the alignment of the nematic phases. Substances of this type are described, for example, in DE-A 22 09 127, 22 40 864, 23 21 632, 23 38 281, 24 50 088, 26 37 430 and 28 53 728.

TABLE B Table B indicates possible dopants which can be added to the mixtures according to the invention. If the mixtures comprise a dopant, it is added in amounts of 0.01-4% by weight, preferably 0.01-3% by weight.

C 15

CB 15

CM 21

R/S-811

CM 44

CM 45

CM 47

CN

R/S-2011

R/S-3011

R/S-4011

R/S-5011

R/S-1011

The mixtures according to the invention comprise at least one stabiliser from Table C given below.

TABLE C Stabilisers which can be added, for example, to the mixtures according to the invention in amounts of 0-10% by weight, preferably 0.001-5% by weight, in particular 0.001-1% by weight, are indicated below.

TABLE D Table D shows example compounds which can preferably be used as reactive mesogenic compounds in the LC media in accordance with the present invention. If the mixtures according to the invention comprise one or more reactive compounds, they are preferably employed in amounts of 0.01-5% by weight. It may also be necessary to add an initiator or a mixture of two or more initiators for the polymerisation. The initiator or initiator mixture is preferably added in amounts of 0.001-2% by weight, based on the mixture. A suitable initiator is, for example, Irgacure (BASF) or Irganox (BASF).

RM-1 

RM-2 

RM-3 

RM-4 

RM-5 

RM-6 

RM-7 

RM-8 

RM-9 

RM-10

RM-11

RM-12

RM-13

RM-14

RM-15

RM-16

RM-17

RM-18

RM-19

RM-20

RM-21

RM-22

RM-23

RM-24

RM-25

RM-26

RM-27

RM-28

RM-29

RM-30

RM-31

RM-32

RM-33

RM-34

RM-35

RM-36

RM-37

RM-38

RM-39

RM-40

RM-41

RM-42

RM-43

RM-44

RM-45

RM-46

RM-47

RM-48

RM-49

RM-50

RM-51

RM-52

RM-53

RM-54

RM-55

RM-56

RM-57

RM-58

RM-59

RM-60

RM-61

RM-62

RM-63

RM-64

RM-65

RM-66

RM-67

RM-68

RM-69

RM-70

RM-71

RM-72

RM-73

RM-74

RM-75

RM-76

RM-77

RM-78

RM-79

RM-80

RM-81

RM-82

RM-83

RM-84

RM-85

RM-86

RM-87

RM-88

RM-89

RM-90

RM-91

RM-92

RM-93

RM-94

RM-95

RM-96

RM-97

RM-98

RM-99

In a preferred embodiment, the mixtures according to the invention comprise one or more polymerisable compounds, preferably selected from the polymerisable compounds of the formulae RM-1 to RM-99. Media of this type are suitable, in particular, for PS-VA, PS-FFS and PS-IPS applications. Of the reactive mesogens shown in Table D, compounds RM-1, RM-2, RM-3, RM-4, RM-5, RM-11, RM-17, RM-35, RM-41, RM-44, RM-62, RM-81, RM-95 and RM-98 are particularly preferred.

WORKING EXAMPLES

The following examples are intended to explain the invention without limiting it. In the examples, m.p. denotes the melting point and C denotes the clearing point of a liquid-crystalline substance in degrees Celsius; boiling temperatures are denoted by m.p. Furthermore: C denotes crystalline solid state, S denotes smectic phase (the index denotes the phase type), N denotes nematic state, Ch denotes cholesteric phase, I denotes isotropic phase, T_(g) denotes glass-transition temperature. The number between two symbols indicates the conversion temperature in degrees Celsius an.

The host mixture used for determination of the optical anisotropy Δn of the compounds of the formula I is the commercial mixture ZLI-4792 (Merck KGaA). The dielectric anisotropy Ac is determined using commercial mixture ZLI-2857. The physical data of the compound to be investigated are obtained from the change in the dielectric constants of the host mixture after addition of the compound to be investigated and extrapolation to 100% of the compound employed. In general, 10% of the compound to be investigated are dissolved in the host mixture, depending on the solubility.

Unless indicated otherwise, parts or per cent data denote parts by weight or per cent by weight.

Above and below:

-   V_(o) denotes threshold voltage, capacitive [V] at 20° C., -   n_(e) denotes extraordinary refractive index at 20° C. and 589 nm, -   n_(o) denotes ordinary refractive index at 20° C. and 589 nm, -   Δn denotes optical anisotropy at 20° C. and 589 nm, -   ε_(⊥) denotes dielectric permittivity perpendicular to the director     at 20° C. and 1 kHz, -   ε| denotes dielectric permittivity parallel to the director at     20° C. and 1 kHz, -   Δε denotes dielectric anisotropy at 20° C. and 1 kHz, -   cl.p., T(N,I) denotes clearing point [° C], -   γ₁ denotes rotational viscosity measured at 20° C. [mPa·s],     determined by the rotation method in a magnetic field, -   K₁ denotes elastic constant, “splay” deformation at 20° C. [pN], -   K₂ denotes elastic constant, “twist” deformation at 20° C. [pN], -   K₃ denotes elastic constant, “bend” deformation at 20° C. [pN], -   LTS denotes low-temperature stability (nematic phase), determined in     test cells.

Unless explicitly noted otherwise, all values indicated in the present application for temperatures, such as, for example, the melting point T(C,N), the transition from the smectic (S) to the nematic (N) phase T(S,N) and the clearing point T(N,I), are indicated in degrees Celsius (° C.). M.p. denotes melting point, cl.p.=clearing point. Furthermore, Tg=glass state, C=crystalline state, N=nematic phase, S=smectic phase and I=isotropic phase. The numbers between these symbols represent the transition temperatures.

The term “threshold voltage” for the present invention relates to the capacitive threshold (V₀), also called the Freedericksz threshold, unless explicitly indicated otherwise. In the examples, as is generally usual, the optical threshold can also be indicated for 10% relative contrast (V₁₀).

The display used for measurement of the capacitive threshold voltage consists of two plane-parallel glass outer plates at a separation of 20 μm, which each have on the insides an electrode layer and an unrubbed polyimide alignment layer on top, which cause a homeotropic edge alignment of the liquid-crystal molecules.

The display or test cell used for measurement of the tilt angle consists of two plane-parallel glass outer plates at a separation of 4 μm, which each have on the insides an electrode layer and a polyimide alignment layer on top, where the two polyimide layers are rubbed antiparallel to one another and cause a homeotropic edge alignment of the liquid-crystal molecules.

The polymerisable compounds are polymerised in the display or test cell by irradiation with UVA light (usually 365 nm) of a defined intensity for a pre-specified time, with a voltage simultaneously being applied to the display (usually 10 V to 30 V alternating current, 1 kHz). In the examples, unless indicated otherwise, a 50 mW/cm² mercury vapour lamp is used, and the intensity is measured using a standard UV meter (make Ushio UNI meter) fitted with a 365 nm band-pass filter.

The tilt angle is determined by a rotational crystal experiment (Autronic-Melchers TBA-105). A low value (i.e. a large deviation from the 90° angle) corresponds to a large tilt here.

The VHR value is measured as follows: 0.3% of a polymerisable monomeric compound are added to the LC host mixture, and the resultant mixture is introduced into TN-VHR test cells (rubbed at 90°, alignment layer TN polyimide, layer thickness d≈6 μm). The HR value is determined after 5 min at 100° C. before and after UV exposure for 2 h (sun test) at 1 V, 60 Hz, 64 μs pulse (measuring instrument: Autronic-Melchers VHRM-105).

In order to investigate the low-temperature stability, also known as “LTS”, i.e. the stability of the LC mixture to spontaneous crystallisation-out of individual components at low temperatures, bottles containing 1 g of LC/RM mixture are stored at −10° C., and it is regularly checked whether the mixtures have crystallised out.

The so-called “HTP” denotes the helical twisting power of an optically active or chiral substance in an LC medium (in μm). Unless indicated otherwise, the HTP is measured in the commercially available nematic LC host mixture MLD-6260 (Merck KGaA) at a temperature of 20° C.

Unless explicitly noted otherwise, all concentrations in the present application are indicated in per cent by weight and relate to the corresponding mixture as a whole, comprising all solid or liquid-crystalline components, without solvents. All physical properties are determined in accordance with “Merck Liquid Crystals, Physical Properties of Liquid Crystals”, Status November 1997, Merck KGaA, Germany, and apply for a temperature of 20° C., unless explicitly indicated otherwise.

The following mixture examples having negative dielectric anisotropy are suitable, in particular, for liquid-crystal displays which have at least one planar alignment layer, such as, for example, IPS and FFS displays, in particular UB-FFS=ultra-bright FFS), and for VA displays.

MIXTURE EXAMPLES Example M1

The liquid-crystalline mixture

CC-3-V 43.00% Clearing point [° C.]: 74.5 CCY-3-O1 4.00% Δn [589 nm, 20° C.]: 0.1008 CCY-3-O2 10.00% Δε [1 kHz, 20° C.]: −3.4 CCY-4-O2 2.50% ε_(∥) [1 kHz, 20° C.]: 3.6 CPY-2-O2 10.00% K₁ [pN, 20° C.]: 13.1 CPY-3-O2 10.00% K₃ [pN, 20° C.]: 14.7 CY-3-O2 6.50% γ₁ [mPa · s, 20° C.]: 82 PY-3-O2 11.00% V₀ [20° C., V]: 2.19 B(S)—2O—O5 3.00%

additionally comprises 0.01% of ST-3a-1.

Example M2

The liquid-crystalline mixture

CC-3-V 5.00% Clearing point [° C.]: 75.5 CC-3-V1 8.00% Δn [589 nm, 20° C.]: 0.1082 CCH-23 11.50% Δε [1 kHz, 20° C.]: −3.3 CCH-34 5.00% ε_(∥) [1 kHz, 20° C.]: 3.6 CCP-3-1 10.00% K₁ [pN, 20° C.]: 15.2 CCP-3-3 5.00% K₃ [pN, 20° C.]: 16.0 CCY-3-O1 4.00% γ₁ [mPa · s, 20° C.]: 104 CCY-3-O2 11.50% V₀ [20° C., V]: 2.31 CY-3-O2 14.50% PY-3-O2 8.00% PYP-2-3 8.00% B—2O—O5 3.50% B(S)—2O—O5 3.50% PP-1-2V1 2.50%

additionally comprises 0.02% of ST-8-1.

Example M3

The liquid-crystalline mixture

CC-3-V1 8.00% Clearing point [° C.]: 74.0 CCH-23 18.00% Δn [589 nm, 20° C.]: 0.0979 CCH-34 3.00% Δε [1 kHz, 20° C.]: −3.4 CCH-35 4.00% ε_(∥) [1 kHz, 20° C.]: 3.6 CCP-3-1 14.00% K₁ [pN, 20° C.]: 15.0 CCY-3-O2 11.00% K₃ [pN, 20° C.]: 16.0 CCY-3-O1 2.00% γ₁ [mPa · s, 20° C.]: 100 CPY-3-O2 11.00% V₀ [20° C., V]: 2.28 CY-3-O2 10.00% PY-3-O2 12.00% Y—4O—O4 4.00% B(S)—2O—O5 3.00%

additionally comprises 0.02% of ST-12.

Example M4

The liquid-crystalline mixture

CC-3-V 46.00% Clearing point [° C.]: 72.5 CCY-3-O2 11.00% Δn [589 nm, 20° C.]: 0.1009 CCY-4-O2 2.50% Δε [1 kHz, 20° C.]: −3.5 CPY-2-O2 10.00% ε_(∥) [1 kHz, 20° C.]: 3.6 CPY-3-O2 10.00% K₁ [pN, 20° C.]: 13.1 CY-3-O2 5.00% K₃ [pN, 20° C.]: 14.2 PY-3-O2 8.50% γ₁ [mPa · s, 20° C.]: 78 B—2O—O5 4.00% V₀ [20° C., V]: 2.13 B(S)—2O—O5 3.00%

additionally comprises 0.02% of ST-8-1 and 0.01% of ST-3a-1.

Example M5

The liquid-crystalline mixture

CC-3-V 41.50% Clearing point [° C.]: 75.0 CCY-3-O1 5.00% Δn [589 nm, 20° C.]: 0.1016 CCY-3-O2 11.00% Δε [1 kHz, 20° C.]: −3.4 CCY-4-O2 4.00% ε_(∥) [1 kHz, 20° C.]: 3.6 CPY-2-O2 5.50% K₁ [pN, 20° C.]: 13.3 CPY-3-O2 11.00% K₃ [pN, 20° C.]: 14.8 CY-3-O2 5.00% γ₁ [mPa · s, 20° C.]: 88 PY-3-O2 12.00% V₀ [20° C., V]: 2.20 B(S)-5-O3 5.00%

additionally comprises 0.02% of ST-3a-1.

Example M6

The liquid-crystalline mixture

CC-3-V 37.00% Clearing point [° C.]: 79.0 CY-3-O2 8.50% Δn [589 nm, 20° C.]: 0.1062 CCY-3-O1 6.00% Δε [1 kHz, 20° C.]: −3.9 CCY-3-O2 10.00% ε_(∥) [1 kHz, 20° C.]: 3.7 CCY-4-O2 7.00% K₁ [pN, 20° C.]: 13.8 CPY-2-O2 3.50% K₃ [pN, 20° C.]: 15.5 CPY-3-O2 10.00% γ₁ [mPa · s, 20° C.]: 101 PYP-2-3 4.50% V₀ [20° C., V]: 2.12 PY-3-O2 9.50% B(S)—2O—O5 4.00%

additionally comprises 0.025% of ST-3a-1.

Example M7

The liquid-crystalline mixture

CC-3-V 41.00% Clearing point [° C.]: 81.0 CY-3-O2 7.00% Δn [589 nm, 20° C.]: 0.1074 CCY-3-O1 6.00% Δε [1 kHz, 20° C.]: −3.8 CCY-3-O2 10.50% ε_(∥) [1 kHz, 20° C.]: 3.7 CPY-2-O2 10.00% K₁ [pN, 20° C.]: 14.0 CPY-3-O2 11.00% K₃ [pN, 20° C.]: 15.5 PYP-2-3 4.00% γ₁ [mPa · s, 20° C.]: 97 PY-3-O2 3.50% V₀ [20° C., V]: 2.13 B—2O—O5 4.00% B(S)—2O—O5 3.00%

additionally comprises 0.025% of ST-3a-1.

Example M8

The liquid-crystalline mixture

CY-3-O2 11.00% Clearing point [° C.]: 86.0 CY-3-O4 7.00% Δn [589 nm, 20° C.]: 0.1020 PY-3-O2 3.00% Δε [1 kHz, 20° C.]: −4.9 CCY-3-O1 7.50% ε_(||) [1 kHz, 20° C.]: 3.8 CCY-3-O2 11.00% K₁ [pN, 20° C.]: 14.4 CCY-4-O2 10.00% K₃ [pN, 20° C.]: 16.5 CPY-2-O2 6.50% γ₁ [mPa · s, 20° C.]: 138 CPY-3-O2 11.00% V₀ [20° C., V]: 1.94 CC-3-V 29.00% B(S)-2O-O5 4.00%

additionally comprises 0.025% of ST-3a-1.

Example M9

For the preparation of a PS (polymer-stabilised) mixture, for example for PS-IPS, PS-VA, PS-FFS applications, 99.7% of the mixture according to Example M1 are mixed with 0.3% of the polymerisable compound of the formula

Example M10

For the preparation of a PS (polymer-stabilised) mixture, for example for PS-IPS, PS-VA, PS-FFS applications, 99.75% of the mixture according to Example M1 are mixed with 0.25% of the polymerisable compound of the formula

Example M11

For the preparation of a PS (polymer-stabilised) mixture, for example for PS-IPS, PS-VA, PS-FFS applications, 99.8% of the mixture according to Example M2 are mixed with 0.2% of the polymerisable compound of the formula

Example M12

For the preparation of a PS (polymer-stabilised) mixture, for example for PS-IPS, PS-VA, PS-FFS applications, 99.75% of the mixture according to Example M4 are mixed with 0.25% of the polymerisable compound of the formula

Example M13

For the preparation of a PS (polymer-stabilised) mixture, for example for PS-IPS, PS-VA, PS-FFS applications, 99.75% of the mixture according to Example M4 are mixed with 0.25% of the polymerisable compound of the formula

Example M14

For the preparation of a PS (polymer-stabilised) mixture, for example for PS-IPS, PS-VA, PS-FFS applications, 99.75% of the mixture according to Example M1 are mixed with 0.25% of the polymerisable compound of the formula

Example M15

For the preparation of a PS (polymer-stabilised) mixture, for example for PS-IPS, PS-VA, PS-FFS applications, 99.8% of the mixture according to Example M1 are mixed with 0.2% of the polymerisable compound of the formula

Example M16

For the preparation of a PS (polymer-stabilised) mixture, for example for PS-IPS, PS-VA, PS-FFS applications, 99.75% of the mixture according to Example M5 are mixed with 0.25% of the polymerisable compound of the formula

Example M17

The liquid-crystalline mixture

CC-3-V1 8.00% Clearing point [° C.]: 75.0 CCH-23 13.50% Δn [589 nm, 20° C.]: 0.1085 CCH-34 6.00% Δε [1 kHz, 20° C.]: −3.4 CCP-3-1 12.00% ε_(||) [1 kHz, 20° C.]: 3.5 CCP-3-3 7.00% ε_(⊥) [1 kHz, 20° C.]: 6.9 CCY-3-O2 8.50% K₁ [pN, 20° C.]: 15.5 CY-3-O2 20.50% K₃ [pN, 20° C.]: 16.0 PY-3-O2 3.50% γ₁ [mPa · s, 20° C.]: 102 PYP-2-3 8.00% V₀ [20° C., V]: 2.31 B(S)-2O-O5 4.00% B(S)-2O-O4 3.00% B(S)-2O-O6 3.00% PP-1-2V1 3.00%

additionally comprises 0.025% of ST-3a-1.

Example M18

The liquid-crystalline mixture

CC-3-V1 8.00% Clearing point [° C.]: 74.5 CCH-23 14.50% Δn [589 nm, 20° C.]: 0.1081 CCH-34 6.00% Δε [1 kHz, 20° C.]: −3.3 CCP-3-1 12.00% ε_(||) [1 kHz, 20° C.]: 3.6 CCP-3-3 7.00% ε_(⊥) [1 kHz, 20° C.]: 6.9 CCY-3-O2 9.00% K₁ [pN, 20° C.]: 15.3 CY-3-O2 18.50% K₃ [pN, 20° C.]: 15.8 PY-3-O2 4.00% γ₁ [mPa · s, 20° C.]: 101 PYP-2-3 8.00% V₀ [20° C., V]: 2.31 B-2O-O5 3.00% B(S)-2O-O5 3.00% B(S)-2O-O4 2.00% B(S)-2O-O6 2.00% PP-1-2V1 3.00%

additionally comprises 0.03% of ST-8-1.

Example M19

The liquid-crystalline mixture

CC-3-V1 8.00% Clearing point [° C.]: 72.5 CCH-23 11.50% Δn [589 nm, 20° C.]: 0.1082 CCH-34 5.00% Δε [1 kHz, 20° C.]: −3.3 CCP-3-1 14.50% ε_(||) [1 kHz, 20° C.]: 3.7 CCP-3-3 10.00% ε_(⊥) [1 kHz, 20° C.]: 7.0 CCY-3-O2 10.00% K₁ [pN, 20° C.]: 15.3 CY-3-O2 14.00% K₃ [pN, 20° C.]: 15.7 PY-3-O2 7.00% γ₁ [mPa · s, 20° C.]: 105 PGIY-2-O4 3.50% V₀ [20° C., V]: 2.28 B-2O-O5 4.00% LTS [bulk, −20° C.]: >1000 h B(S)-2O-O5 3.50% B-3-O2 4.00% PP-1-3 5.00%

additionally comprises 0.03% of ST-12.

Example M20

The liquid-crystalline mixture

CC-3-V 36.50% Clearing point [° C.]: 74.0 CC-3-V1 7.00% Δn [589 nm, 20° C.]: 0.1088 CCY-3-O1 7.50% Δε [1 kHz, 20° C.]: −3.6 CCY-3-O2 11.00% ε_(||) [1 kHz, 20° C.]: 3.7 CCY-4-O2 1.50% ε_(⊥) [1 kHz, 20° C.]: 7.3 CLY-3-O2 5.00% K₁ [pN, 20° C.]: 14.4 PGIY-2-O4 5.00% K₃ [pN, 20° C.]: 15.0 PY-3-O2 12.00% γ₁ [mPa · s, 20° C.]: 85 PY-1-O4 4.00% V₀ [20° C., V]: 2.15 PYP-2-3 3.00% LTS [bulk, −20° C.]: >1000 h PP-1-2V1 0.50% B(S)-2O-O5 4.00% B(S)-2O-O4 3.00%

additionally comprises 0.03% of ST-12.

Example M21

The liquid-crystalline mixture

CC-3-V 36.50% Clearing point [° C.]: 75.0 CC-3-V1 7.00% Δn [589 nm, 20° C.]: 0.1088 CCY-3-O1 7.50% Δε [1 kHz, 20° C.]: −3.7 CCY-3-O2 11.00% ε_(||) [1 kHz, 20° C.]: 3.7 CCY-4-O2 2.50% ε_(⊥) [1 kHz, 20° C.]: 7.3 CLY-3-O2 5.00% K₁ [pN, 20° C.]: 14.7 PGIY-2-O4 5.00% K₃ [pN, 20° C.]: 15.2 PY-3-O2 12.00% γ₁ [mPa · s, 20° C.]: 86 PY-1-O4 1.00% V₀ [20° C., V]: 2.15 PYP-2-3 3.00% PP-1-2V1 1.50% B-2O-O5 4.00% B(S)-2O-O4 4.00%

additionally comprises 0.03% of ST-12.

Example M22

The liquid-crystalline mixture

CC-3-V 36.50% Clearing point [° C.]: 75.0 CC-3-V1 7.00% Δn [589 nm, 20° C.]: 0.1083 CCY-3-O1 7.50% Δε [1 kHz, 20° C.]: −3.6 CCY-3-O2 11.00% ε_(||) [1 kHz, 20° C.]: 3.7 CCY-4-O2 2.50% ε_(⊥) [1 kHz, 20° C.]: 7.3 CLY-3-O2 5.00% K₁ [pN, 20° C.]: 14.5 PGIY-2-O4 5.00% K₃ [pN, 20° C.]: 15.2 PY-3-O2 12.00% γ₁ [mPa · s, 20° C.]: 86 PY-1-O4 1.00% V₀ [20° C., V]: 2.16 PYP-2-3 3.00% PP-1-2V1 1.50% B-2O-O5 4.00% B(S)-2O-O5 4.00%

additionally comprises 0.015% of ST-8-1.

Example M23

The liquid-crystalline mixture

CC-3-V 41.50% Clearing point [° C.]: 75.0 CC-3-V1 7.00% Δn [589 nm, 20° C.]: 0.0985 CCY-3-O1 8.00% Δε [1 kHz, 20° C.]: −3.2 CCY-3-O2 11.00% ε_(||) [1 kHz, 20° C.]: 3.6 CCY-4-O2 4.50% ε_(⊥) [1 kHz, 20° C.]: 6.8 CY-3-O2 3.50% K₁ [pN, 20° C.]: 13.8 PY-3-O2 14.50% K₃ [pN, 20° C.]: 15.0 B(S)-2O-O5 5.00% γ₁ [mPa · s, 20° C.]: 80 PGIY-2-O4 5.00% V₀ [20° C., V]: 2.29 LTS [bulk, −25° C.]: >1000 h

additionally comprises 0.015% of ST-9-1.

Example M24

The liquid-crystalline mixture

CC-3-V1 8.00% Clearing point [° C.]: 74.0 CCH-23 18.00% Δn [589 nm, 20° C.]: 0.0979 CCH-34 3.00% Δε [1 kHz, 20° C.]: −3.4 CCH-35 4.00% ε_(||) [1 kHz, 20° C.]: 3.6 CCP-3-1 14.00% ε_(⊥) [1 kHz, 20° C.]: 7.0 CCY-3-O2 11.00% K₁ [pN, 20° C.]: 15.0 CCY-3-O1 2.00% K₃ [pN, 20° C.]: 16.0 CPY-3-O2 11.00% γ₁ [mPa · s, 20° C.]: 100 CY-3-O2 10.00% V₀ [20° C., V]: 2.28 PY-3-O2 12.00% Y-4O-O4 4.00% B(S)-2O-O5 3.00%

additionally comprises 0.03% of ST-2a-1.

Example M25

The liquid-crystalline mixture

CC-3-V1 8.50% Clearing point [° C.]: 74.5 CCH-23 18.00% Δn [589 nm, 20° C.]: 0.0986 CCH-35 5.50% Δε [1 kHz, 20° C.]: −3.4 CCP-3-1 13.00% ε_(||) [1 kHz, 20° C.]: 3.6 CCY-3-O1 5.00% ε_(⊥) [1 kHz, 20° C.]: 6.9 CCY-3-O2 10.00% K₁ [pN, 20° C.]: 15.3 CPY-3-O2 10.50% K₃ [pN, 20° C.]: 15.8 CY-3-O2 10.00% γ₁ [mPa · s, 20° C.]: 95 Y-4O-O4 6.00% V₀ [20° C., V]: 2.30 B(S)-2O-O5 4.00% PP-1-3 6.40% B(S)-2O-O4 3.00%

additionally comprises 0.03% of ST-2a-1 and 0.02% of ST-3a-1.

Example M26

The liquid-crystalline mixture

CC-3-V1 8.00% Clearing point [° C.]: 73.5 CCH-23 18.00% Δn [589 nm, 20° C.]: 0.0979 CCH-35 5.00% Δε [1 kHz, 20° C.]: −3.3 CCH-34 1.00% ε_(||) [1 kHz, 20° C.]: 3.6 CCP-3-1 13.00% ε_(⊥) [1 kHz, 20° C.]: 6.9 CCY-3-O1 5.00% K₁ [pN, 20° C.]: 15.2 CCY-3-O2 10.00% K₃ [pN, 20° C.]: 15.7 CPY-3-O2 10.00% γ₁ [mPa · s, 20° C.]: 95 CY-3-O2 11.00% V₀ [20° C., V]: 2.30 Y-4O-O4 5.50% B(S)-2O-O5 3.00% PP-1-3 6.50% B(S)-2O-O4 2.00% B(S)-2O-O6 2.00%

additionally comprises 0.01% of ST-3b-1.

Example M27

The liquid-crystalline mixture

CC-3-V 42.00% Clearing point [° C.]: 74.0 CCY-3-O2 11.00% Δn [589 nm, 20° C.]: 0.1008 CPY-2-O2 10.00% Δε [1 kHz, 20° C.]: −3.7 CPY-3-O2 11.00% ε_(||) [1 kHz, 20° C.]: 3.7 CY-3-O3 17.00% ε_(⊥) [1 kHz, 20° C.]: 7.3 PGIY-2-O4 5.00% K₁ [pN, 20° C.]: 12.8 B(S)-2O-O5 4.00% K₃ [pN, 20° C.]: 14.6 γ₁ [mPa · s, 20° C.]: 86 V₀ [20° C., V]: 2.11

additionally comprises 0.02% of ST-8-1.

Example M28

The liquid-crystalline mixture

CC-3-V 42.00% Clearing point [° C.]: 73.0 CCY-3-O2 11.00% Δn [589 nm, 20° C.]: 0.1004 CPY-2-O2 9.00% Δε [1 kHz, 20° C.]: −3.7 CPY-3-O2 11.00% ε_(||) [1 kHz, 20° C.]: 3.7 PGIY-2-O4 5.50% ε_(⊥) [1 kHz, 20° C.]: 7.3 CY-3-O2 17.50% K₁ [pN, 20° C.]: 12.7 B(S)-2O-O5 2.00% K₃ [pN, 20° C.]: 14.5 B(S)-2O-O4 2.00% γ₁ [mPa · s, 20° C.]: 85 V₀ [20° C., V]: 2.10

additionally comprises 0.02% of ST-8-1.

Example M29

The liquid-crystalline mixture

CC-3-V 44.50% Clearing point [° C.]: 74.0 CCY-3-O2 11.00% Δn [589 nm, 20° C.]: 0.1010 CPY-2-O2 9.50% Δε [1 kHz, 20° C.]: −3.7 CPY-3-O2 11.00% ε_(||) [1 kHz, 20° C.]: 3.7 CY-3-O2 13.00% ε_(⊥) [1 kHz, 20° C.]: 7.4 PGIY-2-O4 4.00% K₁ [pN, 20° C.]: 13.0 B-2O-O5 4.00% K₃ [pN, 20° C.]: 14.5 B-2O-O4 3.00% γ₁ [mPa · s, 20° C.]: 83 V₀ [20° C., V]: 2.09

additionally comprises 0.02% of ST-8-1.

Example M30

The liquid-crystalline mixture

CC-3-V 42.00% Clearing point [° C.]: 80.5 CY-3-O2 11.50% Δn [589 nm, 20° C.]: 0.1070 CCY-3-O2 10.00% Δε [1 kHz, 20° C.]: −3.7 CCY-4-O2 4.00% ε_(||) [1 kHz, 20° C.]: 3.6 CPY-2-O2 6.50% ε_(⊥) [1 kHz, 20° C.]: 7.4 CPY-3-O2 11.00% K₁ [pN, 20° C.]: 13.9 PGIY-2-O4 5.00% K₃ [pN, 20° C.]: 15.2 PYP-2-3 3.00% γ₁ [mPa · s, 20° C.]: 94 B(S)-2O-O5 4.00% V₀ [20° C., V]: 2.14 B(S)-2O-O4 3.00%

additionally comprises 0.02% of ST-8-1.

Example M31

The liquid-crystalline mixture

CC-3-V 32.50% Clearing point [° C.]: 80.5 CCP-3-1 6.50% Δn [589 nm, 20° C.]: 0.1031 CCY-3-O2 10.00% Δε [1 kHz, 20° C.]: −4.4 CLY-3-O2 5.00% ε_(||) [1 kHz, 20° C.]: 3.8 CLY-3-O3 4.00% ε_(⊥) [1 kHz, 20° C.]: 8.2 CPY-3-O2 9.50% K₁ [pN, 20° C.]: 14.4 CY-3-O2 21.50% K₃ [pN, 20° C.]: 16.6 PGIY-2-O4 4.00% γ₁ [mPa · s, 20° C.]: 109 B(S)-2O-O5 3.00% V₀ [20° C., V]: 2.05 B(S)-2O-O4 4.00%

additionally comprises 0.02% of ST-12.

Example M32

The liquid-crystalline mixture

CC-3-V 32.00% Clearing point [° C.]: 81.0 CCP-3-1 8.00% Δn [589 nm, 20° C.]: 0.1031 CCY-3-O2 10.00% Δε [1 kHz, 20° C.]: −4.5 CLY-3-O2 5.00% ε_(||) [1 kHz, 20° C.]: 3.8 CLY-3-O3 3.00% ε_(⊥) [1 kHz, 20° C.]: 8.2 CPY-3-O2 10.00% K₁ [pN, 20° C.]: 14.8 CY-3-O2 21.00% K₃ [pN, 20° C.]: 16.9 PGIY-2-O4 3.00% γ₁ [mPa · s, 20° C.]: 110 B-2O-O5 2.00% V₀ [20° C., V]: 2.05 B(S)-2O-O5 2.00% B(S)-2O-O4 2.00% B(S)-2O-O6 2.00%

additionally comprises 0.02% of ST-8-1.

Example M33

The liquid-crystalline mixture

CC-3-V 33.00% Clearing point [° C.]: 80.5 CCP-3-1 6.00% Δn [589 nm, 20° C.]: 0.1031 CCY-3-O2 10.50% Δε [1 kHz, 20° C.]: −4.5 CLY-3-O2 5.00% ε_(||) [1 kHz, 20° C.]: 3.8 CLY-3-O3 4.00% ε_(⊥) [1 kHz, 20° C.]: 8.2 CPY-3-O2 10.00% K₁ [pN, 20° C.]: 14.3 CY-3-O2 20.50% K₃ [pN, 20° C.]: 16.6 PGIY-2-O4 4.00% γ₁ [mPa · s, 20° C.]: 109 B-2O-O5 2.00% V₀ [20° C., V]: 2.04 B(S)-2O-O5 2.00% B(S)-2O-O4 3.00%

additionally comprises 0.02% of ST-9-1 and 0.02% of ST-3b-1.

Example M34

The liquid-crystalline mixture

CC-3-V 33.00% Clearing point [° C.]: 80.0 CCP-3-1 6.50% Δn [589 nm, 20° C.]: 0.1030 CCY-3-O2 10.50% Δε [1 kHz, 20° C.]: −4.4 CLY-3-O2 5.00% ε_(||) [1 kHz, 20° C.]: 3.8 CLY-3-O3 3.50% ε_(⊥) [1 kHz, 20° C.]: 8.2 CPY-3-O2 10.00% K₁ [pN, 20° C.]: 14.3 CY-3-O2 20.50% K₃ [pN, 20° C.]: 16.6 PGIY-2-O4 4.00% γ₁ [mPa · s, 20° C.]: 108 B-2O-O5 3.00% V₀ [20° C., V]: 2.04 B(S)-2O-O4 4.00%

additionally comprises 0.01% of ST-9-1.

Example M35

The liquid-crystalline mixture

CC-3-V 38.50% Clearing point [° C.]: 79.5 CCY-3-O1 4.00% Δn [589 nm, 20° C.]: 0.1034 CCY-3-O2 10.00% Δε [1 kHz, 20° C.]: −4.4 CLY-3-O2 7.00% ε_(||) [1 kHz, 20° C.]: 3.8 CLY-3-O3 3.00% ε_(⊥) [1 kHz, 20° C.]: 8.2 CPY-2-O2 4.00% K₁ [pN, 20° C.]: 14.4 CPY-3-O2 10.00% K₃ [pN, 20° C.]: 15.9 CY-3-O2 9.50% γ₁ [mPa · s, 20° C.]: 102 PY-3-O2 6.00% V₀ [20° C., V]: 2.01 B(S)-2O-O5 4.00% B-2O-O5 4.00%

additionally comprises 0.01% of ST-8-1.

Example M36

For the preparation of a PS (polymer-stabilised) mixture, for example for PS-IPS, PS-VA, PS-FFS applications, 99.7% of the mixture according to Example M17 are mixed with 0.3% of the polymerisable compound of the formula

Example M37

For the preparation of a PS (polymer-stabilised) mixture, for example for PS-IPS, PS-VA, PS-FFS applications, 99.75% of the mixture according to Example M17 are mixed with 0.25% of the polymerisable compound of the formula

Example M38

For the preparation of a PS (polymer-stabilised) mixture, for example for PS-IPS, PS-VA, PS-FFS applications, 99.8% of the mixture according to Example M17 are mixed with 0.2% of the polymerisable compound of the formula

Example M39

For the preparation of a PS (polymer-stabilised) mixture, for example for PS-IPS, PS-VA, PS-FFS applications, 99.75% of the mixture according to Example M17 are mixed with 0.25% of the polymerisable compound of the formula

Example M40

For the preparation of a PS (polymer-stabilised) mixture, for example for PS-IPS, PS-VA, PS-FFS applications, 99.75% of the mixture according to Example M17 are mixed with 0.25% of the polymerisable compound of the formula

Example M41

For the preparation of a PS (polymer-stabilised) mixture, for example for PS-IPS, PS-VA, PS-FFS applications, 99.75% of the mixture according to Example M17 are mixed with 0.25% of the polymerisable compound of the formula

Example M42

For the preparation of a PS (polymer-stabilised) mixture, for example for PS-IPS, PS-VA, PS-FFS applications, 99.8% of the mixture according to Example M17 are mixed with 0.2% of the polymerisable compound of the formula

Example M43

For the preparation of a PS (polymer-stabilised) mixture, for example for PS-IPS, PS-VA, PS-FFS applications, 99.7% of the mixture according to Example M19 are mixed with 0.3% of the polymerisable compound of the formula

Example M44

For the preparation of a PS (polymer-stabilised) mixture, for example for PS-IPS, PS-VA, PS-FFS applications, 99.75% of the mixture according to Example M19 are mixed with 0.25% of the polymerisable compound of the formula

Example M45

For the preparation of a PS (polymer-stabilised) mixture, for example for PS-IPS, PS-VA, PS-FFS applications, 99.8% of the mixture according to Example M19 are mixed with 0.2% of the polymerisable compound of the formula

Example M46

For the preparation of a PS (polymer-stabilised) mixture, for example for PS-IPS, PS-VA, PS-FFS applications, 99.75% of the mixture according to Example M19 are mixed with 0.001% of Irganox and 0.25% of the polymerisable compound of the formula

Example M47

For the preparation of a PS (polymer-stabilised) mixture, for example for PS-IPS, PS-VA, PS-FFS applications, 99.75% of the mixture according to Example M19 are mixed with 0.25% of the polymerisable compound of the formula

Example M48

For the preparation of a PS (polymer-stabilised) mixture, for example for PS-IPS, PS-VA, PS-FFS applications, 99.75% of the mixture according to Example M19 are mixed with 0.25% of the polymerisable compound of the formula

Example M49

For the preparation of a PS (polymer-stabilised) mixture, for example for PS-IPS, PS-VA, PS-FFS applications, 99.8% of the mixture according to Example M19 are mixed with 0.2% of the polymerisable compound of the formula

Example M50

For the preparation of a PS (polymer-stabilised) mixture, for example for PS-IPS, PS-VA, PS-FFS applications, 99.75% of the mixture according to Example M19 are mixed with 0.25% of the polymerisable compound of the formula

Example M51

For the preparation of a PS (polymer-stabilised) mixture, for example for PS-IPS, PS-VA, PS-FFS applications, 99.7% of the mixture according to Example M22 are mixed with 0.3% of the polymerisable compound of the formula

Example M52

For the preparation of a PS (polymer-stabilised) mixture, for example for PS-IPS, PS-VA, PS-FFS applications, 99.75% of the mixture according to Example M22 are mixed with 0.25% of the polymerisable compound of the formula

Example M53

For the preparation of a PS (polymer-stabilised) mixture, for example for PS-IPS, PS-VA, PS-FFS applications, 99.8% of the mixture according to Example M22 are mixed with 0.2% of the polymerisable compound of the formula

Example M54

For the preparation of a PS (polymer-stabilised) mixture, for example for PS-IPS, PS-VA, PS-FFS applications, 99.75% of the mixture according to Example M22 are mixed with 0.25% of the polymerisable compound of the formula

Example M55

For the preparation of a PS (polymer-stabilised) mixture, for example for PS-IPS, PS-VA, PS-FFS applications, 99.75% of the mixture according to Example M22 are mixed with 0.25% of the polymerisable compound of the formula

Example M56

For the preparation of a PS (polymer-stabilised) mixture, for example for PS-IPS, PS-VA, PS-FFS applications, 99.75% of the mixture according to Example M22 are mixed with 0.25% of the polymerisable compound of the formula

Example M57

For the preparation of a PS (polymer-stabilised) mixture, for example for PS-IPS, PS-VA, PS-FFS applications, 99.8% of the mixture according to Example M22 are mixed with 0.2% of the polymerisable compound of the formula

Example M58

For the preparation of a PS (polymer-stabilised) mixture, for example for PS-IPS, PS-VA, PS-FFS applications, 99.8% of the mixture according to Example M28 are mixed with 0.2% of the polymerisable compound of the formula

Example M59

For the preparation of a PS (polymer-stabilised) mixture, for example for PS-IPS, PS-VA, PS-FFS applications, 99.75% of the mixture according to Example M28 are mixed with 0.25% of the polymerisable compound of the formula

Example M60

For the preparation of a PS (polymer-stabilised) mixture, for example for PS-IPS, PS-VA, PS-FFS applications, 99.7% of the mixture according to Example M33 are mixed with 0.3% of the polymerisable compound of the formula

Example M61

For the preparation of a PS (polymer-stabilised) mixture, for example for PS-IPS, PS-VA, PS-FFS applications, 99.7% of the mixture according to Example M33 are mixed with 0.3% of the polymerisable compound of the formula

Example M62

For the preparation of a PS (polymer-stabilised) mixture, for example for PS-IPS, PS-VA, PS-FFS applications, 99.8% of the mixture according to Example M33 are mixed with 0.2% of the polymerisable compound of the formula

and 0.2% of the polymerisable compound

Example M63

The liquid-crystalline mixture

CC-3-V 41.00% Clearing point [° C.]: 74.0 CCY-3-O2 11.00% Δn [589 nm, 20° C.]: 0.1005 CCY-3-O1 2.50% Δε [1 kHz, 20° C.]: −3.7 CLY-3-O2 4.00% ε_(||) [1 kHz, 20° C.]: 3.7 CLY-3-O3 4.00% K₁ [pN, 20° C.]: 13.3 CPY-2-O2 4.00% K₃ [pN, 20° C.]: 15.0 CPY-3-O2 11.00% γ₁ [mPa · s, 20° C.]: 87 CY-3-O2 7.50% V₀ [20° C., V]: 2.14 PY-3-O2 12.00% B-3O-O5 3.00%

additionally comprises 0.025% of ST-8-1.

Example M64

The liquid-crystalline mixture

CC-3-V 42.00% Clearing point [° C.]: 73.5 CCY-3-O1 5.00% Δn [589 nm, 20° C.]: 0.1009 CCY-3-O2 10.00% Δε [1 kHz, 20° C.]: −3.5 CCY-4-O2 2.50% ε_(||) [1 kHz, 20° C.]: 3.6 CPY-2-O2 10.00% K₁ [pN, 20° C.]: 12.9 CPY-3-O2 10.00% K₃ [pN, 20° C.]: 14.5 CY-3-O2 6.50% γ₁ [mPa · s, 20° C.]: 88 PY-3-O2 11.00% V₀ [20° C., V]: 2.14 B-3O-O5 3.00%

additionally comprises 0.025% of ST-12.

Example M65

The liquid-crystalline mixture

CC-3-V 43.00% Clearing point [° C.]: 73.5 CCY-3-O1 5.00% Δn [589 nm, 20° C.]: 0.1011 CCY-3-O2 10.00% Δε [1 kHz, 20° C.]: −3.6 CCY-4-O2 2.00% ε_(||) [1 kHz, 20° C.]: 3.7 CPY-2-O2 10.00% K₁ [pN, 20° C.]: 13.3 CPY-3-O2 10.00% K₃ [pN, 20° C.]: 14.7 CY-3-O2 5.00% γ₁ [mPa · s, 20° C.]: 83 PY-3-O2 11.00% V₀ [20° C., V]: 2.14 B-3O-O5 4.00%

additionally comprises 0.025% of ST-3a-1.

Example M66

The liquid-crystalline mixture

CC-3-V 40.50% Clearing point [° C.]: 74.0 CCY-3-O1 5.00% Δn [589 nm, 20° C.]: 0.1005 CCY-3-O2 10.00% Δε [1 kHz, 20° C.]: −3.6 CCY-4-O2 3.50% ε_(||) [1 kHz, 20° C.]: 3.6 CPY-2-O2 10.00% K₁ [pN, 20° C.]: 12.9 CPY-3-O2 10.00% K₃ [pN, 20° C.]: 14.6 CY-3-O2 8.00% γ₁ [mPa · s, 20° C.]: 88 PY-3-O2 11.00% V₀ [20° C., V]: 2.14 B-3O-O4 2.00%

additionally comprises 0.025% of ST-12.

Example M67

The liquid-crystalline mixture

CC-3-V 42.00% Clearing point [° C.]: 73.5 CCY-3-O1 5.00% Δn [589 nm, 20° C.]: 0.1011 CCY-3-O2 10.00% Δε [1 kHz, 20° C.]: −3.6 CCY-4-O2 2.50% ε_(||) [1 kHz, 20° C.]: 3.7 CPY-2-O2 10.00% K₁ [pN, 20° C.]: 12.9 CPY-3-O2 10.00% K₃ [pN, 20° C.]: 14.6 CY-3-O2 6.50% γ₁ [mPa · s, 20° C.]: 85 PY-3-O2 11.00% V₀ [20° C., V]: 2.14 B-2O-O4 3.00%

additionally comprises 0.03% of ST-2a-1.

Example M68

The liquid-crystalline mixture

CC-3-V 42.00% Clearing point [° C.]: 73.5 CCY-3-O1 5.00% Δn [589 nm, 20° C.]: 0.1001 CCY-3-O2 10.00% Δε [1 kHz, 20° C.]: −3.5 CCY-4-O2 2.50% ε_(||) [1 kHz, 20° C.]: 3.6 CPY-2-O2 10.00% K₁ [pN, 20° C.]: 13.0 CPY-3-O2 10.00% K₃ [pN, 20° C.]: 14.5 CY-3-O2 6.50% γ₁ [mPa · s, 20° C.]: 84 PY-3-O2 11.00% V₀ [20° C., V]: 2.15 B-3O-O6 3.00%

additionally comprises 0.025% of ST-8-1.

Example M69

The liquid-crystalline mixture

CC-3-V 42.00% Clearing point [° C.]: 73.5 CCY-3-O1 5.00% Δn [589 nm, 20° C.]: 0.1007 CCY-3-O2 10.00% Δε [1 kHz, 20° C.]: −3.5 CCY-4-O2 2.50% ε_(||) [1 kHz, 20° C.]: 3.7 CPY-2-O2 10.00% K₁ [pN, 20° C.]: 12.9 CPY-3-O2 10.00% K₃ [pN, 20° C.]: 14.6 CY-3-O2 6.50% γ₁ [mPa · s, 20° C.]: 84 PY-3-O2 11.00% V₀ [20° C., V]: 2.15 B-2O-O5 3.00%

additionally comprises 0.025% of ST-8-1.

Comparison VHR after UV M69 without stabiliser 60% M69 with stabiliser 79% (0.025% of ST-8-1)

Example M70

The liquid-crystalline mixture

CC-3-V 45.50% Clearing point [° C.]: 73.0 CCY-3-O1 3.00% Δn [589 nm, 20° C.]: 0.1011 CCY-3-O2 11.00% Δε [1 kHz, 20° C.]: −3.5 CCY-4-O2 3.50% ε_(||) [1 kHz, 20° C.]: 3.6 CPY-2-O2 7.50% K₁ [pN, 20° C.]: 13.1 CPY-3-O2 10.00% K₃ [pN, 20° C.]: 14.3 CY-3-O2 2.00% γ₁ [mPa · s, 20° C.]: 79 PY-3-O2 11.50% V₀ [20° C., V]: 2.15 B-2O-O5 6.00%

additionally comprises 0.025% of ST-8-1.

Example M71

The liquid-crystalline mixture

CC-3-V 42.00% Clearing point [° C.]: 73.5 CCY-3-O1 5.00% Δn [589 nm, 20° C.]: 0.0993 CCY-3-O2 10.00% Δε [1 kHz, 20° C.]: −3.5 CCY-4-O2 2.50% ε_(||) [1 kHz, 20° C.]: 3.6 CPY-2-O2 10.00% K₁ [pN, 20° C.]: 12.9 CPY-3-O2 10.00% K₃ [pN, 20° C.]: 14.5 CY-3-O2 6.50% γ₁ [mPa · s, 20° C.]: 84 PY-3-O2 11.00% V₀ [20° C., V]: 2.14 B-3O-O3 3.00%

additionally comprises 0.025% of ST-8-1.

Example M72

The liquid-crystalline mixture

CC-3-V 45.50% Clearing point [° C.]: 73.5 CCY-3-O1 3.00% Δn [589 nm, 20° C.]: 0.1009 CCY-3-O2 11.00% Δε [1 kHz, 20° C.]: −3.5 CCY-4-O2 3.00% ε_(∥) [1 kHz, 20° C.]: 3.6 CPY-2-O2 8.50% K₁ [pN, 20° C.]: 13.2 CPY-3-O2 10.00% K₃ [pN, 20° C.]: 14.3 CY-3-O2 2.00% γ₁ [mPa · s, 20° C.]: 80 PY-3-O2 11.00% V₀ [20° C., V]: 2.15 B—2O—O5 3.00% B—3O—O5 3.00%

additionally comprises 0.025% of ST-8-1.

Example M73

The liquid-crystalline mixture

CC-3-V 35.50% Clearing point [° C.]: 73.0 CCY-3-O1 6.00% Δn [589 nm, 20° C.]: 0.1006 CCY-3-O2 11.00% Δε [1 kHz, 20° C.]: −4.4 CCY-4-O2 6.50% ε_(∥) [1 kHz, 20° C.]: 3.9 CPY-2-O2 4.00% K₁ [pN, 20° C.]: 12.9 CPY-3-O2 10.00% K₃ [pN, 20° C.]: 14.6 CY-3-O2 12.00% γ₁ [mPa · s, 20° C.]: 99 PY-3-O2 10.00% V₀ [20° C., V]: 1.93 B—3O—O5 2.50% B—3O—O4 2.50%

additionally comprises 0.025% of ST-3a-1.

Example M74

The liquid-crystalline mixture

CC-3-V 34.50% Clearing point [° C.]: 75.0 CC-3-V1 8.00% Δn [589 nm, 20° C.]: 0.1084 CCY-3-O1 6.00% Δε [1 kHz, 20° C.]: −3.1 CCY-3-O2 11.50% ε_(∥) [1 kHz, 20° C.]: 3.5 CCY-4-O2 3.50% K₁ [pN, 20° C.]: 14.3 CPY-3-O2 11.50% K₃ [pN, 20° C.]: 15.9 PY-3-O2 16.00% γ₁ [mPa · s, 20° C.]: 87 PYP-2-3 3.00% V₀ [20° C., V]: 2.40 PP-1-2V1 3.00% B—3O—O5 3.00%

additionally comprises 0.02% of ST-2a-1.

Example M75

The liquid-crystalline mixture

CC-3-V 34.50% Clearing point [° C.]: 75.0 CC-3-V1 8.00% Δn [589 nm, 20° C.]: 0.1075 CCY-3-O1 7.00% Δε [1 kHz, 20° C.]: −3.1 CCY-3-O2 11.50% ε_(∥) [1 kHz, 20° C.]: 3.5 CCY-4-O2 3.50% K₁ [pN, 20° C.]: 14.7 CPY-3-O2 11.50% K₃ [pN, 20° C.]: 16.4 PY-3-O2 13.00% γ₁ [mPa · s, 20° C.]: 84 PP-1-2V1 6.00% V₀ [20° C., V]: 2.41 B—2O—O5 5.00%

additionally comprises 0.02% of ST-8-1.

Example M76

The liquid-crystalline mixture

CC—V—V 37.00% Clearing point [° C.]: 73.5 CC—V—V1 10.00% Δn [589 nm, 20° C.]: 0.1026 CCVC—V—V 7.00% Δε [1 kHz, 20° C.]: −3.0 CCVC-3-V 7.00% ε_(∥) [1 kHz, 20° C.]: 3.7 CCC-2-V 3.00% K₁ [pN, 20° C.]: 11.8 CCC-3-V 4.00% K₃ [pN, 20° C.]: 11.9 B—4O—O4 3.00% γ₁ [mPa · s, 20° C.]: 57 B—3O—O4 8.50% V₀ [20° C., V]: 2.10 B—3O—O5 8.50% PB-3-O4 7.00% CB-3-O4 5.00%

additionally comprises 0.02% of ST-8-1.

Example M77

The liquid-crystalline mixture

CC—V—V 18.00%% Clearing point [° C.]: 77.8 CC-3-V 21.00% Δn [589 nm, 20° C.]: 0.1040 CC—V—V1 10.00% Δε [1 kHz, 20° C.]: −3.2 CCVC—V—V 7.00% ε_(∥) [1 kHz, 20° C.]: 3.7 CCVC-3-V 7.00% K₁ [pN, 20° C.]: 13.3 CCC-2-V 2.00% K₃ [pN, 20° C.]: 12.2 CCC-3-V 3.00% γ₁ [mPa · s, 20° C.]: 64 B—4O—O4 3.00% V₀ [20° C., V]: 2.07 B—3O—O4 8.50% B—3O—O5 8.50% PB-3-O4 7.00% CB-3-O4 5.00%

additionally comprises 0.02% of ST-12.

Example M78

The liquid-crystalline mixture

CC—V—V 38.00% Clearing point [° C.]: 74.0 CCVC—V—V 5.00% Δn [589 nm, 20° C.]: 0.1119 CCVC-3-V 10.00% Δε [1 kHz, 20° C.]: −4.8 CCC-2-V 3.00% ε_(∥) [1 kHz, 20° C.]: 4.3 CCC-3-V 4.00% K₁ [pN, 20° C.]: 12.3 B—4O—O4 2.00% K₃ [pN, 20° C.]: 11.0 B—3O—O4 5.00% γ₁ [mPa · s, 20° C.]: 76 B—3O—O5 7.00% V₀ [20° C., V]: 1.60 PB-3-O4 6.00% CB-3-O4 7.00% B—2O—O5 8.00% B—2O—O6 5.00%

additionally comprises 0.025% of ST-8-1.

Example M79

The liquid-crystalline mixture

CC—V—V 25.00% Clearing point [° C.]: 81.0 CCVC—V—V 4.00% Δn [589 nm, 20° C.]: 0.1068 CCVC-3-V 9.00% Δε [1 kHz, 20° C.]: −4.2 CCC-2-V 3.00% ε_(∥) [1 kHz, 20° C.]: 4.1 CCC-3-V 3.00% K₁ [pN, 20° C.]: 14.6 B—3O—O4 4.00% K₃ [pN, 20° C.]: 11.8 B—3O—O5 5.00% γ₁ [mPa · s, 20° C.]: 90 PB-3-O4 4.00% V₀ [20° C., V]: 1.70 CB-3-O4 7.00% B—2O—O5 6.00% B—2O—O6 5.00% B—2O—O4 3.00% B—1O—O4 3.00% CCOC-3-3 3.00% CCH-23 3.00% CCH-34 10.00% CCOC-4-3 3.00%

additionally comprises 0.02% of ST-8-1 and 0.1% of ST-3a-1.

Example M80

The liquid-crystalline mixture

CC—V—V 28.00% Clearing point [° C.]: 55.5 CCVC—V—V 5.00% Δε [1 kHz, 20° C.]: −7.6 CCVC-3-V 10.00% ε_(∥) [1 kHz, 20° C.]: 5.8 CCC-2-V 3.00% K₁ [pN, 20° C.]: 11.1 CCC-3-V 3.00% K₃ [pN, 20° C.]: 8.6 B—4O—O4 3.00% γ₁ [mPa · s, 20° C.]: 90 B—3O—O4 4.00% V₀ [20° C., V]: 1.12 B—3O—O5 3.00% B—4O—O5 3.00% B—2O—O4 3.00% B—2O—O5 5.00% B—2O—O6 3.00% B—1O—O5 3.00% B—3O—O3 4.00% B—3O—O6 3.00% B—1O—O4 5.00% B—2O—O5i 5.00% CCP—V-1 7.00%

additionally comprises 0.02% of ST-8-1.

Example M81

The liquid-crystalline mixture

CC—V—V 35.00% Clearing point [° C.]: 67.5 CCVC—V—V 5.00% Δε [1 kHz, 20° C.]: −6.2 CCVC-3-V 8.00% ε_(∥) [1 kHz, 20° C.]: 4.8 CCC-2-V 3.00% K₁ [pN, 20° C.]: 11.9 CCC-3-V 4.00% K₃ [pN, 20° C.]: 9.6 B—4O—O4 2.00% γ₁ [mPa · s, 20° C.]: 86 B—3O—O4 5.00% V₀ [20° C., V]: 1.32 B—3O—O5 7.00% PB-3-O4 6.00% CB-3-O4 7.00% B—2O—O5 8.00% B—2O—O6 5.00% B—3O—O3 5.00%

additionally comprises 0.02% of ST-8-1.

Example M82

The liquid-crystalline mixture

CC—V—V 35.00% Clearing point [° C.]: 67.5 CCVC—V—V 5.00% Δε [1 kHz, 20° C.]: −6.2 CCVC-3-V 8.00% ε_(∥) [1 kHz, 20° C.]: 4.8 CCC-2-V 3.00% K₁ [pN, 20° C.]: 11.9 CCC-3-V 4.00% K₃ [pN, 20° C.]: 9.6 B—4O—O4 2.00% γ₁ [mPa · s, 20° C.]: 86 B—3O—O4 5.00% V₀ [20° C., V]: 1.32 B—3O—O5 7.00% PB-3-O4 6.00% CB-3-O4 7.00% B—2O—O5 8.00% B—2O—O6 5.00% B—3O—O3 5.00%

additionally comprises 0.03% of ST-12.

Example M83

The liquid-crystalline mixture

CC-3-V 10.00% Clearing point [° C.]: 74.5 CC-3-V1 8.00% Δn [589 nm, 20° C.]: 0.1078 CCH-23 10.00% Δε [1 kHz, 20° C.]: −3.3 CCH-34 5.00% ε_(∥) [1 kHz, 20° C.]: 3.5 CCP-3-1 7.00% K₁ [pN, 20° C.]: 14.6 CCY-3-O1 5.00% K₃ [pN, 20° C.]: 15.7 CCY-3-O2 11.00% γ₁ [mPa · s, 20° C.]: 101 CCY-4-O2 4.50% V₀ [20° C., V]: 2.32 CPY-3-O2 3.00% CY-3-O2 12.00% PY-3-O2 8.50% PYP-2-3 8.00% B—2O—O5 4.00% PP-1-2V1 4.00%

additionally comprises 0.03% of ST-9-1.

Example M84

The liquid-crystalline mixture

CC-3-V 15.00% Clearing point [° C.]: 74.0 CC-3-V1 8.00% Δn [589 nm, 20° C.]: 0.1078 CCH-23 10.00% Δε [1 kHz, 20° C.]: −3.1 CCH-34 7.00% ε_(∥) [1 kHz, 20° C.]: 3.5 CCY-3-O1 8.00% K₁ [pN, 20° C.]: 14.6 CCY-3-O2 11.00% K₃ [pN, 20° C.]: 15.1 CCY-4-O2 3.50% γ₁ [mPa · s, 20° C.]: 94 CPY-3-O2 6.00% V₀ [20° C., V]: 2.32 CY-3-O2 5.50% PY-3-O2 10.00% PYP-2-3 8.00% B—2O—O5 4.00% PP-1-2V1 4.00%

additionally comprises 0.03% of ST-8-1.

Example M85

The liquid-crystalline mixture

CC-3-V 42.50% Clearing point [° C.]: 75.0 CCP-3-1 4.50% Δn [589 nm, 20° C.]: 0.0984 CCY-3-O1 9.00% Δε [1 kHz, 20° C.]: −3.2 CCY-3-O2 11.00% ε_(∥) [1 kHz, 20° C.]: 3.6 CPY-3-O2 8.00% K₁ [pN, 20° C.]: 13.5 CPY-2-O2 4.50% K₃ [pN, 20° C.]: 15.1 CY-3-O2 3.00% γ₁ [mPa · s, 20° C.]: 81 PY-3-O2 13.50% V₀ [20° C., V]: 2.29 B—2O—O5 4.00%

additionally comprises 0.025% of ST-8-1.

Example M86

The liquid-crystalline mixture

CC-3-V 45.00% Clearing point [° C.]: 75.0 CCP-3-1 3.00% Δn [589 nm, 20° C.]: 0.0991 CCY-3-O1 8.50% Δε [1 kHz, 20° C.]: −3.3 CCY-3-O2 11.00% ε_(∥) [1 kHz, 20° C.]: 3.6 CCY-4-O2 1.50% K₁ [pN, 20° C.]: 13.8 CPY-3-O2 11.50% K₃ [pN, 20° C.]: 15.3 PY-3-O2 12.50% γ₁ [mPa · s, 20° C.]: 80 B—2O—O5 4.00% V₀ [20° C., V]: 2.28 B-3-O2 3.00%

additionally comprises 0.03% of ST-8-1.

Example M87

The liquid-crystalline mixture

CC-3-V1 8.00% Clearing point [° C.]: 74.0 CCH-23 18.00% Δn [589 nm, 20° C.]: 0.0978 CCH-34 3.00% Δε [1 kHz, 20° C.]: −3.4 CCH-35 4.00% ε_(||) [1 kHz, 20° C.]: 3.6 CCP-3-1 14.00% K₁ [pN, 20° C.]: 14.9 CCY-3-O2 11.00% K₃ [pN, 20° C.]: 16.1 CCY-3-O1 2.00% γ₁ [mPa · s, 20° C.]: 102 CPY-3-O2 11.00% V₀ [20° C., V]: 2.28 CY-3-O2 10.50% PY-3-O2 12.50% B-2O-O5 3.00% Y-4O-O4 3.00%

additionally comprises 0.025% of ST-8-1.

Comparison VHR after UV M87 without stabiliser 83% M87 with stabiliser 90% (0.025% of ST-8-1)

Example M88

The liquid-crystalline mixture

CC-3-V1 8.00% Clearing point [° C.]: 74.0 CCH-23 18.00% Δn [589 nm, 20° C.]: 0.0978 CCH-34 3.00% Δε [1 kHz, 20° C.]: −3.4 CCH-35 4.00% ε_(||) [1 kHz, 20° C.]: 3.6 CCP-3-1 14.00% K₁ [pN, 20° C.]: 14.9 CCY-3-O2 11.00% K₃ [pN, 20° C.]: 16.1 CCY-3-O1 2.00% γ₁ [mPa · s, 20° C.]: 102 CPY-3-O2 11.00% V₀ [20° C., V]: 2.28 CY-3-O2 10.50% PY-3-O2 12.50% B-2O-O5 3.00% Y-4O-O4 3.00%

additionally comprises 0.01% of ST-9-1.

Comparison VHR after UV M88 without stabiliser 83% M88 with stabiliser 89% (0.01% of ST-9-1)

Example M89

The liquid-crystalline mixture

CC-3-V1 7.00% Clearing point [° C.]: 73.0 CCH-23 18.00% Δn [589 nm, 20° C.]: 0.0969 CCH-34 3.00% Δε [1 kHz, 20° C.]: −3.4 CCH-35 4.00% ε_(||) [1 kHz, 20° C.]: 3.6 CCP-3-1 14.00% K₁ [pN, 20° C.]: 14.6 CCY-3-O2 11.00% K₃ [pN, 20° C.]: 15.8 CCY-3-O1 3.00% γ₁ [mPa · s, 20° C.]: 102 CPY-3-O2 11.00% V₀ [20° C., V]: 2.29 CY-3-O2 12.00% PY-3-O2 11.00% Y-4O-O4 3.00% B-2-O2 3.00%

additionally comprises 0.01% of ST-9-1.

Example M90

For the preparation of a PS-VA mixture, 99.7% of the mixture according to Example M34 are mixed with 0.3% of the polymerisable compound of the formula

Example M91

For the preparation of a PS-VA mixture, 99.75% of the mixture according to Example M34 are mixed with 0.25% of the polymerisable compound of the formula

Example M92

For the preparation of a PS-VA mixture, 99.8% of the mixture according to Example M35 are mixed with 0.2% of the polymerisable compound of the formula

Example M93

For the preparation of a PS-VA mixture, 99.75% of the mixture according to Example M63 are mixed with 0.25% of the polymerisable compound of the formula

Example M94

For the preparation of a PS-VA mixture, 99.75% of the mixture according to Example M63 are mixed with 0.25% of the polymerisable compound of the formula

Example M95

For the preparation of a PS-VA mixture, 99.75% of the mixture according to Example M63 are mixed with 0.3% of the polymerisable compound of the formula

Example M96

For the preparation of a PS-VA mixture, 99.8% of the mixture according to Example M65 are mixed with 0.2% of the polymerisable compound of the formula

Example M97

For the preparation of a PS-VA mixture, 99.8% of the mixture according to Example M70 are mixed with 0.2% of the polymerisable compound of the formula

Example M98

For the preparation of a PS-VA mixture, 99.75% of the mixture according to Example M71 are mixed with 0.25% of the polymerisable compound of the formula

Example M99

For the preparation of a PS-VA mixture, 99.7% of the mixture according to Example M72 are mixed with 0.3% of the polymerisable compound of the formula

Example M100

The liquid-crystalline mixture

CC-V-V 31.50% Clearing point [° C.]: 75.0 CCP-3-1 5.00% Δn 8 589 nm, 20° C.]: 0.0949 CCY-2-1 12.00% Δε [1 kHz, 20° C.]: −3.8 CCY-3-O1 7.50% ε_(||) [1 kHz, 20° C.]: 3.7 CCY-3-O2 8.00% K₁ [pN, 20° C.]: 11.4 CLY-3-O2 5.50% K₃ [pN, 20° C.]: 14.2 CLY-3-O3 4.00% γ₁ [mPa · s, 20° C.]: 88 CPY-2-O2 4.50% V₀ [20° C., V]: 2.04 CPY-3-O2 3.00% CY-3-O2 11.00% PY-1-O4 4.00% B-2O-O5 4.00%

additionally comprises 0.03% of ST-12.

Example M101

The liquid-crystalline mixture

CC-3-V 36.50% Clearing point [° C.]: 80.0 CCY-3-O1 6.00% Δn [589 nm, 20° C.]: 0.1028 CCY-3-O2 6.00% Δε [1 kHz, 20° C.]: −4.4 CCY-4-O2 2.50% ε_(||) [1 kHz, 20° C.]: 3.8 CLY-3-O2 7.00% K₁ [pN, 20° C.]: 14.2 CLY-3-O3 3.00% K₃ [pN, 20° C.]: 15.9 CPY-2-O2 7.00% γ₁ [mPa · s, 20° C.]: 108 CPY-3-O2 10.00% V₀ [20° C., V]: 2.01 CY-3-O2 11.50% PY-3-O2 5.50% B-2O-O5 5.00%

additionally comprises 0.025% of ST-8-1.

Example M102

The liquid-crystalline mixture

CY-3-O2 9.00% Clearing point [° C.]: 87.0 CY-3-O4 7.00% Δn [589 nm, 20° C.]: 0.1026 PY-3-O2 3.00% Δε [1 kHz, 20° C.]: −4.9 CCY-3-O1 8.00% ε_(||) [1 kHz, 20° C.]: 3.9 CCY-3-O2 11.00% K₁ [pN, 20° C.]: 14.5 CCY-4-O2 10.00% K₃ [pN, 20° C.]: 16.7 CPY-2-O2 6.50% γ₁ [mPa · s, 20° C.]: 142 CPY-3-O2 12.00% V₀ [20° C., V]: 1.95 CC-3-V 29.50% B-2O-O5 4.00%

additionally comprises 0.025% of ST-8-1.

Example M103

The liquid-crystalline mixture

CY-3-O2 12.50% Clearing point [° C.]: 87.0 CCY-3-O1 9.00% Δn [589 nm, 20° C.]: 0.1025 CCY-3-O2 11.00% Δε [1 kHz, 20° C.]: −4.8 CCY-4-O2 7.00% ε_(||) [1 kHz, 20° C.]: 3.8 CPY-3-O2 3.00% K₁ [pN, 20° C.]: 14.1 CC-3-V 31.00% K₃ [pN, 20° C.]: 16.8 B-2O-O5 4.00% γ₁ [mPa · s, 20° C.]: 127 PY-V2-O2 5.50% V₀ [20° C., V]: 1.97 CPY-V-O2 6.00% CPY-V-O4 5.00% CCY-V-O2 6.00%

additionally comprises 0.025% of ST-12.

Example M104

The liquid-crystalline mixture

CC-3-V 34.50% Clearing point [° C.]: 74.0 CC-3-V1 8.00% Δn [589 nm, 20° C.]: 0.1072 CCY-3-O1 5.50% Δε [1 kHz, 20° C.]: −3.0 CCY-3-O2 11.50% ε_(||) [1 kHz, 20° C.]: 3.5 PY-3-O2 7.50% K₁ [pN, 20° C.]: 14.0 PP-1-2V1 7.00% K₃ [pN, 20° C.]: 15.8 B-2O-O5 4.00% γ₁ [mPa · s, 20° C.]: 78 PY-V2-O2 5.00% V₀ [20° C., V]: 2.43 CPY-V-O2 6.00% CPY-V-O4 5.00% CCY-V-O2 6.00%

additionally comprises 0.025% of ST-8-1.

Example M105

The liquid-crystalline mixture

CC-3-V 42.00% Clearing point [° C.]: 74.5 CCP-3-1 5.00% Δn [589 nm, 20° C.]: 0.0997 CCY-3-O1 3.00% Δε [1 kHz, 20° C.]: −3.3 CCY-3-O2 11.00% ε_(||) [1 kHz, 20° C.]: 3.6 CCY-V-O2 6.00% K₁ [pN, 20° C.]: 13.0 CPY-V-O2 6.50% K₃ [pN, 20° C.]: 14.9 CPY-V-O4 5.00% γ₁ [mPa · s, 20° C.]: 75 CY-3-O2 3.50% V₀ [20° C., V]: 2.26 PY-3-O2 5.00% B-2O-O5 4.00% PY-V2-O2 9.00%

additionally comprises 0.025% of ST-8-1.

Example M106

For the preparation of a PS (polymer-stabilised) mixture, for example for PS-IPS, PS-VA, PS-FFS applications, 99.7% of the mixture according to Example M100 are mixed with 0.3% of the polymerisable compound of the formula

Example M107

For the preparation of a PS (polymer-stabilised) mixture, for example for PS-IPS, PS-VA, PS-FFS applications, 99.75% of the mixture according to Example M100 are mixed with 0.25% of the polymerisable compound of the formula

Example M108

For the preparation of a PS-VA mixture, 99.8% of the mixture according to Example M101 are mixed with 0.2% of the polymerisable compound of the formula

Example M109

For the preparation of a PS-VA mixture, 99.75% of the mixture according to Example M102 are mixed with 0.25% of the polymerisable compound of the formula

Example M110

For the preparation of a PS-VA mixture, 99.75% of the mixture according to Example M102 are mixed with 0.25% of the polymerisable compound of the formula

Example M111

For the preparation of a PS (polymer-stabilised) mixture, for example for PS-IPS, PS-VA, PS-FFS applications, 99.7% of the mixture according to Example M102 are mixed with 0.3% of the polymerisable compound of the formula

Example M112

For the preparation of a PS-VA mixture, 99.8% of the mixture according to Example M102 are mixed with 0.2% of the polymerisable compound of the formula

Example M113

For the preparation of a PS-VA mixture, 99.8% of the mixture according to Example M103 are mixed with 0.2% of the polymerisable compound of the formula

Example M114

For the preparation of a PS-VA mixture, 99.75% of the mixture according to Example M104 are mixed with 0.25% of the polymerisable compound of the formula

Example M115

For the preparation of a PS-VA mixture, 99.7% of the mixture according to Example M104 are mixed with 0.3% of the polymerisable compound of the formula

Example M116

For the preparation of a PS-VA mixture, 99.7% of the mixture according to Example M104 are mixed with 0.3% of the polymerisable compound of the formula

Example M117

For the preparation of a PS-VA mixture, 99.75% of the mixture according to Example M104 are mixed with 0.25% of the polymerisable compound of the formula

Example M118

For the preparation of a PS-VA mixture, 99.7% of the mixture according to Example M104 are mixed with 0.3% of the polymerisable compound of the formula

Example M119

For the preparation of a PS-VA mixture, 99.75% of the mixture according to Example M105 are mixed with 0.25% of the polymerisable compound of the formula

Example M120

For the preparation of a PS-VA mixture, 99.75% of the mixture according to Example M105 are mixed with 0.25% of the polymerisable compound of the formula

Example M121

For the preparation of a PS-VA mixture, 99.75% of the mixture according to Example M105 are mixed with 0.25% of the polymerisable compound of the formula

Example M122

For the preparation of a PS-VA mixture, 99.75% of the mixture according to Example M105 are mixed with 0.25% of the polymerisable compound of the formula

Example M123

For the preparation of a PS-VA mixture, 99.8% of the mixture according to Example M105 are mixed with 0.3% of the polymerisable compound of the formula

Example M124

The liquid-crystalline mixture

CC-3-V 17.00% Clearing point [° C.]: 75.5 CC-V-V 20.00% Δn [589 nm, 20° C.]: 0.1079 CC-3-V1 8.00% ε_(||) [1 kHz, 20° C.]: 3.4 CCY-3-O1 6.00% ε_(⊥) [1 kHz, 20° C.]: 6.1 CCY-3-O2 10.00% Δε [1 kHz, 20° C.]: −2.7 CCY-4-O2 2.50% K₁ [pN, 20° C.]: 12.5 CPY-2-O2 5.50% K₃ [pN, 20° C.]: 14.8 CPY-3-O2 11.50% V₀ [pN, 20° C.]: 2.45 PY-3-O2 8.50% γ₁ [mPa · s, 20° C.]: 75 PYP-2-3 5.00% PP-1-2V1 3.00% B-3O-O5 3.00%

additionally comprises 0.025% of ST-8-1.

Example M125

The liquid-crystalline mixture

CC-3-V 20.50% Clearing point [° C.]: 74.5 CC-V-V 15.00% Δn [589 nm, 20° C.]: 0.1095 CC-3-V1 8.00% ε_(||) [1 kHz, 20° C.]: 3.5 CLY-3-O2 6.00% ε_(⊥) [1 kHz, 20° C.]: 6.3 CCY-3-O2 11.50% Δε [1 kHz, 20° C.]: −2.9 CCY-4-O2 4.00% K₁ [pN, 20° C.]: 13.5 CPY-3-O2 7.50% K₃ [pN, 20° C.]: 15.2 BCH-32 3.50% V₀ [pN, 20° C.]: 2.43 PY-3-O2 11.50% γ₁ [mPa · s, 20° C.]: 77 PGIY-2-O4 4.50% PP-1-2V1 4.00% B-2O-O5 4.00%

additionally comprises 0.025% of ST-2a-1.

Example M126

The liquid-crystalline mixture

CC-V-V 36.00% Clearing point [° C.]: 75 CC-3-V1 8.00% Δn [589 nm, 20° C.]: 0.1076 CLY-3-O2 6.00% ε_(||) [1 kHz, 20° C.]: 3.4 CCY-3-O2 11.50% ε_(⊥) [1 kHz, 20° C.]: 6.0 CCY-4-O2 5.00% Δε [1 kHz, 20° C.]: −2.7 CPY-3-O2 7.50% K₁ [pN, 20° C.]: 12.0 BCH-32 7.00% K₃ [pN, 20° C.]: 14.3 PY-3-O2 8.00% V₀ [pN, 20° C.]: 2.46 PGIY-2-O4 4.50% γ₁ [mPa · s, 20° C.]: 70 PP-1-2V1 2.50% B-2O-O5 4.00%

additionally comprises 0.03% of ST-12.

Example M127

The liquid-crystalline mixture

CC-V-V 34.00% Clearing point [° C.]: 75.5 CC-3-V1 8.00% Δn [589 nm, 20° C.]: 0.1085 CCY-3-O1 7.00% ε_(||) [1 kHz, 20° C.]: 3.4 CCY-3-O2 11.50% ε_(⊥) [1 kHz, 20° C.]: 6.1 CCY-4-O2 5.00% Δε [1 kHz, 20° C.]: −2.7 CPY-3-O2 7.50% K₁ [pN, 20° C.]: 12.0 BCH-32 7.00% K₃ [pN, 20° C.]: 14.4 PY-3-O2 8.00% V₀ [pN, 20° C.]: 2.44 PGIY-2-O4 4.50% γ₁ [mPa · s, 20° C.]: 74 PP-1-2V1 3.50% B-2O-O5 4.00%

additionally comprises 0.025% of ST-8-1.

Example M128

The liquid-crystalline mixture

CC-3-V 9.50% Clearing point [° C.]: 74.0 CC—V—V 29.00% Δn [589 nm, 20° C.]: 0.0989 CCP-3-1 10.00% ε_(∥) [1 kHz, 20° C.]: 3.6 CCY-3-O1 8.50% ε_(⊥) [1 kHz, 20° C.]: 6.7 CCY-3-O2 11.00% Δε [1 kHz, 20° C.]: −3.2 CPY-2-O2 2.00% K₁ [pN, 20° C.]: 11.8 CPY-3-O2 11.00% K₃ [pN, 20° C.]: 14.8 CY-3-O2 5.00% V₀ [pN, 20° C.]: 2.28 PY-3-O2 10.00% γ₁ [mPa · s, 20° C.]: 76 B—2O—O5 4.00%

additionally comprises 0.025% of ST-8-1.

Example M129

The liquid-crystalline mixture

CC-3-V 15.50% Clearing point [° C.]: 74.5 CC—V—V 20.00% Δn [589 nm, 20° C.]: 0.1075 CC-3-V1 8.00% ε_(∥) [1 kHz, 20° C.]: 3.5 CCY-3-O1 8.00% ε_(⊥) [1 kHz, 20° C.]: 6.5 CCY-3-O2 11.50% Δε [1 kHz, 20° C.]: −3.0 CCY-4-O2 4.50% K₁ [pN, 20° C.]: 12.9 CPY-3-O2 8.50% K₃ [pN, 20° C.]: 15.0 PY-2-O2 6.50% V₀ [pN, 20° C.]: 2.35 PGIY-2-O4 5.00% γ₁ [mPa · s, 20° C.]: 76 PP-1-2V1 6.50% LTS bulk [−20° C.]: >1000 h B(S)—2O—O5 3.00% B—2O—O5 3.00%

additionally comprises 0.1% of ST-8-1.

Example M130

The liquid-crystalline mixture

CC-3-V 17.50% Clearing point [° C.]: 74 CC—V—V 20.00% Δn [589 nm, 20° C.]: 0.1074 CC-3-V1 8.00% ε_(∥) [1 kHz, 20° C.]: 3.5 CCY-3-O1 8.00% ε_(⊥) [1 kHz, 20° C.]: 6.4 CCY-3-O2 12.00% Δε [1 kHz, 20° C.]: −2.9 CPY-3-O2 12.00% K₁ [pN, 20° C.]: 12.7 PY-2-O2 6.00% K₃ [pN, 20° C.]: 15.1 PGIY-2-O4 4.50% V₀ [pN, 20° C.]: 2.41 PP-1-2V1 6.00% γ₁ [mPa · s, 20° C.]: 72 B(S)—2O—O5 3.00% B—2O—O5 3.00%

additionally comprises 0.025% of ST-8-1.

Example M131

The liquid-crystalline mixture

CC-3-V 22.00% Clearing point [° C.]: 76 CC—V—V 20.00% Δn [589 nm, 20° C.]: 0.0946 CCY-3-O1 8.00% ε_(∥) [1 kHz, 20° C.]: 3.7 CCY-3-O2 12.00% ε_(⊥) [1 kHz, 20° C.]: 7.5 CCY-4-O2 2.50% Δε [1 kHz, 20° C.]: −3.9 CLY-3-O2 6.00% K₁ [pN, 20° C.]: 12.4 CLY-3-O3 9.50% K₃ [pN, 20° C.]: 14.3 CPY-3-O2 1.50% V₀ [pN, 20° C.]: 2.04 CY-3-O2 2.50% γ₁ [mPa · s, 20° C.]: 78 B—2O—O5 3.00% B(S)—2O—O5 3.00% PY-2-O2 10.00%

additionally comprises 0.025% of ST-8-1.

Example M132

The liquid-crystalline mixture

CC-3-V 20.50% Clearing point [° C.]: 76 CC—V—V 20.00% Δn [589 nm, 20° C.]: 0.0945 CCY-3-O1 8.00% ε_(∥) [1 kHz, 20° C.]: 3.7 CCY-3-O2 11.50% ε_(⊥) [1 kHz, 20° C.]: 7.6 CCY-4-O2 4.00% Δε [1 kHz, 20° C.]: −3.9 CPY-2-O2 6.00% K₁ [pN, 20° C.]: 11.9 CPY-3-O2 11.00% K₃ [pN, 20° C.]: 14.7 CY-3-O2 13.50% V₀ [pN, 20° C.]: 2.05 B—2O—O5 3.00% γ₁ [mPa · s, 20° C.]: 84 B(S)—2O—O5 2.50%

additionally comprises 0.025% of ST-8-1.

Example M133

The liquid-crystalline mixture

CC-3-V 19.50% Clearing point [° C.]: 75.5 CC—V—V 23.00% Δn [589 nm, 20° C.]: 0.0989 CCP-3-1 5.50% ε_(∥) [1 kHz, 20° C.]: 3.5 CCY-3-O1 8.00% ε_(⊥) [1 kHz, 20° C.]: 6.6 CCY-3-O2 11.00% Δε [1 kHz, 20° C.]: −3.1 CCY-4-O2 4.00% K₁ [pN, 20° C.]: 12.2 CPY-3-O2 12.00% K₃ [pN, 20° C.]: 14.8 PY-3-O2 13.00% V₀ [pN, 20° C.]: 2.30 B—2O—O5 4.00% γ₁ [mPa · s, 20° C.]: 75

additionally comprises 0.025% of ST-8-1.

Example M134

The liquid-crystalline mixture

CC—V—V 15.00% Clearing point [° C.]: 74.5 CC-3-V1 7.00% Δn [589 nm, 20° C.]: 0.1071 CCH-23 6.50% ε_(∥) [1 kHz, 20° C.]: 3.6 CCH-34 4.00% ε_(⊥) [1 kHz, 20° C.]: 6.7 CCP-3-1 16.00% Δε [1 kHz, 20° C.]: −3.2 CCY-3-O1 4.50% K₁ [pN, 20° C.]: 13.4 CCY-3-O2 12.00% K₃ [pN, 20° C.]: 15.0 CY-3-O2 8.50% V₀ [pN, 20° C.]: 2.29 PY-3-O2 11.50% γ₁ [mPa · s, 20° C.]: 88 PYP-2-3 8.00% B—2O—O5 4.00% B(S)—2O—O5 3.00%

additionally comprises 0.025% of ST-8-1.

Example M135

The liquid-crystalline mixture

CC-3-V 23.00% Clearing point [° C.]: 74.5 CC—V—V 20.00% Δn [589 nm, 20° C.]: 0.0974 CCP-3-1 5.00% ε_(∥) [1 kHz, 20° C.]: 3.5 CCY-3-O1 7.50% ε_(⊥) [1 kHz, 20° C.]: 6.6 CCY-3-O2 11.00% Δε [1 kHz, 20° C.]: −3.1 CCY-4-O2 5.00% K₁ [pN, 20° C.]: 12.3 CPY-3-O2 11.00% K₃ [pN, 20° C.]: 14.7 PY-3-O2 13.50% V₀ [pN, 20° C.]: 2.30 B—2O—O5 4.00% γ₁ [mPa · s, 20° C.]: 74

additionally comprises 0.025% of ST-8-1.

Example M136

The liquid-crystalline mixture

BCH-32 8.50% Clearing point [° C.]: 73.0 CC-3-V 15.00% Δn [589 nm, 20° C.]: 0.1052 CC—V—V 14.00% ε_(∥) [1 kHz, 20° C.]: 3.4 CCP-3-1 11.00% ε_(⊥) [1 kHz, 20° C.]: 6.0 CCY-3-O1 7.00% Δε [1 kHz, 20° C.]: −2.6 CCY-3-O2 8.50% K₁ [pN, 20° C.]: 12.5 CPY-3-O2 7.00% K₃ [pN, 20° C.]: 14.7 CY-3-O2 17.00% V₀ [pN, 20° C.]: 2.53 PP-1-3 7.00% γ₁ [mPa · s, 20° C.]: 79 B—2O—O5 4.00% PYP-2-3 1.00%

additionally comprises 0.025% of ST-8-1.

Example M137

The liquid-crystalline mixture

CC—V—V 31.50% Clearing point [° C.]: 75.0 CCP-3-1 5.00% Δn [589 nm, 20° C.]: 0.0949 CCY-2-1 12.00% ε_(∥) [1 kHz, 20° C.]: 3.7 CCY-3-O1 7.50% ε_(⊥) [1 kHz, 20° C.]: 7.5 CCY-3-O2 8.00% Δε [1 kHz, 20° C.]: −3.8 CLY-3-O2 5.50% K₁ [pN, 20° C.]: 11.4 CLY-3-O3 4.00% K₃ [pN, 20° C.]: 14.2 CPY-2-O2 4.50% V₀ [pN, 20° C.]: 2.04 CPY-3-O2 3.00% γ₁ [mPa · s, 20° C.]: 88 CY-3-O2 11.00% PY-1-O4 4.00% B—2O—O5 4.00%

additionally comprises 0.025% of ST-8-1.

Example M138

The liquid-crystalline mixture

CC—V—V 31.50% Clearing point [° C.]: 74.5 CCP-3-1 4.00% Δn [589 nm, 20° C.]: 0.0945 CCY-2-1 12.00% ε_(∥) [1 kHz, 20° C.]: 3.7 CCY-3-O1 7.50% ε_(⊥) [1 kHz, 20° C.]: 7.6 CCY-3-O2 11.50% Δε [1 kHz, 20° C.]: −3.8 CLY-3-O2 5.00% K₁ [pN, 20° C.]: 11.2 CPY-3-O2 4.50% K₃ [pN, 20° C.]: 14.4 CY-3-O2 14.00% V₀ [pN, 20° C.]: 2.05 PY-4-O2 2.00% γ₁ [mPa · s, 20° C.]: 90 PGIY-2-O4 3.00% B—2O—O5 4.00% CCPC-33 1.00%

additionally comprises 0.025% of ST-8-1.

Example M139

The liquid-crystalline mixture

CC-3-V 14.50% Clearing point [° C.]: 74 CC—V—V 20.00% Δn [589 nm, 20° C.]: 0.1074 CC-3-V1 8.00% Δε [ 1 kHz, 20° C.]: −3.0 CCY-3-O1 5.50% K₁ [pN, 20° C.]: 12.7 CCY-3-O2 11.50% K₃ [pN, 20° C.]: 15.4 CPY-3-O2 4.00% V₀ [pN, 20° C.]: 2.42 PY-3-O2 3.50% γ₁ [mPa · s, 20° C.]: 73 PP-1-2V1 7.00% B—2O—O5 4.00% PY-V2-O2 5.00% CPY—V—O2 6.00% CPY—V—O4 5.00% CCY—V—O2 6.00%

additionally comprises 0.025% of ST-8-1.

Example M140

The liquid-crystalline mixture

CCP—V-1 4.00% Clearing point [° C.]: 92.5 CCY-3-O2 7.50% Δn [589 nm, 20° C.]: 0.1074 CLY-3-O2 8.00% Δε [1 kHz, 20° C.]: −2.5 CLY-3-O3 5.00% ε_(∥) [1 kHz, 20° C.]: 3.2 CPY-3-O2 10.00% ε_(⊥) [1 kHz, 20° C.]: 5.7 PGIY-2-O4 5.00% K₁ [pN, 20° C.]: 16.4 PYP-2-3 6.00% K₃ [pN, 20° C.]: 18.0 B—2O—O5 5.00% V₀ [pN, 20° C.]: 2.82 CC-3-V 41.50% γ₁ [mPa · s, 20° C.]: 96 CC-3-V1 8.00%

additionally comprises 0.025% of ST-8-1.

Example M141

The liquid-crystalline mixture

CLY-3-O2 10.00% Clearing point [° C.]: 80 CLY-3-O3 1.50% Δn [589 nm, 20° C.]: 0.1080 CPY-2-O2 4.00% Δε [1 kHz, 20° C.]: −2.4 CPY-3-O2 10.00% ε_(∥) [1 kHz, 20° C.]: 3.3 PGIY-2-O4 5.00% ε_(⊥) [1 kHz, 20° C.]: 5.7 PYP-2-3 8.00% K₁ [pN, 20° C.]: 14.0 B—2O—O5 4.50% K₃ [pN, 20° C.]: 15.8 CC-3-V 44.50% V₀ [pN, 20° C.]: 2.68 CC-3-V1 8.00% γ₁ [mPa · s, 20° C.]: 80 CY-3-O2 2.50% CY-5-O2 2.00%

additionally comprises 0.025% of ST-8-1.

Example M141

The liquid-crystalline mixture

CCP—V2-1 5.00% Clearing point [° C.]: 79.5 CLY-3-O2 10.00% Δn [589 nm, 20° C.]: 0.1079 CPY-3-O2 9.00% Δε [1 kHz, 20° C.]: −2.0 PGIY-2-O4 2.50% ε_(∥) [1 kHz, 20° C.]: 3.2 PYP-2-3 8.00% ε_(⊥) [1 kHz, 20° C.]: 5.3 PYP-2-4 5.00% K₁ [pN, 20° C.]: 14.4 B—2O—O5 4.00% K₃ [pN, 20° C.]: 15.5 CC-3-V 43.00% V₀ [pN, 20° C.]: 2.92 CC-3-V1 7.50% γ₁ [mPa · s, 20° C.]: 75 CY-3-O2 6.00%

additionally comprises 0.025% of ST-8-1.

Example M143

The liquid-crystalline mixture

CCY-3-O1 4.00% Clearing point [° C.]: 79.8 CCY-3-O2 8.50% Δn [589 nm, 20° C.]: 0.1013 CCY-4-O2 5.00% Δε [1 kHz, 20° C.]: −3.7 CLY-3-O2 10.00% ε_(||) [1 kHz, 20° C.]: 3.6 CLY-3-O3 4.00% ε_(⊥) [1 kHz, 20° C.]: 7.3 PGIY-2-O4 5.00% K₁ [pN, 20° C.]: 14.7 PYP-2-3 1.00% K₃ [pN, 20° C.]: 16.3 B-2O-O5 5.00% V₀ [pN, 20° C.]: 2.20 CC-3-V 34.50% γ₁ [mPa · s, 20° C.]: 97 CC-3-V1 8.50% CY-3-O2 5.00% PY-3-O2 9.50%

additionally comprises 0.02% of ST-9-1.

Example M144

The liquid-crystalline mixture

CCY-3-O2 7.00% Clearing point [° C.]: 80 CCY-4-O2 2.00% Δn [589 nm, 20° C.]: 0.1009 CLY-3-O2 8.00% Δε [1 kHz, 20° C.]: −3.7 CLY-3-O3 4.00% ε_(||) [1 kHz, 20° C.]: 3.6 CPY-2-O2 3.00% ε_(⊥) [1 kHz, 20° C.]: 7.3 CPY-3-O2 8.00% K₁ [pN, 20° C.]: 14.4 PGIY-2-O4 5.00% K₃ [pN, 20° C.]: 16.4 PYP-2-3 1.00% V₀ [pN, 20° C.]: 2.21 B-2O-O5 5.00% γ₁ [mPa · s, 20° C.]: 99 CC-3-V 35.00% CC-3-V1 8.00% CY-3-O2 12.00% CY-5-O2 2.00%

additionally comprises 0.025% of ST-8-1.

Example M145

The liquid-crystalline mixture

CY-3-O2 4.00% Clearing point [° C.]: 100 CY-3-O4 18.00% Δn [589 nm, 20° C.]: 0.0955 CCY-3-O1 5.00% Δε [1 kHz, 20° C.]: −5.0 CCY-3-O2 6.00% ε_(||) [1 kHz, 20° C.]: 3.8 CCY-3-O3 6.00% ε_(⊥) [1 kHz, 20° C.]: 8.8 CCY-4-O2 6.00% K₁ [pN, 20° C.]: 15.2 CLY-3-O2 2.50% K₃ [pN, 20° C.]: 16.0 CPY-2-O2 8.00% V₀ [pN, 20° C.]: 1.90 CC-4-V 18.00% γ₁ [mPa · s, 20° C.]: 226 CC-5-V 4.00% CH-33 3.00% CH-35 3.00% CCPC-33 4.50% CCPC-34 4.50% B-2O-O5 7.50%

additionally comprises 0.025% of ST-8-1.

Example M146

The liquid-crystalline mixture

CCY-3-O1 8.00% Clearing point [° C.]: 81.5 CCY-4-O2 6.00% Δn [589 nm, 20° C.]: 0.1075 CLY-3-O2 10.00% Δε [1 kHz, 20° C.]: −3.1 CPY-3-O2 10.50% ε_(||) [1 kHz, 20° C.]: 3.5 PYP-2-3 9.00% ε_(⊥) [1 kHz, 20° C.]: 6.6 B-2O-O5 5.00% K₁ [pN, 20° C.]: 14.3 CC-3-V 45.00% K₃ [pN, 20° C.]: 15.7 PY-3-O2 5.00% V₀ [pN, 20° C.]: 2.38 Y-4O-O4 1.50% γ₁ [mPa · s, 20° C.]: 90

additionally comprises 0.025% of ST-8-1.

Example M147

The liquid-crystalline mixture

CC-3-V 35.00% Clearing point [° C.]: 86 CCY-3-O1 5.00% Δn [589 nm, 20° C.]: 0.1208 CCY-3-O2 7.50% Δε [1 kHz, 20° C.]: −4.2 CLY-3-O2 8.00% ε_(||) [1 kHz, 20° C.]: 3.8 CPY-2-O2 10.00% ε_(⊥) [1 kHz, 20° C.]: 8.0 CPY-3-O2 10.00% K₁ [pN, 20° C.]: 14.3 PY-3-O2 12.50% K₃ [pN, 20° C.]: 15.6 PGIY-2-O4 8.00% V₀ [pN, 20° C.]: 2.04 B-2O-O5 4.00% γ₁ [mPa · s, 20° C.]: 129

additionally comprises 0.025% of ST-8-1.

Example M148

The liquid-crystalline mixture

CCY-3-O1 7.00% Clearing point [° C.]: 80 CLY-3-O2 10.00% Δn [589 nm, 20° C.]: 0.1141 CPY-2-O2 10.00% Δε [1 kHz, 20° C.]: −4.0 CPY-3-O2 10.00% ε_(||) [1 kHz, 20° C.]: 3.7 PYP-2-3 3.00% ε_(⊥) [1 kHz, 20° C.]: 7.7 B-2O-O5 4.00% K₁ [pN, 20° C.]: 14.9 CC-3-V 38.00% K₃ [pN, 20° C.]: 15.6 PY-1-O4 10.00% V₀ [pN, 20° C.]: 2.09 PY-3-O2 4.50% γ₁ [mPa · s, 20° C.]: 108 CCY-3-O2 3.50%

additionally comprises 0.025% of ST-8-1.

Example M149

The liquid-crystalline mixture

CCY-3-O1 7.00% Clearing point [° C.]: 90 CCY-4-O2 4.00% Δn [589 nm, 20° C.]: 0.1139 CLY-3-O2 10.00% Δε [1 kHz, 20° C.]: −4.2 CPY-2-O2 10.00% ε_(||) [1 kHz, 20° C.]: 3.7 CPY-3-O2 10.00% ε_(⊥) [1 kHz, 20° C.]: 7.9 PYP-2-3 2.50% K₁ [pN, 20° C.]: 16.2 B-2O-O5 4.00% K₃ [pN, 20° C.]: 17.0 CC-3-V 35.50% V₀ [pN, 20° C.]: 2.12 PY-1-O4 10.00% γ₁ [mPa · s, 20° C.]: 131 PY-3-O2 1.00% CCY-3-O2 6.00%

additionally comprises 0.025% of ST-12.

Example M150

The liquid-crystalline mixture

B-2O-O5 5.00% Clearing point [° C.]: 80.1 BCH-32 7.00% Δn [589 nm, 20° C.]: 0.1121 CC-3-V 34.50% Δε [1 kHz, 20° C.]: −3.9 CCP-V-1 2.00% K₁ [pN, 20° C.]: 14.0 CCY-3-O1 5.00% K₃ [pN, 20° C.]: 14.5 CCY-3-O2 4.00% V₀ [pN, 20° C.]: 2.03 CCY-4-O2 2.00% γ₁ [mPa · s, 20° C.]: 104 CLY-3-O2 8.00% CPY-2-O2 10.00% CPY-3-O2 7.00% PGIY-2-O4 6.00% PY-3-O2 2.00% Y-4O-O4 7.50%

additionally comprises 0.025% of ST-8-1.

Example M151

The liquid-crystalline mixture

CCY-3-O1 7.00% Clearing point [° C.]: 80.5 CCY-4-O2 1.50% Δn [589 nm, 20° C.]: 0.1070 CLY-3-O2 10.00% Δε [1 kHz, 20° C.]: −3.9 CPY-2-O2 9.50% K₁ [pN, 20° C.]: 15.0 CPY-3-O2 8.00% K₃ [pN, 20° C.]: 15.7 B-2O-O5 4.00% V₀ [pN, 20° C.]: 2.12 CC-3-V 40.00% γ₁ [mPa · s, 20° C.]: 104 PY-1-O4 9.50% PY-3-O2 4.50% CCY-3-O2 6.00%

additionally comprises 0.025% of ST-12.

Example M152

The liquid-crystalline mixture

CCY-3-O1 7.00% Clearing point [° C.]: 80.5 CLY-3-O2 10.00% Δn [589 nm, 20° C.]: 0.1140 CPY-2-O2 10.00% Δε [1 kHz, 20° C.]: −4.0 CPY-3-O2 10.00% K₁ [pN, 20° C.]: 14.8 PYP-2-3 3.00% K₃ [pN, 20° C.]: 15.6 B-2O-O5 5.00% V₀ [pN, 20° C.]: 2.09 CC-3-V 38.50% γ₁ [mPa · s, 20° C.]: 107 PY-1-O4 10.00% PY-3-O2 3.00% CCY-3-O2 3.50%

additionally comprises 0.025% of ST-8-1.

Example M153

The liquid-crystalline mixture

CCY-3-O1 7.00% Clearing point [° C.]: 78.5 CLY-3-O2 10.00% Δn [589 nm, 20° C.]: 0.1142 CPY-2-O2 10.00% Δε [1 kHz, 20° C.]: −4.0 CPY-3-O2 10.00% K₁ [pN, 20° C.]: 14.3 PGIY-2-O4 5.00% K₃ [pN, 20° C.]: 14.8 PYP-2-3 1.00% V₀ [pN, 20° C.]: 45.66 B-2O-O5 5.00% γ₁ [mPa · s, 20° C.]: 103 CC-3-V 39.50% PY-1-O4 10.00% Y-4O-O4 1.50% CCY-3-O2 1.00%

additionally comprises 0.025% of ST-8-1.

Example M154

The liquid-crystalline mixture

CCY-3-O1 7.00% Clearing point [° C.]: 74.5 CLY-3-O2 10.00% Δn [589 nm, 20° C.]: 0.1014 CPY-2-O2 10.50% Δε [1 kHz, 20° C.]: −3.7 CPY-3-O2 9.50% γ₁ [mPa · s, 20° C.]: 89 B-2O-O5 3.50% CC-3-V 42.00% PY-1-O4 10.00% Y-4O-O4 3.50% CCY-3-O2 4.00%

additionally comprises 0.025% of ST-8-1.

Example M155

The liquid-crystalline mixture

CCY-3-O1 7.00% Clearing point [° C.]: 76.5 CLY-3-O2 10.00% Δn [589 nm, 20° C.]: 0.1003 CPY-2-O2 10.50% Δε [1 kHz, 20° C.]: −3.7 CPY-3-O2 10.00% K₁ [pN, 20° C.]: 14.0 B-2O-O5 5.00% K₃ [pN, 20° C.]: 14.7 CC-3-V 43.50% V₀ [pN, 20° C.]: 2.09 PY-1-O4 6.00% γ₁ [mPa · s, 20° C.]: 89 Y-4O-O4 4.00% CCY-3-O2 4.00%

additionally comprises 0.025% of ST-8-1.

Example M156

The liquid-crystalline mixture

B-2O-O5 5.00% Clearing point [° C.]: 80 CC-3-V 37.00% Δn [589 nm, 20° C.]: 0.1094 CCP-V-1 4.50% Δε [1 kHz, 20° C.]: −3.7 CCY-3-O1 5.00% ε_(||) [1 kHz, 20° C.]: 3.7 CCY-3-O2 6.00% ε_(⊥) [1 kHz, 20° C.]: 7.4 CCY-4-O2 5.00% K₁ [pN, 20° C.]: 13.9 CLY-3-O2 8.00% K₃ [pN, 20° C.]: 14.4 CPY-2-O2 9.50% V₀ [pN, 20° C.]: 2.09 PGIY-2-O4 6.00% γ₁ [mPa · s, 20° C.]: 106 PY-3-O2 14.00%

additionally comprises 0.025% of ST-8-1.

Example M157

The liquid-crystalline mixture

CCY-3-O1 7.00% Clearing point [° C.]: 90 CCY-4-O2 4.00% Δn [589 nm, 20° C.]: 0.1139 CLY-3-O2 10.00% Δε [1 kHz, 20° C.]: −4.2 CPY-2-O2 10.00% ε_(||) [1 kHz, 20° C.]: 3.7 CPY-3-O2 10.00% ε_(⊥) [1 kHz, 20° C.]: 7.9 PYP-2-3 2.50% K₁ [pN, 20° C.]: 16.2 B-2O-O5 4.00% K₃ [pN, 20° C.]: 17.0 CC-3-V 35.50% V₀ [pN, 20° C.]: 2.12 PY-1-O4 10.00% γ₁ [mPa · s, 20° C.]: 131 PY-3-O2 1.00% CCY-3-O2 6.00%

additionally comprises 0.025% of ST-8-1.

Example M158

The liquid-crystalline mixture

CC-3-V 35.50% Clearing point [° C.]: 75.1 CC-3-V1 10.00% Δn [589 nm, 20° C.]: 0.1096 CCP-3-1  1.50% Δε [1 kHz, 20° C.]: −3.2 CLY-3-O2 10.00% ε_(∥) [1 kHz, 20° C.]: 3.5 CLY-3-O3  3.00% ε_(⊥) [1 kHz, 20° C.]: 6.7 CPY-2-O2  9.00% K₁ [pN, 20° C.]: 14.3 CPY-3-O2 10.50% K₃ [pN, 20° C.]: 15.9 PY-3-O2 16.50% V₀ [pN, 20° C.]: 2.37 PYP-2-3  1.00% γ₁ [mPa · s, 20° C.]: 84 B-2O-O5  3.00%

additionally comprises 0.025% of ST-8-1.

Example M159

For the preparation of a PS-VA mixture, 99.9% of the mixture according to Example M158 are mixed with 0.1% of the polymerisable compound of the formula

Example M160

For the preparation of a PS-VA mixture, 99.6% of the mixture according to Example M158 are mixed with 0.4% of the polymerisable compound of the formula

Example M161

For the preparation of a PS-VA mixture, 99.7% of the mixture according to Example M158 are mixed with 0.3% of the polymerisable compound of the formula

Example M162

For the preparation of a PS-VA mixture, 99.8% of the mixture according to Example M158 are mixed with 0.2% of the polymerisable compound of the formula

Example M163

The liquid-crystalline mixture

CC-3-V 35.50% Clearing point [° C.]: 75.1 CC-3-V1 10.00% Δn [589 nm, 20° C.]: 0.1096 CCP-3-1  1.50% Δε [1 kHz, 20° C.]: −3.2 CLY-3-O2 10.00% ε_(∥) [1 kHz, 20° C.]: 3.5 CLY-3-O3  3.00% ε_(⊥) [1 kHz, 20° C.]: 6.7 CPY-2-O2  9.00% K₁ [pN, 20° C.]: 14.3 CPY-3-O2 10.50% K₃ [pN, 20° C.]: 15.9 PY-3-O2 16.50% V₀ [pN, 20° C.]: 2.37 PYP-2-3  1.00% γ₁ [mPa · s, 20° C.]: 84 B-2O-O5  3.00%

additionally comprises 0.025% of ST-12.

Example M164

For the preparation of a PS-VA mixture, 99.9% of the mixture according to Example M163 are mixed with 0.1% of the polymerisable compound of the formula

Example M165

For the preparation of a PS-VA mixture, 99.6% of the mixture according to Example M163 are mixed with 0.4% of the polymerisable compound of the formula

Example M166

For the preparation of a PS-VA mixture, 99.7% of the mixture according to Example M163 are mixed with 0.3% of the polymerisable compound of the formula

Example M167

For the preparation of a PS-VA mixture, 99.8% of the mixture according to Example M163 are mixed with 0.2% of the polymerisable compound of the formula

Example M168

The liquid-crystalline mixture

CC-3-V 36.50%  Clearing point [° C.]: 74.1 CC-3-V1 6.00% Δn [589 nm, 20° C.]: 0.1087 CCY-3-O1 7.00% Δε [1 kHz, 20° C.]: −3.2 CCY-3-O2 9.00% ε_(∥) [1 kHz, 20° C.]: 3.6 CCY-5-O2 2.00% ε_(⊥) [1 kHz, 20° C.]: 6.8 CLY-3-O2 10.00%  K₁ [pN, 20° C.]: 14.1 PY-1-O4 3.00% K₃ [pN, 20° C.]: 15.7 PY-3-O2 14.00%  V₀ [pN, 20° C.]: 2.33 PYP-2-3 9.50% γ₁ [mPa · s, 20° C.]: 87 B-2O-O5 3.00%

additionally comprises 0.025% of ST-8-1.

Example M169

The liquid-crystalline mixture

CY-3-O2 3.50% Clearing point [° C.]: 74.3 CCY-3-O1 5.00% Δn [589 nm, 20° C.]: 0.1096 CCY-3-O2 2.50% Δε [1 kHz, 20° C.]: −4.0 CPY-2-O2 8.00% ε_(∥) [1 kHz, 20° C.]: 4.0 CPY-3-O2 10.00%  ε_(⊥) [1 kHz, 20° C.]: 8.0 PYP-2-3 4.00% K₁ [pN, 20° C.]: 13.0 CLY-3-O2 7.00% K₃ [pN, 20° C.]: 13.7 CLY-3-O3 4.00% V₀ [pN, 20° C.]: 1.94 Y-4O-O4 7.00% γ₁ [mPa · s, 20° C.]: 96 PGIY-2-O4 7.00% B-2O-O5 4.00% CC-3-V 38.00% 

additionally comprises 0.025% of ST-8-1.

Example M170

The liquid-crystalline mixture

CCY-3-O1 6.00% Clearing point [° C.]: 80 CCY-3-O2 8.00% Δn [589 nm, 20° C.]: 0.1010 CCY-4-O2 4.00% Δε [1 kHz, 20° C.]: −3.7 CCY-5-O2 2.50% ε_(∥) [1 kHz, 20° C.]: 3.6 CLY-3-O2 8.00% ε_(⊥) [1 kHz, 20° C.]: 7.3 CLY-3-O3 4.00% K₁ [pN, 20° C.]: 15.0 PGIY-2-O4 5.00% K₃ [pN, 20° C.]: 16.3 B-2O-O5 4.00% V₀ [pN, 20° C.]: 2.20 CC-3-V 36.00%  γ₁ [mPa · s, 20° C.]: 98 CC-3-V1 7.50% CY-3-O2 2.00% PY-3-O2 12.00% 

additionally comprises 0.025% of ST-8-1.

Example M171

The liquid-crystalline mixture

CCY-3-O2 6.00% Clearing point [° C.]: 80.4 CCY-4-O2 3.00% Δn [589 nm, 20° C.]: 0.1014 CLY-3-O2 8.00% Δε [1 kHz, 20° C.]: −3.7 CLY-3-O3 2.00% ε_(∥) [1 kHz, 20° C.]: 3.6 CPY-2-O2 6.50% ε_(⊥) [1 kHz, 20° C.]: 7.3 CPY-3-O2 8.00% K₁ [pN, 20° C.]: 13.9 PGIY-2-O4 5.00% K₃ [pN, 20° C.]: 15.8 B-2O-O5 5.00% V₀ [pN, 20° C.]: 2.20 CC-3-V 36.00%  γ₁ [mPa · s, 20° C.]: 99 CC-3-V1 7.50% CY-3-O2 11.00%  CY-5-O2 2.00%

additionally comprises 0.01% of ST-8-1.

Example M172

The liquid-crystalline mixture

BCH-32 3.00% Clearing point [° C.]: 74.7 CC-3-V 15.00%  Δn [589 nm, 20° C.]: 0.1086 CC-3-V1 9.00% Δε [1 kHz, 20° C.]: −3.2 CCH-34 4.00% ε_(∥) [1 kHz, 20° C.]: 3.6 CCH-35 5.00% ε_(⊥) [1 kHz, 20° C.]: 6.7 CCP-3-1 8.00% K₁ [pN, 20° C.]: 13.4 CCP-3-3 5.00% K₃ [pN, 20° C.]: 15.6 CPY-2-O2 10.50%  V₀ [pN, 20° C.]: 2.31 CPY-3-O2 10.50%  γ₁ [mPa · s, 20° C.]: 109 CY-3-O2 15.00%  PY-3-O2 12.00%  B-2O-O5 3.00%

additionally comprises 0.025% of ST-8-1.

Example M173

The liquid-crystalline mixture

BCH-32 2.50% Clearing point [° C.]: 74.4 CCP-3-1 8.00% Δn [589 nm, 20° C.]: 0.1093 CCY-3-O1 8.00% Δε [1 kHz, 20° C.]: −3.1 CCY-3-O2 11.00%  ε_(∥) [1 kHz, 20° C.]: 3.5 CCY-5-O2 1.50% ε_(⊥) [1 kHz, 20° C.]: 6.6 PGIY-2-O4 5.00% K₁ [pN, 20° C.]: 15.3 B-2O-O5 4.00% K₃ [pN, 20° C.]: 15.8 CC-3-V 5.00% V₀ [pN, 20° C.]: 2.37 CC-3-V1 7.00% γ₁ [mPa · s, 20° C.]: 105 CCH-23 11.00%  CCH-34 9.00% CCH-35 2.00% CY-3-O2 2.50% PCH-301 1.00% PP-1-2V1 4.50% PY-3-O2 18.00% 

additionally comprises 0.025% of ST-8-1.

Example M174

The liquid-crystalline mixture

BCH-32 6.50% Clearing point [° C.]: 74.2 CCP-3-1 8.00% Δn [589 nm, 20° C.]: 0.1086 CCY-3-O2 11.00%  Δε [1 kHz, 20° C.]: −3.2 CCY-5-O2 7.50% ε_(∥) [1 kHz, 20° C.]: 3.6 PGIY-2-O4 5.00% ε_(⊥) [1 kHz, 20° C.]: 6.8 B-2O-O5 3.00% K₁ [pN, 20° C.]: 14.2 CC-3-V 10.00%  K₃ [pN, 20° C.]: 15.9 CC-3-V1 8.00% V₀ [pN, 20° C.]: 2.35 CCH-23 10.00%  γ₁ [mPa · s, 20° C.]: 105 CCH-34 3.00% CY-3-O2 9.00% PCH-301 1.50% PP-1-2V1 1.50% PY-3-O2 16.00% 

additionally comprises 0.025% of ST-8-1.

Example M175

The liquid-crystalline mixture

B-2O-O5 3.00% Clearing point [° C.]: 74.5 CC-3-V 15.00%  Δn [589 nm, 20° C.]: 0.1092 CC-3-V1 10.00%  Δε [1 kHz, 20° C.]: −3.3 CCH-34 9.00% ε_(∥) [1 kHz, 20° C.]: 3.6 CCP-3-1 8.00% ε_(⊥) [1 kHz, 20° C.]: 6.9 CCP-3-3 6.00% K₁ [pN, 20° C.]: 14.0 CPY-2-O2 8.50% K₃ [pN, 20° C.]: 15.7 CPY-3-O2 11.00%  V₀ [pN, 20° C.]: 2.31 CY-3-O2 15.00%  γ₁ [mPa · s, 20° C.]: 102 PGIY-2-O4 4.00% PY-3-O2 10.50% 

additionally comprises 0.025% of ST-8-1.

Example M176

The liquid-crystalline mixture

B-2O-O5 3.00% Clearing point [° C.]: 74.5 BCH-32 2.00% Δn [589 nm, 20° C.]: 0.1090 CC-3-V 37.00%  Δε [1 kHz, 20° C.]: −3.2 CC-3-V1 6.50% ε_(∥) [1 kHz, 20° C.]: 3.6 CCY-3-O1 6.50% ε_(⊥) [1 kHz, 20° C.]: 6.8 CCY-3-O2 3.50% K₁ [pN, 20° C.]: 14.1 CLY-3-O2 10.00%  K₃ [pN, 20° C.]: 15.9 CPY-3-O2 10.50%  V₀ [pN, 20° C.]: 2.35 PY-3-O2 18.00%  γ₁ [mPa · s, 20° C.]: 86 PYP-2-3 3.00%

additionally comprises 0.025% of ST-12.

Example M177

The liquid-crystalline mixture

B-2O-O5 3.00% Clearing point [° C.]: 74.6 CC-3-V 36.50%  Δn [589 nm, 20° C.]: 0.1092 CC-3-V1 9.00% Δε [1 kHz, 20° C.]: −3.2 CCY-3-O1 5.50% ε_(∥) [1 kHz, 20° C.]: 3.5 CLY-3-O2 10.00%  ε_(⊥) [1 kHz, 20° C.]: 6.7 CPY-2-O2 6.50% K₁ [pN, 20° C.]: 14.2 CPY-3-O2 10.50%  K₃ [pN, 20° C.]: 15.7 PY-3-O2 16.00%  V₀ [pN, 20° C.]: 2.34 PYP-2-3 3.00% γ₁ [mPa · s, 20° C.]: 86

additionally comprises 0.025% of ST-8-1.

Example M178

The liquid-crystalline mixture

B-2O-O5 4.00% Clearing point [° C.]: 74.6 BCH-32 0.50% Δn [589 nm, 20° C.]: 0.1036 CC-3-V 33.00%  Δε [1 kHz, 20° C.]: −3.4 CC-3-V1 8.00% ε_(∥) [1 kHz, 20° C.]: 3.6 CCH-301 1.00% ε_(⊥) [1 kHz, 20° C.]: 7.0 CCY-3-1 2.50% K₁ [pN, 20° C.]: 13.4 CCY-3-O1 9.00% K₃ [pN, 20° C.]: 14.9 CCY-4-O2 5.00% V₀ [pN, 20° C.]: 2.21 CPY-2-O2 5.50% γ₁ [mPa · s, 20° C.]: 92 CPY-3-O2 12.50%  CY-3-O2 7.00% PY-1-O4 1.50% PY-3-O2 8.00% PYP-2-3 2.50%

additionally comprises 0.025% of ST-8-1.

Example M179

The liquid-crystalline mixture

CC-3-V 34.50%  Clearing point [° C.]: 74.7 CC-3-V1 10.00%  Δn [589 nm, 20° C.]: 0.1094 CCP-3-1 1.00% Δε [1 kHz, 20° C.]: −3.2 CLY-3-O2 10.00%  ε_(∥) [1 kHz, 20° C.]: 3.5 CLY-3-O3 3.00% ε_(⊥) [1 kHz, 20° C.]: 6.8 CPY-2-O2 8.00% K₁ [pN, 20° C.]: 13.9 CPY-3-O2 10.50%  K₃ [pN, 20° C.]: 15.8 CY-3-O2 4.50% V₀ [pN, 20° C.]: 2.34 PY-3-O2 12.50%  γ₁ [mPa · s, 20° C.]: 87 PYP-2-3 3.00% B-2O-O5 3.00%

additionally comprises 0.04% of ST-3b-1 and 0.02% of ST-9-1.

Example M180

The liquid-crystalline mixture

B-2O-O5 3.00% Clearing point [° C.]: 74.8 BCH-32 2.50% Δn [589 nm, 20° C.]: 0.1096 CC-3-V 42.00%  Δε [1 kHz, 20° C.]: −3.2 CC-3-V1 1.00% ε_(∥) [1 kHz, 20° C.]: 3.5 CCY-3-O2 9.00% ε_(⊥) [1 kHz, 20° C.]: 6.7 CLY-3-O2 10.00%  K₁ [pN, 20° C.]: 14.1 CPY-2-O2 2.00% K₃ [pN, 20° C.]: 15.7 CPY-3-O2 10.50%  V₀ [pN, 20° C.]: 2.34 PY-3-O2 17.00%  γ₁ [mPa · s, 20° C.]: 85 PYP-2-3 3.00%

additionally comprises 0.025% of ST-8-1.

Example M181

The liquid-crystalline mixture

CY-3-O2 3.00% Clearing point [° C.]: 74.9 CCY-3-O1 5.00% Δn [589 nm, 20° C.]: 0.1032 CCY-3-O2 4.50% Δε [1 kHz, 20° C.]: −4.0 CPY-2-O2 8.00% ε_(∥) [1 kHz, 20° C.]: 3.9 CPY-3-O2 10.00%  ε_(⊥) [1 kHz, 20° C.]: 7.9 CLY-3-O2 7.00% K₁ [pN, 20° C.]: 13.2 CLY-3-O3 4.00% K₃ [pN, 20° C.]: 13.9 Y—4O—O4 7.00% V₀ [pN, 20° C.]: 1.96 PGIY-2-O4 7.00% γ₁ [mPa · s, 20° C.]: 92 B—2O—O5 4.00% CC-3-V 40.50% 

additionally comprises 0.025% of ST-8-1.

Example M182

The liquid-crystalline mixture

CC-3-V 37.50% CCY-3-O1  5.00% CCY-3-O2 13.75% CCY-4-O2  4.25% CPY-3-O2 13.50% CY-3-O2  7.50% PY-3-O2 15.50% B—2O—O4  3.00%

additionally comprises 0.025% of ST-8-1.

Example M183

The liquid-crystalline mixture

CCP—V-1 2.00% Clearing point [° C.]: 75 CCY-3-O1 7.00% Δn [589 nm, 20° C.]: 0.1050 CCY-3-O2 7.00% Δε [1 kHz, 20° C.]: −3.7 CCY-4-O2 3.00% ε_(∥) [1 kHz, 20° C.]: 3.7 CCY-5-O2 1.50% ε_(⊥) [1 kHz, 20° C.]: 7.4 CLY-3-O2 8.00% K₁ [pN, 20° C.]: 14.8 CLY-3-O3 2.00% K₃ [pN, 20° C.]: 15.4 PGIY-2-O4 5.00% V₀ [pN, 20° C.]: 2.15 B—2O—O5 5.00% γ₁ [mPa · s, 20° C.]: 93 CC-3-V 34.00%  CC-3-V1 8.00% PY-1-O4 3.50% PY-3-O2 14.00% 

additionally comprises 0.025% of ST-8-1.

Example M184

The liquid-crystalline mixture

CCP—V-1 2.00% Clearing point [° C.]: 75 CCY-3-O1 5.00% Δn [589 nm, 20° C.]: 0.1013 CCY-3-O2 7.50% Δε [1 kHz, 20° C.]: −3.7 CCY-4-O2 3.50% ε_(∥) [1 kHz, 20° C.]: 3.7 CLY-3-O2 10.00%  ε_(⊥) [1 kHz, 20° C.]: 7.4 CLY-3-O3 2.00% K₁ [pN, 20° C.]: 14.4 PGIY-2-O4 5.00% K₃ [pN, 20° C.]: 15.5 B—2O—O5 5.00% V₀ [pN, 20° C.]: 2.15 CC-3-V 34.00%  γ₁ [mPa · s, 20° C.]: 91 CC-3-V1 8.00% CY-3-O2 6.00% PY-3-O2 12.00% 

additionally comprises 0.025% of ST-8-1.

Example M185

The liquid-crystalline mixture

CCP—V-1 1.00% Clearing point [° C.]: 75 CCY-3-O1 7.00% Δn [589 nm, 20° C.]: 0.1081 CCY-3-O2 7.00% Δε [1 kHz, 20° C.]: −3.7 CCY-4-O2 3.00% ε_(∥) [1 kHz, 20° C.]: 3.7 CCY-5-O2 1.00% ε_(⊥) [1 kHz, 20° C.]: 7.4 CLY-3-O2 8.00% K₁ [pN, 20° C.]: 14.5 CLY-3-O3 2.00% K₃ [pN, 20° C.]: 15.2 PGIY-2-O4 5.00% V₀ [pN, 20° C.]: 2.14 PYP-2-3 2.50% γ₁ [mPa · s, 20° C.]: 93 B—2O—O5 5.00% CC-3-V 34.00%  CC-3-V1 7.50% PY-1-O4 2.00% PY-3-O2 15.00% 

additionally comprises 0.025% of ST-8-1.

Example M186

The liquid-crystalline mixture

CY-3-O2 3.00% Clearing point [° C.]: 75.1 CCY-3-O1 5.00% Δn [589 nm, 20° C.]: 0.1021 CCY-3-O2 3.00% Δε [1 kHz, 20° C.]: −3.7 CPY-2-O2 8.00% ε_(∥) [1 kHz, 20° C.]: 3.8 CPY-3-O2 10.00%  ε_(⊥) [1 kHz, 20° C.]: 7.5 CLY-3-O2 7.00% K₁ [pN, 20° C.]: 13.3 CLY-3-O3 4.00% K₃ [pN, 20° C.]: 14.0 Y—4O—O4 6.00% V₀ [pN, 20° C.]: 2.04 PGIY-2-O4 7.00% γ₁ [mPa · s, 20° C.]: 87 B—2O—O5 4.00% CC-3-V 43.00% 

additionally comprises 0.025% of ST-8-1.

Example M187

The liquid-crystalline mixture

CCY-3-O1 8.00% Clearing point [° C.]: 75.5 CCY-4-O2 3.00% Δn [589 nm, 20° C.]: 0.1024 CLY-3-O2 8.00% Δε [1 kHz, 20° C.]: −3.8 CLY-3-O3 4.00% ε_(∥) [1 kHz, 20° C.]: 3.7 CPY-2-O2 7.50% ε_(⊥) [1 kHz, 20° C.]: 7.5 CPY-3-O2 3.00% B—2O—O5 4.00% CC-3-V 41.50%  PY-1-O4 5.00% PY-3-O2 11.50%  CCY-3-O2 4.50%

additionally comprises 0.025% of ST-8-1.

Example M188

The liquid-crystalline mixture

CCY-3-O1  6.50% Clearing point [° C.]: 79.5 CLY-3-O2 10.00% Δn [589 nm, 20° C.]: 0.1070 CPY-2-O2 10.00% Δε [1 kHz, 20° C.]: −3.9 CPY-3-O2 10.00% ε_(∥) [1 kHz, 20° C.]: 3.7 PYP-2-3  5.50% ε_(⊥) [1 kHz, 20° C.]: 7.6 B—2O—O5  4.00% K₁ [pN, 20° C.]: 13.9 CC-3-V 37.00% K₃ [pN, 20° C.]: 15.5 CY-3-O2 14.00% V₀ [pN, 20° C.]: 2.09 CCY-3-O2  1.50% γ₁ [mPa · s, 20° C.]: 104 CY-5-O2  1.50%

additionally comprises 0.02% of ST-12.

Example M189

The liquid-crystalline mixture

CCP—V2-1 5.00% Clearing point [° C.]: 79.5 CLY-3-O2 10.00%  Δn [589 nm, 20° C.]: 0.1079 CPY-3-O2 9.00% Δε [1 kHz, 20° C.]: −2.0 PGIY-2-O4 2.50% ε_(∥) [1 kHz, 20° C.]: 3.2 PYP-2-3 8.00% ε_(⊥) [1 kHz, 20° C.]: 5.3 PYP-2-4 5.00% K₁ [pN, 20° C.]: 14.4 B—2O—O5 4.00% K₃ [pN, 20° C.]: 15.5 CC-3-V 43.00%  V₀ [pN, 20° C.]: 2.92 CC-3-V1 7.50% γ₁ [mPa · s, 20° C.]: 75 CY-3-O2 6.00%

additionally comprises 0.03% of ST-2a-1.

Example M190

The liquid-crystalline mixture

CCY-3-O1 1.00% Clearing point [° C.]: 79.5 CLY-3-O2 10.00%  Δn [589 nm, 20° C.]: 0.1151 CLY-3-O3 1.50% Δε [1 kHz, 20° C.]: −4.0 CPY-2-O2 10.00%  ε_(∥) [1 kHz, 20° C.]: 3.7 CPY-3-O2 10.00%  ε_(⊥) [1 kHz, 20° C.]: 7.7 PGIY-2-O4 5.00% K₁ [pN, 20° C.]: 14.4 PYP-2-3 6.00% K₃ [pN, 20° C.]: 15.7 B—2O—O5 2.50% V₀ [pN, 20° C.]: 2.09 CC-3-V 27.00%  γ₁ [mPa · s, 20° C.]: 115 CC-3-V1 8.00% CY-3-O2 11.00%  CY-5-O2 6.50% CY-3-O4 1.50%

additionally comprises 0.025% of ST-8-1.

Example M191

The liquid-crystalline mixture

CLY-3-O2 10.00%  Clearing point [° C.]: 79.5 CLY-3-O3 2.00% Δn [589 nm, 20° C.]: 0.1157 CPY-2-O2 10.50%  Δε [1 kHz, 20° C.]: −4.0 CPY-3-O2 9.50% ε_(∥) [1 kHz, 20° C.]: 3.7 PGIY-2-O4 5.00% ε_(⊥) [1 kHz, 20° C.]: 7.7 PYP-2-3 5.50% K₁ [pN, 20° C.]: 14.6 B—2O—O5 5.00% K₃ [pN, 20° C.]: 15.5 CC-3-V 30.00%  V₀ [pN, 20° C.]: 2.07 CC-3-V1 7.50% γ₁ [mPa · s, 20° C.]: 111 CY-3-O2 11.00%  CY-5-O2 4.00%

additionally comprises 0.025% of ST-8-1.

Example M192

The liquid-crystalline mixture

CCY-3-O1 4.00% Clearing point [° C.]: 79.8 CCY-3-O2 8.50% Δn [589 nm, 20° C.]: 0.1013 CCY-4-O2 5.00% Δε [1 kHz, 20° C.]: −3.7 CLY-3-O2 10.00%  ε_(∥) [1 kHz, 20° C.]: 3.6 CLY-3-O3 4.00% ε_(⊥) [1 kHz, 20° C.]: 7.3 PGIY-2-O4 5.00% K₁ [pN, 20° C.]: 14.7 PYP-2-3 1.00% K₃ [pN, 20° C.]: 16.3 B—2O—O5 5.00% V₀ [pN, 20° C.]: 2.20 CC-3-V 34.50%  γ₁ [mPa · s, 20° C.]: 97 CC-3-V1 8.50% CY-3-O2 5.00% PY-3-O2 9.50%

additionally comprises 0.025% of ST-8-1.

Example M193

The liquid-crystalline mixture

B—2O—O5 4.00% Clearing point [° C.]: 79.9 CC-3-V 32.00%  Δn [589 nm, 20° C.]: 0.1036 CCP-3-1 2.00% Δε [1 kHz, 20° C.]: −4.4 CCY-3-O2 8.00% ε_(∥) [1 kHz, 20° C.]: 4.0 CCY-4-O2 8.00% ε_(⊥) [1 kHz, 20° C.]: 8.3 CLY-3-O2 6.50% K₁ [pN, 20° C.]: 13.4 CLY-3-O3 6.50% K₃ [pN, 20° C.]: 14.4 CPY-2-O2 8.00% V₀ [pN, 20° C.]: 1.92 CPY-3-O2 8.00% γ₁ [mPa · s, 20° C.]: 89 CY-3-O2 2.00% PY-3-O2 10.00%  Y—4O—O4 5.00%

additionally comprises 0.04% of ST-3b-1 and 0.01% of ST-9-1.

Example M194

The liquid-crystalline mixture

B—2O—O5 4.00% Clearing point [° C.]: 79.9 CC-3-V 32.00%  Δn [589 nm, 20° C.]: 0.1058 CCP-3-1 2.00% Δε [1 kHz, 20° C.]: −4.6 CCY-3-O2 8.00% K₁ [pN, 20° C.]: 14.3 CCY-4-O2 8.00% K₃ [pN, 20° C.]: 15.1 CLY-3-O2 6.50% V₀ [pN, 20° C.]: 1.91 CLY-3-O3 6.50% γ₁ [mPa · s, 20° C.]: 113 CPY-2-O2 8.00% CPY-3-O2 8.00% CY-3-O2 2.00% PY-3-O2 10.00%  Y—4O—O4 5.00%

additionally comprises 0.04% of ST-3b-1 and 0.01% of ST-9-1.

Example M195

The liquid-crystalline mixture

CC-3-V 22.00%  CC-3-V1 7.00% COY-3-O1 4.00% COY-3-O2 6.00% COY—1V—O2 4.00% CPP—V-3 6.50% BCH-32 5.00% PYP-2-3 8.00% CCOY—V—O2 2.50% CCOY-2-O2 10.00%  BCH-52 4.00% CCOY—V—O3 3.00% CCOY-3-O2 11.00%  CCOY—1V—O2 4.00% B—2O—O5 3.00%

additionally comprises 0.03% of ST-3a-1.

Example M196

The liquid-crystalline mixture

B-2O-O5 5.00% Clearing point [° C.]: 80 CC-3-V 37.00% Δn [589 nm, 20° C.]: 0.1094 CCP-V-1 4.50% Δε [1 kHz, 20° C.]: −3.7 CCY-3-O1 5.00% ε_(||) [1 kHz, 20° C.]: 3.7 CCY-3-O2 6.00% ε_(⊥) [1 kHz, 20° C.]: 7.4 CCY-4-O2 5.00% K₁ [pN, 20° C.]: 13.9 CLY-3-O2 8.00% K₃ [pN, 20° C.]: 14.4 CPY-2-O2 9.50% V₀ [pN, 20° C.]: 2.09 PGIY-2-O4 6.00% γ₁ [mPa · s, 20° C.]: 106 PY-3-O2 14.00%

additionally comprises 0.025% of ST-8-1.

Example M197

The liquid-crystalline mixture

B-2O-O5 5.00% Clearing point [° C.]: 80.1 BCH-32 7.00% Δn [589 nm, 20° C.]: 0.1096 CC-3-V 34.50% Δε [1 kHz, 20° C.]: −3.7 CCP-V-1 2.00% ε_(||) [1 kHz, 20° C.]: 3.9 CCY-3-O1 5.00% ε_(⊥) [1 kHz, 20° C.]: 7.6 CCY-3-O2 4.00% K₁ [pN, 20° C.]: 13.3 CCY-4-O2 2.00% K₃ [pN, 20° C.]: 13.7 CLY-3-O2 8.00% V₀ [pN, 20° C.]: 2.04 CPY-2-O2 10.00% γ₁ [mPa · s, 20° C.]: 104 CPY-3-O2 7.00% PGIY-2-O4 6.00% PY-3-O2 2.00% Y-4O-O4 7.50%

additionally comprises 0.025% of ST-8-1.

Example M198

The liquid-crystalline mixture

CCY-3-O1 7.00% Clearing point [° C.]: 80 CCY-3-O2 6.00% Δn [589 nm, 20° C.]: 0.1073 CCY-4-O2 6.50% Δε [1 kHz, 20° C.]: −3.9 CCY-5-O2 3.00% ε_(||) [1 kHz, 20° C.]: 3.7 CLY-3-O2 10.00% ε_(⊥) [1 kHz, 20° C.]: 7.6 PGIY-2-O4 5.00% γ₁ [mPa · s, 20° C.]: 90 PYP-2-3 2.00% B-2O-O5 5.00% CC-3-V 33.50% CC-3-V1 7.00% PY-1-O4 5.00% PY-3-O2 10.00%

additionally comprises 0.025% of ST-8-1.

Example M199

The liquid-crystalline mixture

CLY-3-O2 10.00% Clearing point [° C.]: 80 CLY-3-O3 1.50% Δn [589 nm, 20° C.]: 0.1080 CPY-2-O2 4.00% Δε [1 kHz, 20° C.]: −2.4 CPY-3-O2 10.00% ε_(||) [1 kHz, 20° C.]: 3.3 PGIY-2-O4 5.00% ε_(⊥) [1 kHz, 20° C.]: 5.7 PYP-2-3 8.00% K₁ [pN, 20° C.]: 14.0 B-2O-O5 4.50% K₃ [pN, 20° C.]: 15.8 CC-3-V 44.50% V₀ [pN, 20° C.]: 2.68 CC-3-V1 8.00% γ₁ [mPa · s, 20° C.]: 80 CY-3-O2 2.50% CY-5-O2 2.00%

additionally comprises 0.025% of ST-8-1.

Example M200

The liquid-crystalline mixture

CCY-3-O2 7.00% Clearing point [° C.]: 80 CCY-4-O2 2.00% Δn [589 nm, 20° C.]: 0.1009 CLY-3-O2 8.00% Δε [1 kHz, 20° C.]: −3.7 CLY-3-O3 4.00% ε_(||) [1 kHz, 20° C.]: 3.6 CPY-2-O2 3.00% ε_(⊥) [1 kHz, 20° C.]: 7.3 CPY-3-O2 8.00% K₁ [pN, 20° C.]: 14.4 PGIY-2-O4 5.00% K₃ [pN, 20° C.]: 16.4 PYP-2-3 1.00% V₀ [pN, 20° C.]: 2.21 B-2O-O5 5.00% γ₁ [mPa · s, 20° C.]: 99 CC-3-V 35.00% CC-3-V1 8.00% CY-3-O2 12.00% CY-5-O2 2.00%

additionally comprises 0.025% of ST-8-1.

Example M201

The liquid-crystalline mixture

CC-3-V 37.50% Clearing point [° C.]: 80.2 CCY-3-O1 5.00% Δn [589 nm, 20° C.]: 0.1097 CCY-3-O2 3.00% Δε [1 kHz, 20° C.]: −3.9 CCY-4-O2 7.00% ε_(||) [1 kHz, 20° C.]: 3.7 CLY-3-O2 8.00% ε_(⊥) [1 kHz, 20° C.]: 7.6 CPY-2-O2 10.00% K₁ [pN, 20° C.]: 13.5 CPY-3-O2 8.00% K₃ [pN, 20° C.]: 14.5 PY-1-O4 3.50% V₀ [pN, 20° C.]: 1.08 PY-3-O2 12.00% γ₁ [mPa · s, 20° C.]: 110 PGIY-2-O4 2.00% B-2O-O5 4.00%

additionally comprises 0.025% of ST-8-1.

Example M202

The liquid-crystalline mixture

B-2O-O5 4.00% Clearing point [° C.]: 80.4 CC-3-V 24.50% Δn [589 nm, 20° C.]: 0.1030 CC-3-V1 5.00% Δε [1 kHz, 20° C.]: −4.4 CCP-3-1 3.00% ε_(||) [1 kHz, 20° C.]: 4.0 CCY-3-O2 8.00% ε_(⊥) [1 kHz, 20° C.]: 8.4 CCY-4-O2 8.00% K₁ [pN, 20° C.]: 13.3 CLY-3-O2 6.00% K₃ [pN, 20° C.]: 14.3 CLY-3-O3 6.00% V₀ [pN, 20° C.]: 1.91 CPY-2-O2 6.50% γ₁ [mPa · s, 20° C.]: 96 CPY-3-O2 8.00% CY-3-O2 8.00% PYP-2-3 5.00% Y-4O-O4 8.00%

additionally comprises 0.04% of ST-3b-1 and 0.01% of ST-9-1.

Example M203

The liquid-crystalline mixture

BCH-32 0.50% Clearing point [° C.]: 80.4 CC-3-V 37.00% Δn [589 nm, 20° C.]: 0.1195 CCY-3-O1 5.00% Δε [1 kHz, 20° C.]: −3.9 CCY-3-O2 3.50% ε_(||) [1 kHz, 20° C.]: 3.8 CLY-3-O2 8.00% ε_(⊥) [1 kHz, 20° C.]: 7.7 CPY-2-O2 10.00% K₁ [pN, 20° C.]: 13.5 CPY-3-O2 10.00% K₃ [pN, 20° C.]: 14.5 PY-3-O2 14.00% V₀ [pN, 20° C.]: 2.04 PGIY-2-O4 8.00% γ₁ [mPa · s, 20° C.]: 114 B-2O-O5 4.00%

additionally comprises 0.01% of ST-8-1.

Example M204

The liquid-crystalline mixture

CCY-3-O2 6.00% Clearing point [° C.]: 80.4 CCY-4-O2 3.00% Δn [589 nm, 20° C.]: 0.1014 CLY-3-O2 8.00% Δε [1 kHz, 20° C.]: −3.7 CLY-3-O3 2.00% ε_(||) [1 kHz, 20° C.]: 3.6 CPY-2-O2 6.50% ε_(⊥) [1 kHz, 20° C.]: 7.3 CPY-3-O2 8.00% K₁ [pN, 20° C.]: 13.9 PGIY-2-O4 5.00% K₃ [pN, 20° C.]: 15.8 B-2O-O5 5.00% V₀ [pN, 20° C.]: 2.20 CC-3-V 36.00% γ₁ [mPa · s, 20° C.]: 99 CC-3-V1 7.50% CY-3-O2 11.00% CY-5-O2 2.00%

additionally comprises 0.04% of ST-3b-1 and 0.01% of ST-9-1.

Example M205

The liquid-crystalline mixture

CC-3-V 25.00% Clearing point [° C.]: 80.5 CC-3-V1 7.00% Δn [589 nm, 20° C.]: 0.0995 CCP-3-1 7.00% Δε [1 kHz, 20° C.]: −3.8 CCY-3-O1 4.50% ε_(||) [1 kHz, 20° C.]: 3.7 CCY-3-O2 6.50% ε_(⊥) [1 kHz, 20° C.]: 7.5 CCY-4-O2 5.00% K₁ [pN, 20° C.]: 13.7 CCY-5-O2 4.00% K₃ [pN, 20° C.]: 15.8 CLY-3-O2 8.00% V₀ [pN, 20° C.]: 2.12 CY-3-O2 12.00% γ₁ [mPa · s, 20° C.]: 111 CY-3-O4 4.00% PY-3-O2 7.00% PGIY-2-O4 6.00% B-2O-O5 4.00%

additionally comprises 0.04% of ST-3b-1 and 0.01% of ST-9-1.

Example M206

The liquid-crystalline mixture

CC-3-V 26.00% Clearing point [° C.]: 80.8 CC-3-V1 7.00% Δn [589 nm, 20° C.]: 0.1099 CCP-3-1 6.00% Δε [1 kHz, 20° C.]: −3.9 CCY-3-O1 2.00% ε_(||) [1 kHz, 20° C.]: 3.7 CCY-3-O2 7.00% ε_(⊥) [1 kHz, 20° C.]: 7.6 CCY-4-O2 7.00% K₁ [pN, 20° C.]: 14.2 CCY-5-O2 4.00% K₃ [pN, 20° C.]: 15.6 CLY-3-O2 8.00% V₀ [pN, 20° C.]: 2.12 CY-3-O2 4.00% γ₁ [mPa · s, 20° C.]: 121 PY-1-O4 5.00% PY-3-O2 12.00% PGIY-2-O4 8.00% B-2O-O5 4.00%

additionally comprises 0.04% of ST-3b-1 and 0.01% of ST-9-1.

Example M207

The liquid-crystalline mixture

CC-3-V 44.50% Clearing point [° C.]: 73.5 CCY-3-O1 3.00% Δn [589 nm, 20° C.]: 0.1009 CCY-3-O2 11.00% Δε [1 kHz, 20° C.]: −3.5 CCY-4-O2 3.00% ε_(||) [1 kHz, 20° C.]: 3.6 CPY-2-O2 9.00% ε_(⊥) [1 kHz, 20° C.]: 7.1 CPY-3-O2 10.00% K₁ [pN, 20° C.]: 13.1 CY-3-O2 3.50% K₃ [pN, 20° C.]: 14.4 PY-3-O2 11.00% V₀ [pN, 20° C.]: 2.16 B-2O-O5 5.00% γ₁ [mPa · s, 20° C.]: 81

additionally comprises 0.025% of ST-8-1.

Comparison VHR after UV M207 without stabiliser 54% M207 with stabiliser 76% (0.025% of ST-8-1)

Example M208

The liquid-crystalline mixture

CCY-3-O1 8.00% Clearing point [° C.]: 82 CCY-3-O2 1.00% Δn [589 nm, 20° C.]: 0.1081 CLY-3-O2 10.00% Δε [1 kHz, 20° C.]: −3.5 CPY-2-O2 9.50% ε_(||) [1 kHz, 20° C.]: 3.6 CPY-3-O2 10.00% ε_(⊥) [1 kHz, 20° C.]: 7.2 PGIY-2-O4 5.00% K₁ [pN, 20° C.]: 14.4 PYP-2-3 1.00% K₃ [pN, 20° C.]: 15.3 B-2O-O5 5.00% V₀ [pN, 20° C.]: 2.20 CC-3-V 44.50% γ₁ [mPa · s, 20° C.]: 95 PY-1-O4 4.00% Y-4O-O4 2.00%

additionally comprises 0.04% of ST-3b-1 and 0.01% of ST-9-1.

Example M209

The liquid-crystalline mixture

B-2O-O5 4.00% Clearing point [° C.]: 84.6 CC-3-V 31.00% Δn [589 nm, 20° C.]: 0.1069 CC-3-V1 4.00% Δε [1 kHz, 20° C.]: −3.8 CCP-3-1 3.00% ε_(||) [1 kHz, 20° C.]: 3.7 CCY-3-O2 8.50% ε_(⊥) [1 kHz, 20° C.]: 7.5 CCY-4-O2 6.00% K₁ [pN, 20° C.]: 14.1 CLY-3-O2 6.00% K₃ [pN, 20° C.]: 15.0 CLY-3-O3 6.00% V₀ [pN, 20° C.]: 2.09 CPY-2-O2 8.00% γ₁ [mPa · s, 20° C.]: 88 CPY-3-O2 8.00% PY-3-O2 8.00% PY-4-O2 3.00% PYP-2-4 1.50% Y-4O-O4 3.00%

additionally comprises 0.04% of ST-3b-1 and 0.015% of ST-9-1.

Example M210

The liquid-crystalline mixture

CCY-3-O2 10.00% Clearing point [° C.]: 85 CCY-5-O2 7.00% Δn [589 nm, 20° C.]: 0.1047 CPY-2-O2 10.00% Δε [1 kHz, 20° C.]: −3.4 CPY-3-O2 10.00% ε_(||) [1 kHz, 20° C.]: 3.5 PYP-2-3 5.50% ε_(⊥) [1 kHz, 20° C.]: 6.9 B-2O-O5 4.00% K₁ [pN, 20° C.]: 14.6 CC-3-V 32.00% K₃ [pN, 20° C.]: 17.4 CC-3-V1 10.00% V₀ [pN, 20° C.]: 2.37 CY-3-O2 10.00% γ₁ [mPa · s, 20° C.]: 108 CY-5-O2 1.50%

additionally comprises 0.04% of ST-3b-1 and 0.01% of ST-9-1.

Example M211

The liquid-crystalline mixture

CC-3-V 35.00% Clearing point [° C.]: 86 CCY-3-O1 5.00% Δn [589 nm, 20° C.]: 0.1208 CCY-3-O2 7.50% Δε [1 kHz, 20° C.]: −4.2 CLY-3-O2 8.00% ε_(||) [1 kHz, 20° C.]: 3.8 CPY-2-O2 10.00% ε_(⊥) [1 kHz, 20° C.]: 8.0 CPY-3-O2 10.00% K₁ [pN, 20° C.]: 14.3 PY-3-O2 12.50% K₃ [pN, 20° C.]: 15.6 PGIY-2-O4 8.00% V₀ [pN, 20° C.]: 2.04 B-2O-O5 4.00% γ₁ [mPa · s, 20° C.]: 129

additionally comprises 0.04% of ST-3b-1 and 0.01% of ST-9-1.

Example M212

The liquid-crystalline mixture

CC-3-V 35.00% Clearing point [° C.]: 86.1 CCY-3-O1 5.00% Δn [589 nm, 20° C.]: 0.1103 CCY-3-O2 6.00% Δε [1 kHz, 20° C.]: −4.1 CCY-3-O3 2.00% ε_(||) [1 kHz, 20° C.]: 3.7 CCY-4-O2 6.00% ε_(⊥) [1 kHz, 20° C.]: 7.8 CLY-3-O2 8.00% K₁ [pN, 20° C.]: 14.2 CPY-2-O2 10.00% K₃ [pN, 20° C.]: 15.7 CPY-3-O2 9.50% V₀ [pN, 20° C.]: 2.06 PY-1-O4 3.50% γ₁ [mPa · s, 20° C.]: 125 PY-3-O2 11.00% B-2O-O5 4.00%

additionally comprises 0.04% of ST-3b-1 and 0.01% of ST-9-1.

Example M213

The liquid-crystalline mixture

CCY-3-O1 3.50% Clearing point [° C.]: 86.5 CCY-3-O2 4.50% Δn [589 nm, 20° C.]: 0.1053 CLY-3-O2 9.00% Δε [1 kHz, 20° C.]: −3.4 CPY-2-O2 10.50% ε_(||) [1 kHz, 20° C.]: 3.5 CPY-3-O2 11.00% ε_(⊥) [1 kHz, 20° C.]: 6.9 PYP-2-3 3.50% K₁ [pN, 20° C.]: 14.8 CC-3-V 32.00% K₃ [pN, 20° C.]: 17.8 CC-3-V1 12.00% V₀ [pN, 20° C.]: 2.41 CY-3-O2 10.00% γ₁ [mPa · s, 20° C.]: 105 B-2O-O5 4.00%

additionally comprises 0.04% of ST-3b-1 and 0.01% of ST-9-1.

Example M214

The liquid-crystalline mixture

CC-3-V 22.50% Clearing point [° C.]: 97.2 CC-3-V1 7.00% Δn [589 nm, 20° C.]: 0.1005 CCP-3-1 2.00% Δε [1 kHz, 20° C.]: −4.6 CCY-3-O1 5.00% ε_(||) [1 kHz, 20° C.]: 3.6 CCY-3-O2 7.00% ε_(⊥) [1 kHz, 20° C.]: 8.2 CCY-3-O3 5.00% K₁ [pN, 20° C.]: 15.8 CCY-4-O2 7.00% K₃ [pN, 20° C.]: 18.6 CCY-5-O2 5.00% V₀ [pN, 20° C.]: 2.13 CLY-3-O2 8.00% γ₁ [mPa · s, 20° C.]: 172 CPY-3-O2 8.00% CY-3-O2 12.00% CY-5-O2 4.50% PGIY-2-O4 3.00% B-2O-O5 4.00%

additionally comprises 0.04% of ST-3b-1 and 0.01% of ST-9-1.

Example M215

The liquid-crystalline mixture

CC-3-V 21.50% Clearing point [° C.]: 98.6 CC-3-V1 7.00% Δn [589 nm, 20° C.]: 0.1103 CCP-3-1 3.00% Δε [1 kHz, 20° C.]: −4.6 CCY-3-O1 5.00% ε_(||) [1 kHz, 20° C.]: 3.7 CCY-3-O2 7.00% ε_(⊥) [1 kHz, 20° C.]: 8.3 CCY-4-O2 7.00% K₁ [pN, 20° C.]: 16.3 CCY-5-O2 4.00% K₃ [pN, 20° C.]: 18.7 CLY-3-O2 8.00% V₀ [pN, 20° C.]: 2.12 CPY-3-O2 10.50% γ₁ [mPa · s, 20° C.]: 175 CY-3-O2 12.00% CY-5-O2 3.00% PGIY-2-O4 8.00% B-2O-O5 4.00%

additionally comprises 0.04% of ST-3b-1 and 0.01% of ST-9-1.

Example M216

The liquid-crystalline mixture

CC-3-V1 7.00% Clearing point [° C.]: 109 CCP-3-1 10.00% Δn [589 nm, 20° C.]: 0.1012 CCP-3-3 6.50% Δε [1 kHz, 20° C.]: −5.2 CCY-3-O1 5.00% ε_(||) [1 kHz, 20° C.]: 3.7 CCY-3-O2 6.00% ε_(⊥) [1 kHz, 20° C.]: 8.9 CCY-3-O3 7.50% K₁ [pN, 20° C.]: 18.2 CCY-4-O2 8.00% K₃ [pN, 20° C.]: 21.4 CCY-5-O2 4.00% V₀ [pN, 20° C.]: 2.13 CCY-3-1 8.00% γ₁ [mPa · s, 20° C.]: 287 CLY-3-O2 8.00% CY-3-O2 12.00% CY-3-O4 14.00% B-2O-O5 4.00%

additionally comprises 0.04% of ST-3b-1 and 0.01% of ST-9-1.

Example M217

The liquid-crystalline mixture

CC-3-V 10.75% Clearing point [° C.]: 111.8 CC-3-V1 3.50% Δn [589 nm, 20° C.]: 0.1104 CCP-3-1 7.50% Δε [1 kHz, 20° C.]: −5.2 CCY-3-O1 5.00% ε_(||) [1 kHz, 20° C.]: 3.7 CCY-3-O2 7.50% ε_(⊥) [1 kHz, 20° C.]: 8.9 CCY-4-O2 7.50% K₁ [pN, 20° C.]: 17.9 CCY-5-O2 4.50% K₃ [pN, 20° C.]: 21.0 CLY-3-O2 8.00% V₀ [pN, 20° C.]: 2.13 CPY-3-O2 8.00% γ₁ [mPa · s, 20° C.]: 267 CY-3-O2 12.00% CY-5-O2 5.00% PGIY-2-O4 4.00% B-2O-O5 4.00% CCP-3-3 1.75% CCY-3-O3 3.00% CCY-2-1 4.00% CCY-3-1 4.00%

additionally comprises 0.04% of ST-3b-1 and 0.01% of ST-9-1.

Example M218

The liquid-crystalline mixture

CCP-3-1 12.00% Clearing point [° C.]: 126 CCP-3-3 3.50% Δn [589 nm, 20° C.]: 0.1103 CCY-3-O1 5.00% Δε [1 kHz, 20° C.]: −5.8 CCY-3-O2 8.00% ε_(||) [1 kHz, 20° C.]: 3.7 CCY-3-O3 6.00% ε_(⊥) [1 kHz, 20° C.]: 9.5 CCY-4-O2 8.00% K₁ [pN, 20° C.]: 20.3 CCY-5-O2 5.00% K₃ [pN, 20° C.]: 23.8 CCY-2-1 8.00% V₀ [pN, 20° C.]: 2.14 CCY-3-1 8.00% γ₁ [mPa · s, 20° C.]: 422 CLY-3-O2 8.00% CPY-3-O2 5.50% CY-3-O2 12.00% CY-5-O2 7.00% B-2O-O5 4.00%

additionally comprises 0.04% of ST-3b-1 and 0.01% of ST-9-1.

Example M219

The liquid-crystalline mixture

CC-3-V 12.50% Clearing point [° C.]: 110.3 CC-3-V1 6.50% Δn [589 nm, 20° C.]: 0.1100 CCP-3-1 12.50% Δε [1 kHz, 20° C.]: −4.8 CCY-3-O1 5.00% ε_(||) [1 kHz, 20° C.]: 3.6 CCY-3-O2 7.50% ε_(⊥) [1 kHz, 20° C.]: 8.4 CCY-4-O2 3.00% K₁ [pN, 20° C.]: 17.9 CCY-5-O2 3.50% K₃ [pN, 20° C.]: 20.8 CLY-2-O4 5.00% V₀ [pN, 20° C.]: 2.22 CLY-3-O2 7.00% γ₁ [mPa · s, 20° C.]: 233 CLY-3-O3 6.00% CPY-3-O2 8.00% CY-3-O2 12.00% CY-5-O2 4.00% PGIY-2-O4 3.50% B-2O-O5 4.00%

additionally comprises 0.04% of ST-3b-1 and 0.01% of ST-9-1.

Example M220

The liquid-crystalline mixture

CC-3-V 14.00% Clearing point [° C.]: 111 CC-3-V1 6.00% Δn [589 nm, 20° C.]: 0.1102 CCP-3-1 7.00% Δε [1 kHz, 20° C.]: −5.2 CCY-3-O1 5.00% ε_(||) [1 kHz, 20° C.]: 3.7 CCY-3-O2 8.00% ε_(⊥) [1 kHz, 20° C.]: 8.9 CCY-4-O2 5.50% K₁ [pN, 20° C.]: 18.5 CCY-5-O2 2.00% K₃ [pN, 20° C.]: 20.5 CLY-2-O4 7.00% V₀ [pN, 20° C.]: 2.10 CLY-3-O2 8.00% γ₁ [mPa · s, 20° C.]: 241 CLY-3-O3 7.00% CPY-3-O2 10.00% CY-3-O2 12.00% CY-5-O2 2.50% PGIY-2-O4 2.00% B-2O-O5 4.00%

Example M221

The liquid-crystalline mixture

CC-3-V 12.25% Clearing point [° C.]: 110.9 CC-3-V1 6.00% Δn [589 nm, 20° C.]: 0.1101 CCP-3-1 11.00% Δε [1 kHz, 20° C.]: −5.0 CCY-3-O1 5.00% ε_(||) [1 kHz, 20° C.]: 3.6 CCY-3-O2 7.75% ε_(⊥) [1 kHz, 20° C.]: 8.6 CCY-4-O2 5.00% K₁ [pN, 20° C.]: 18.5 CCY-5-O2 3.50% K₃ [pN, 20° C.]: 20.8 CLY-2-O4 5.00% V₀ [pN, 20° C.]: 2.16 CLY-3-O2 7.00% γ₁ [mPa · s, 20° C.]: 240 CLY-3-O3 6.00% CPY-3-O2 8.00% CY-3-O2 12.00% CY-5-O2 4.25% PGIY-2-O4 3.25% B-2O-O5 4.00%

additionally comprises 0.04% of ST-3b-1 and 0.01% of ST-9-1.

Example M222

The liquid-crystalline mixture

CC-3-V 12.00% Clearing point [° C.]: 111.6 CC-3-V1 5.50% Δn [589 nm, 20° C.]: 0.1101 CCP-3-1 9.50% Δε [1 kHz, 20° C.]: −5.2 CCY-3-O1 5.00% ε_(||) [1 kHz, 20° C.]: 3.7 CCY-3-O2 8.00% ε_(⊥) [1 kHz, 20° C.]: 8.9 CCY-4-O2 7.00% K₁ [pN, 20° C.]: 18.6 CCY-5-O2 3.50% K₃ [pN, 20° C.]: 20.6 CLY-2-O4 5.00% V₀ [pN, 20° C.]: 2.11 CLY-3-O2 7.00% γ₁ [mPa · s, 20° C.]: 252 CLY-3-O3 6.00% CPY-3-O2 8.00% CY-3-O2 12.00% CY-5-O2 4.50% PGIY-2-O4 3.00% B-2O-O5 4.00%

additionally comprises 0.04% of ST-3b-1 and 0.01% of ST-9-1.

Example M223

The liquid-crystalline mixture

CC-3-V1 8.50% Clearing point [° C.]: 74 CCH-23 18.00% Δn [589 nm, 20° C.]: 0.0975 CCH-34 3.00% Δε [1 kHz, 20° C.]: −3.4 CCH-35 6.00% ε_(||) [1 kHz, 20° C.]: 3.5 CCP-3-1 10.50% ε_(⊥) [1 kHz, 20° C.]: 6.9 CCY-3-O2 11.00% K₁ [pN, 20° C.]: 15.1 CCY-3-O1 9.00% K₃ [pN, 20° C.]: 15.5 CPY-3-O2 4.50% V₀ [pN, 20° C.]: 2.27 CY-3-O2 8.00% γ₁ [mPa · s, 20° C.]: 101 PY-3-O2 13.00% PY-4-O2 5.50% B-2O-O5 3.00%

additionally comprises 0.025% of ST-8-1.

Comparison VHR after UV M223 without stabiliser 88% M223 with stabiliser 92% (0.025% of ST-8-1)

Example M224

The liquid-crystalline mixture

CC-3-V1 8.50% Clearing point [° C.]: 74 CCH-23 18.00% Δn [589 nm, 20° C.]: 0.0975 CCH-34 3.00% Δε [1 kHz, 20° C.]: −3.4 CCH-35 6.00% ε_(||) [1 kHz, 20° C.]: 3.5 CCP-3-1 10.50% ε_(⊥) [1 kHz, 20° C.]: 6.9 CCY-3-O2 11.00% K₁ [pN, 20° C.]: 15.1 CCY-3-O1 9.00% K₃ [pN, 20° C.]: 15.5 CPY-3-O2 4.50% V₀ [pN, 20° C.]: 2.27 CY-3-O2 8.00% γ₁ [mPa · s, 20° C.]: 101 PY-3-O2 13.00% PY-4-O2 5.50% B-2O-O5 3.00%

additionally comprises 0.01% of ST-9-1.

Comparison VHR after UV M224 without stabiliser 88% M224 with stabiliser 93% (0.025% of ST-9-1)

Example M225

The liquid-crystalline mixture

CY-3-O2 3.00% Clearing point [° C.]: 75.1 CCY-3-O1 5.00% Δn [589 nm, 20° C.]: 0.10215 CCY-3-O2 3.00% Δε [1 kHz, 20° C.]: −3.7 CPY-2-O2 8.00% ε_(||) [1 kHz, 20° C.]: 3.8 CPY-3-O2 10.00% ε_(⊥) [1 kHz, 20° C.]: 7.5 CLY-3-O2 7.00% K₁ [pN, 20° C.]: 13.3 CLY-3-O3 4.00% K₃ [pN, 20° C.]: 14.0 Y-4O-O4 6.00% V₀ [pN, 20° C.]: 2.04 PGIY-2-O4 7.00% γ₁ [mPa · s, 20° C.]: 87 B-2O-O5 4.00% CC-3-V 43.00%

additionally comprises 0.04% of ST-3b-1 and 0.01% of ST-9-1.

Example M226

The liquid-crystalline mixture

CY-3-O2 3.00% Clearing point [° C.]: 74.9 CCY-3-O1 5.00% Δn [589 nm, 20° C.]: 0.1032 CCY-3-O2 4.50% Δε [1 kHz, 20° C.]: −4.0 CPY-2-O2 8.00% ε_(||) [1 kHz, 20° C.]: 3.9 CPY-3-O2 10.00% ε_(⊥) [1 kHz, 20° C.]: 7.9 CLY-3-O2 7.00% K₁ [pN, 20° C.]: 13.2 CLY-3-O3 4.00% K₃ [pN, 20° C.]: 13.9 Y-4O-O4 7.00% V₀ [pN, 20° C.]: 1.96 PGIY-2-O4 7.00% γ₁ [mPa · s, 20° C.]: 92 B-2O-O5 4.00% CC-3-V 40.50%

additionally comprises 0.04% of ST-3b-1 and 0.01% of ST-9-1.

Example M227

The liquid-crystalline mixture

CY-3-O2 3.50% Clearing point [° C.]: 74.3 CCY-3-O1 5.00% Δn [589 nm, 20° C.]: 0.1096 CCY-3-O2 2.50% Δε [1 kHz, 20° C.]: −4.0 CPY-2-O2 8.00% ε_(||) [1 kHz, 20° C.]: 4.0 CPY-3-O2 10.00% ε_(⊥) [1 kHz, 20° C.]: 8.0 PYP-2-3 4.00% K₁ [pN, 20° C.]: 13.0 CLY-3-O2 7.00% K₃ [pN, 20° C.]: 13.7 CLY-3-O3 4.00% V₀ [pN, 20° C.]: 1.94 Y-4O-O4 7.00% γ₁ [mPa · s, 20° C.]: 96 PGIY-2-O4 7.00% B-2O-O5 4.00% CC-3-V 38.00%

additionally comprises 0.04% of ST-3b-1 and 0.01% of ST-9-1.

Example M228

The liquid-crystalline mixture

B-2O-O5 4.00% Clearing point [° C.]: 84.6 CC-3-V 31.00% Δn [589 nm, 20° C.]: 0.1069 CC-3-V1 4.00% Δε [1 kHz, 20° C.]: −3.8 CCP-3-1 3.00% ε_(||) [1 kHz, 20° C.]: 3.7 CCY-3-O2 8.50% ε_(⊥) [1 kHz, 20° C.]: 7.5 CCY-4-O2 6.00% K₁ [pN, 20° C.]: 14.1 CLY-3-O2 6.00% K₃ [pN, 20° C.]: 15.0 CLY-3-O3 6.00% V₀ [pN, 20° C.]: 2.09 CPY-2-O2 8.00% γ₁ [mPa · s, 20° C.]: 88 CPY-3-O2 8.00% PY-3-O2 8.00% PY-4-O2 3.00% PYP-2-4 1.50% Y-4O-O4 3.00%

additionally comprises 0.04% of ST-3b-1 and 0.015% ST-9-1.

Example M229

The liquid-crystalline mixture

CC-3-V 5.00% Clearing point [° C.]: 75.5 CC-3-V1 8.00% Δn [589 nm, 20° C.]: 0.1082 CCH-23 11.50% Δε [1 kHz, 20° C.]: −3.3 CCH-34 5.00% ε_(||) [1 kHz, 20° C.]: 3.6 CCP-3-1 10.00% K₁ [pN, 20° C.]: 15.2 CCP-3-3 5.00% K₃ [pN, 20° C.]: 16.0 CCY-3-O1 4.00% γ₁ [mPa · s, 20° C.]: 104 CCY-3-O2 11.50% V₀ [20° C., V]: 2.31 CY-3-O2 14.50% PY-3-O2 8.00% PYP-2-3 8.00% B-2O-O5 3.50% B(S)-2O-O5 3.50% PP-1-2V1 2.50%

additionally comprises 0.04% of ST-3b-1 and 0.01% of ST-9-1.

Example M230

The liquid-crystalline mixture

CC-3-V 20.00% Clearing point [° C.]: 99 CC-3-V1 6.00% Δn [589 nm, 20° C.]: 0.1008 CCP-3-1 5.50% Δε [1 kHz, 20° C.]: −4.7 CCY-3-O1 4.00% ε_(||) [1 kHz, 20° C.]: 3.6 CCY-3-O2 5.00% K₁ [pN, 20° C.]: 16.4 CCY-3-O3 4.00% K₃ [pN, 20° C.]: 18.6 CCY-4-O2 5.00% γ₁ [mPa · s, 20° C.]: 183 CCY-5-O2 3.00% V₀ [20° C., V]: 2.12 CLY-2-O4 4.00% CLY-3-O2 7.00% CLY-3-O3 5.00% CPY-3-O2 10.00% CY-3-O2 10.00% CY-5-O2 8.00% B-2O-O5 4.00%

additionally comprises 0.04% of ST-3b-1 and 0.01% of ST-9-1.

Example M231

For the preparation of a PS (polymer-stabilised) mixture, for example for PS-IPS, PS-VA, PS-FFS applications, 99.7% of the mixture according to Example M230 are mixed with 0.001% of Irganox 1076 and 0.3% of the polymerisable compound of the formula

Example M232

The liquid-crystalline mixture

CC-3-V 42.00% Clearing point [° C.]: 74 CCY-3-O2 11.00% Δn [589 nm, 20° C.]: 0.1008 CPY-2-O2 10.00% Δε [1 kHz, 20° C.]: −3.7 CPY-3-O2 11.00% ε_(⊥) [1 kHz, 20° C.]: 7.3 CY-3-O2 17.00% K₁ [pN, 20° C.]: 12.8 PGIY-2-O4 5.00% K₃ [pN, 20° C.]: 14.6 B(S)-2O-O5 4.00% γ₁ [mPa · s, 20° C.]: 86 V₀ [20° C., V]: 2.11

additionally comprises 0.03% of ST-8-1.

Example M233

The liquid-crystalline mixture

CY-3-O2 17.00% Clearing point [° C.]: 74.4 CCY-3-O2 6.00% Δn [589 nm, 20° C.]: 0.1116 CLY-3-O2 7.00% Δε [1 kHz, 20° C.]: −3.7 CPY-2-O2 3.00% ε_(⊥) [1 kHz, 20° C.]: 7.4 CPY-3-O2 10.00% K₁ [pN, 20° C.]: 13.5 PYP-2-3 6.50% K₃ [pN, 20° C.]: 15.2 PGIY-2-O4 7.00% γ₁ [mPa · s, 20° C.]: 97 B-2O-O5 4.00% V₀ [20° C., V]: 2.14 CC-3-V 33.00% ε_(⊥) [1 kHz, 20° C.]: 7.4 CC-3-V1 6.50%

additionally comprises 0.025% of ST-8-1.

Example M234

The liquid-crystalline mixture

CY-3-O2 15.00% Clearing point [° C.]: 80.1 CY-5-O2 3.50% Δn [589 nm, 20° C.]: 0.0951 CCY-3-O1 5.00% Δε [1 kHz, 20° C.]: −4.0 CCY-3-O2 6.00% ε_(⊥) [1 kHz, 20° C.]: 7.7 CCY-3-O3 5.50% K₁ [pN, 20° C.]: 13.9 CCY-4-O2 6.00% K₃ [pN, 20° C.]: 15.5 PYP-2-3 6.00% γ₁ [mPa · s, 20° C.]: 111 CLY-3-O2 7.00% V₀ [20° C., V]: 2.05 CLY-3-O3 7.00% B-2O-O5 4.00% CC-3-V 35.00%

additionally comprises 0.015% of ST-9-1.

Example M235

The liquid-crystalline mixture

B-2O-O5 4.00% Clearing point [° C.]: 74.2 BCH-32 8.00% Δn [589 nm, 20° C.]: 0.1091 CC-3-V1 9.00% Δε [1 kHz, 20° C.]: −3.1 CCH-301 2.00% ε_(⊥) [1 kHz, 20° C.]: 6.7 CCH-34 8.00% K₁ [pN, 20° C.]: 14.5 CCH-35 7.00% K₃ [pN, 20° C.]: 16.5 CCP-3-1 8.00% γ₁ [mPa · s, 20° C.]: 108 CCP-V2-1 5.00% V₀ [20° C., V]: 2.41 CCY-3-O2 10.50% CLY-3-O2 1.00% CPY-3-O2 2.50% CY-3-O2 11.50% PCH-301 5.50% PY-3-O2 18.00%

additionally comprises 0.005% of ST-3a-1.

Example M235a

For the preparation of a PS (polymer stabilised) mixture, for example for PS-IPS, PS-VA, PS-FFS applications, 99.65% of the mixture according to Example M235 are mixed with 0.35% of the polymerisable compound of the formula

Example M236

The liquid-crystalline mixture

CLY-2-O4 2.00% Clearing point [° C.]: 79.5 CLY-3-O2 7.50% Δn [589 nm, 20° C.]: 0.1151 CLY-3-O3 4.50% Δε [1 kHz, 20° C.]: −4.0 CPY-2-O2 10.00% ε_(||) [1 kHz, 20° C.]: CPY-3-O2 10.00% ε_(⊥) [1 kHz, 20° C.]: 7.7 PGIY-2-O4 8.00% K₁ [pN, 20° C.]: 14.3 PYP-2-3 3.00% K₃ [pN, 20° C.]: 14.9 B-2O-O5 5.00% γ₁ [mPa · s, 20° C.]: 107 CC-3-V 38.50% V₀ [20° C., V]: 2.02 CY-3-O2 11.50%

additionally comprises 0.015% of ST-3a-1.

Example M236

For the preparation of a PS (polymer stabilised) mixture, for example for PS-IPS, PS-VA, PS-FFS applications, 99.75% of the mixture according to Example M236 are mixed with 0.25% of the polymerisable compound of the formula

Example M237

The liquid-crystalline mixture

CCY-3-O1 3.50% Clearing point [° C.]: 84.5 CCY-3-O2 7.50% Δn [589 nm, 20° C.]: 0.1184 CCY-4-O2 8.00% Δε [1 kHz, 20° C.]: −4.8 CCY-5-O2 7.50% ε_(⊥) [1 kHz, 20° C.]: 8.7 CLY-3-O2 10.00% K₁ [pN, 20° C.]: 16.7 PGIY-2-O4 5.00% K₃ [pN, 20° C.]: 17.3 PYP-2-3 3.00% V₀ [20° C., V]: 1.99 B-2O-O5 5.00% CC-3-V 23.00% CC-3-V1 8.00% PY-1-O4 5.50% PY-3-O2 14.00%

additionally comprises 0.03% of ST-3a-1.

Example M238

The liquid-crystalline mixture

CCY-3-O1 3.00% Clearing point [° C.]: 84.5 CCY-3-O2 8.00% Δn [589 nm, 20° C.]: 0.1223 CCY-4-O2 8.00% Δε [1 kHz, 20° C.]: −4.9 CCY-5-O2 7.00% ε_(⊥) [1 kHz, 20° C.]: 8.8 CLY-3-O2 10.00% K₁ [pN, 20° C.]: 16.7 PGIY-2-O4 5.00% K₃ [pN, 20° C.]: 17.3 PYP-2-3 4.50% V₀ [20° C., V]: 1.98 B-2O-O5 5.00% CC-3-V 21.50% CC-3-V1 8.00% PY-1-O4 5.00% PY-3-O2 15.00%

additionally comprises 0.03% of ST-3a-1.

Example M239

The liquid-crystalline mixture

CCY-3-O2 8.50% Clearing point [° C.]: 79.0 CCY-4-O2 8.00% Δn [589 nm, 20° C.]: 0.1125 CLY-2-O4 5.00% Δε [1 kHz, 20° C.]: −4.5 CLY-3-O2 8.00% ε_(⊥) [1 kHz, 20° C.]: 8.3 CLY-3-O3 5.00% K₁ [pN, 20° C.]: 15.6 PGIY-2-O4 5.00% K₃ [pN, 20° C.]: 15.6 PYP-2-3 1.00% γ₁ [mPa · s, 20° C.]: 116 B-2O-O5 5.00% V₀ [20° C., V]: 1.96 CC-3-V 27.50% CC-3-V1 8.00% PY-1-O4 4.00% PY-3-O2 15.00%

additionally comprises 0.025% of ST-3a-1.

Example M240

The liquid-crystalline mixture

CCY-3-O1 5.00% Clearing point [° C.]: 79.5 CCY-3-O2 8.00% Δn [589 nm, 20° C.]: 0.1047 CCY-4-O2 8.00% Δε [1 kHz, 20° C.]: −4.4 CLY-2-O4 5.00% ε_(⊥) [1 kHz, 20° C.]: 8.2 CLY-3-O2 8.00% K₁ [pN, 20° C.]: 15.5 CLY-3-O3 5.00% K₃ [pN, 20° C.]: 15.9 B-2O-O5 5.00% γ₁ [mPa · s, 20° C.]: 115 CC-3-V 28.50% V₀ [20° C., V]: 1.99 CC-3-V1 7.50% PY-1-O4 5.00% PY-3-O2 15.00%

additionally comprises 0.025% of ST-3a-1.

Example M241

The liquid-crystalline mixture

CCY-3-O1 2.00% Clearing point [° C.]: 79.0 CCY-3-O2 8.00% Δn [589 nm, 20° C.]: 0.1048 CCY-4-O2 8.00% Δε [1 kHz, 20° C.]: −4.1 CLY-2-O4 5.00% ε_(⊥) [1 kHz, 20° C.]: 7.9 CLY-3-O2 8.00% K₁ [pN, 20° C.]: 15.6 CLY-3-O3 5.00% K₃ [pN, 20° C.]: 15.7 PGIY-2-O4 2.50% γ₁ [mPa · s, 20° C.]: 107 B-2O-O5 5.00% CC-3-V 31.00% CC-3-V1 8.00% PY-1-O4 2.50% PY-3-O2 15.00%

additionally comprises 0.02% of ST-2a-1.

Example M242

The liquid-crystalline mixture

CCY-3-O2 8.00% Clearing point [° C.]: 79.5 CCY-4-O2 3.50% Δn [589 nm, 20° C.]: 0.1050 CCY-5-O2 3.50% Δε [1 kHz, 20° C.]: −3.8 CLY-2-O4 5.00% ε_(⊥) [1 kHz, 20° C.]: 7.5 CLY-3-O2 8.00% K₁ [pN, 20° C.]: 15.6 CLY-3-O3 5.00% K₃ [pN, 20° C.]: 15.8 PGIY-2-O4 5.00% γ₁ [mPa · s, 20° C.]: 102 B-2O-O5 5.00% V₀ [20° C., V]: 2.13 CC-3-V 34.00% CC-3-V1 8.00% PY-3-O2 15.00%

additionally comprises 0.025% of ST-3a-1.

Example M243

The liquid-crystalline mixture

CCY-3-O2 8.00% Clearing point [° C.]: 75.0 CCY-4-O2 8.00% Δn [589 nm, 20° C.]: 0.1047 CLY-2-O4 5.00% Δε [1 kHz, 20° C.]: −4.2 CLY-3-O2 8.00% ε_(⊥) [1 kHz, 20° C.]: 8.0 CLY-3-O3 5.00% K₁ [pN, 20° C.]: 15.0 PGIY-2-O4 2.00% K₃ [pN, 20° C.]: 15.2 B-2O-O5 5.00% γ₁ [mPa · s, 20° C.]: 105 CC-3-V 30.00% V₀ [20° C., V]: 1.99 CC-3-V1 8.00% CY-5-O2 2.00% PY-1-O4 4.00% PY-3-O2 15.00%

additionally comprises 0.03% of ST-3a-1.

Example M244

The liquid-crystalline mixture

CCP-3-1 7.00% Clearing point [° C.]: 75.5 CLY-3-O2 10.00% Δn [589 nm, 20° C.]: 0.0992 CPY-2-O2 9.50% Δε [1 kHz, 20° C.]: −3.2 CPY-3-O2 10.50% ε_(⊥) [1 kHz, 20° C.]: 6.7 B-2O-O5 5.00% K₁ [pN, 20° C.]: 13.1 CC-3-V 42.50% K₃ [pN, 20° C.]: 15.4 CY-3-O2 12.00% γ₁ [mPa · s, 20° C.]: 85 PY-3-O2 3.50% V₀ [20° C., V]: 2.32

additionally comprises 0.03% of ST-3a-1.

Example M245

The liquid-crystalline mixture

CC-3-V 32.50% Clearing point [° C.]: 79.8 CC-3-V1 2.00% Δn [589 nm, 20° C.]: 0.1043 CCP-3-1 2.50% Δε [1 kHz, 20° C.]: −3.5 CCY-3-O2 8.00% K₁ [pN, 20° C.]: 13.7 CCY-4-O2 3.00% K₃ [pN, 20° C.]: 14.8 CLY-3-O2 6.00% γ₁ [mPa · s, 20° C.]: 102 CLY-3-O3 6.00% V₀ [20° C., V]: 2.16 CPY-2-O2 8.00% CPY-3-O2 8.00% CY-3-O2 9.00% PYP-2-3 6.00% PYP-2-4 3.00% Y-4O-O4 6.00%

additionally comprises 0.04% of ST-3b-1 and 0.015% of ST-9-1.

Example M246

The liquid-crystalline mixture

CY-3-O2 10.00% Clearing point [° C.]: 69.7 PY-3-O2 13.50% Δn [589 nm, 20° C.]: 0.1077 CLY-3-O2 8.00% Δε [1 kHz, 20° C.]: −3.8 CLY-3-O3 4.00% ε_(⊥) [1 kHz, 20° C.]: 7.7 CPY-2-O2 10.00% K₁ [pN, 20° C.]: 12.3 CPY-3-O2 10.00% K₃ [pN, 20° C.]: 13.7 B-2O-O5 5.00% γ₁ [mPa · s, 20° C.]: 76 CC-3-V 32.00% V₀ [20° C., V]: 1.98 CC-3-V1 4.00% CCP-3-1 2.50% BCH-32 1.00%

additionally comprises 0.02% of ST-3a-1.

Example M247

The liquid-crystalline mixture

PY-3-O2 16.00% Clearing point [° C.]: 69.8 PY-4-O2 6.50% Δn [589 nm, 20° C.]: 0.1075 CCY-3-O1 4.00% Δε [1 kHz, 20° C.]: −3.9 CCY-3-O2 6.00% ε_(⊥) [1 kHz, 20° C.]: 7.8 CPY-4-O2 6.00% K₁ [pN, 20° C.]: 12.6 CLY-3-O2 8.00% K₃ [pN, 20° C.]: 13.0 CLY-3-O3 4.00% V₀ [20° C., V]: 2.17 B-2O-O5 5.00% PGIY-2-O4 6.00% CC-3-V 32.00% CC-3-V1 5.50% BCH-32 1.00%

additionally comprises 0.02% of ST-3a-1.

Example M248

The liquid-crystalline mixture

CY-3-O2 12.00% Clearing point [° C.]: 75.6 CY-5-O2 8.00% Δn [589 nm, 20° C.]: 0.1024 CCY-3-O2 5.00% Δε [1 kHz, 20° C.]: −4.0 CCY-4-O2 2.00% ε_(⊥) [1 kHz, 20° C.]: 7.9 CLY-3-O2 8.00% K₁ [pN, 20° C.]: 12.5 CPY-2-O2 10.00% K₃ [pN, 20° C.]: 14.0 CPY-3-O2 10.00% γ₁ [mPa · s, 20° C.]: 83 B-2O-O5 4.00% V₀ [20° C., V]: 1.96 PGIY-2-O4 5.00% CC-3-V 36.00%

additionally comprises 0.02% of ST-3a-1 and 0.05% of ST-3b-1.

Example M249

The liquid-crystalline mixture

B-O2-O5 5.00% Clearing point [° C.]: 74.5 BCH-52 8.00% Δn [589 nm, 20° C.]: 0.1033 CC-3-V 22.50% Δε [1 kHz, 20° C.]: −3.0 CCH-13 9.40% ε_(⊥) [1 kHz, 20° C.]: 6.5 CCH-34 5.50% K₁ [pN, 20° C.]: 13.4 CCY-3-O1 8.20% K₃ [pN, 20° C.]: 13.5 CCY-3-O2 8.80% γ₁ [mPa · s, 20° C.]: 96 CCY-4-O2 11.60% V₀ [20° C., V]: 2.26 PP-1-2V1 2.00% PY-3-O2 15.00% PY-4-O2 1.00% PYP-2-3 3.00%

additionally comprises 0.02% of ST-3a-1.

Example M249a

For the preparation of a PS (polymer stabilised) mixture, for example for PS-IPS, PS-VA, PS-FFS applications, 99.7% of the mixture according to Example M249 are mixed with 0.001% of Irganox 1076 and 0.3% of the polymerisable compound of the formula

Example M250

The liquid-crystalline mixture

CY-3-O2 17.00% Clearing point [° C.]: 74.4 CCY-3-O2 6.00% Δn [589 nm, 20° C.]: 0.1116 CLY-3-O2 7.00% Δε [1 kHz, 20° C.]: −3.7 CPY-2-O2 3.00% ε_(⊥) [1 kHz, 20° C.]: 7.4 CPY-3-O2 10.00% K₁ [pN, 20° C.]: 13.5 PYP-2-3 6.50% K₃ [pN, 20° C.]: 15.2 PGIY-2-O4 7.00% γ₁ [mPa · s, 20° C.]: 97 B2O-O5 4.00% V₀ [20° C., V]: 2.14 CC-3-V 33.00% CC-3-V1 6.50%

additionally comprises 0.02% of ST-3a-1.

Example M251

The liquid-crystalline mixture

B-2O-O5 4.00% Clearing point [° C.]: 75.2 BCH-32 7.00% Δn [589 nm, 20° C.]: 0.1040 CC-3-V 35.00% Δε [1 kHz, 20° C.]: −3.3 CCY-3-O2 8.00% ε_(⊥) [1 kHz, 20° C.]: 7.0 CCY-4-O2 8.00% K₁ [pN, 20° C.]: 13.0 CLY-3-O2 6.00% K₃ [pN, 20° C.]: 13.7 CLY-3-O3 6.00% γ₁ [mPa · s, 20° C.]: 76 CY-3-O2 5.50% V₀ [20° C., V]: 2.14 CY-5-O2 3.00% PY-3-O2 13.00% PYP-2-3 4.50%

additionally comprises 0.02% of ST-3a-1.

Example M252

The liquid-crystalline mixture

CC-3-V 42.00% Clearing point [° C.]: 74.0 CCY-3-O2 11.00% Δn [589 nm, 20° C.]: 0.1008 CPY-2-O2 10.00% Δε [1 kHz, 20° C.]: −3.7 CPY-3-O2 11.00% ε_(⊥) [1 kHz, 20° C.]: 7.3 CY-3-O2 17.00% K₁ [pN, 20° C.]: 12.8 PGIY-2-O4 5.00% K₃ [pN, 20° C.]: 14.6 B(S)-2O-O5 4.00% γ₁ [mPa · s, 20° C.]: 86 V₀ [20° C., V]: 2.11

additionally comprises 0.025% of ST-3a-1.

Example M253

The liquid-crystalline mixture

B-2O-O5 4.00% Clearing point [° C.]: 89.6 BCH-32 3.50% Δn [589 nm, 20° C.]: 0.1096 CC-3-V 25.00% Δε [1 kHz, 20° C.]: −4.2 CCP-3-1 11.00% ε_(⊥) [1 kHz, 20° C.]: 7.8 CCY-3-O1 3.00% K₁ [pN, 20° C.]: 16.3 CCY-3-O2 8.00% K₃ [pN, 20° C.]: 17.6 CCY-4-O2 8.00% γ₁ [mPa · s, 20° C.]: 139 CLY-3-O2 6.50% V₀ [20° C., V]: 2.17 CLY-3-O3 6.50% CY-3-O2 8.50% PGIY-2-O4 3.00% PY-3-O2 13.00%

additionally comprises 0.025% of ST-9-1.

Example M254

The liquid-crystalline mixture

CC-3-V 37.00%  Clearing point [° C.]: 80.0 CY-3-O2 15.00%  Δn [589 nm, 20° C.]: 0.1079 CCY-3-O1 5.00% Δε [1 kHz, 20° C.]: −3.7 CCY-3-O2 11.00%  ε_(∥) [1 kHz, 20° C.]: 3.7 CPY-2-O2 9.50% ε_(⊥) [1 kHz, 20° C.]: 7.4 CPY-3-O2 10.50%  K₁ [pN, 20° C.]: 13.5 PYP-2-3 4.00% K₃ [pN, 20° C.]: 15.3 PGIY-2-O4 4.00% γ₁ [mPa · s, 20° C.]: 104 B(S)-1-O5 4.00% V₀ [20° C., V]: 2.14 LTS [bulk, −20° C.]: >1000 h

additionally comprises 0.02% of ST-3a-1.

Example M255

The liquid-crystalline mixture

CC-3-V 37.00% Clearing point [° C.]: 80.0 CY-3-O2 14.50% Δn [589 nm, 20° C.]: 0.1077 CCY-3-O1  5.00% Δε [1 kHz, 20° C.]: −3.7 CCY-3-O2 11.00% ε_(∥) [1 kHz, 20° C.]: 3.7 CPY-2-O2 10.00% ε_(⊥) [1 kHz, 20° C.]: 7.4 CPY-3-O2 10.50% K₁ [pN, 20° C.]: 13.4 PYP-2-3  4.00% K₃ [pN, 20° C.]: 15.2 PGIY-2-O4  4.00% γ₁ [mPa · s, 20° C.]: 104 B(S)-2-O5  4.00% V₀ [20° C., V]: 2.14 LTS [bulk, −20° C.]: >1000 h

additionally comprises 0.02% of ST-3a-1 and 0.01% of ST-8-1.

Example M256

The liquid-crystalline mixture

CC-3-V 40.00%  Clearing point [° C.]: 80.5 CY-3-O2 10.50%  Δn [589 nm, 20° C.]: 0.1076 CCY-3-O1 5.00% Δε [1 kHz, 20° C.]: −3.6 CCY-3-O2 11.00%  ε_(∥) [1 kHz, 20° C.]: 3.6 CPY-2-O2 7.50% ε_(⊥) [1 kHz, 20° C.]: 7.2 CPY-3-O2 11.00%  K₁ [pN, 20° C.]: 14.2 PYP-2-3 3.00% K₃ [pN, 20° C.]: 15.5 PGIY-2-O4 4.00% γ₁ [mPa · s, 20° C.]: 99 B(S)-5-O3 4.00% V₀ [20° C., V]: 2.20 B(S)-5-O4 4.00% LTS [bulk, −20° C.]: >1000 h

additionally comprises 0.02% of ST-3a-1.

Example M257

The liquid-crystalline mixture

CC-3-V 38.00%  Clearing point [° C.]: 79.0 CY-3-O2 7.50% Δn [589 nm, 20° C.]: 0.1075 CCY-3-O1 5.00% Δε [1 kHz, 20° C.]: −3.5 CCY-3-O2 11.00%  ε_(∥) [1 kHz, 20° C.]: 3.7 CCY-4-O2 3.00% ε_(⊥) [1 kHz, 20° C.]: 7.2 CPY-2-O2 9.00% K₁ [pN, 20° C.]: 13.4 CPY-3-O2 11.00%  K₃ [pN, 20° C.]: 14.7 PGIY-2-O4 4.50% γ₁ [mPa · s, 20° C.]: 103 B(S)-2-3 11.00%  V₀ [20° C., V]: 2.17 LTS [bulk, −20° C.]: >1000 h

additionally comprises 0.02% of ST-3a-1.

Example M258

The liquid-crystalline mixture

B—2O—O5 4.00% Clearing point [° C.]: 74.3 BCH-32 11.00%  Δn [589 nm, 20° C.]: 0.1108 CC-3-V1 7.00% Δε [1 kHz, 20° C.]: −3.5 CCH-301 8.00% ε_(∥) [1 kHz, 20° C.]: CCH-34 10.00%  ε_(⊥) [1 kHz, 20° C.]: 7.2 CCH-35 4.50% K₁ [pN, 20° C.]: 13.7 CCY-4-O2 10.50%  K₃ [pN, 20° C.]: 13.4 CLY-2-O4 1.00% γ₁ [mPa · s, 20° C.]: 121 CPY-2-O2 11.00%  CPY-3-O2 6.00% CY-3-O2 9.50% PCH-301 6.00% PY-3-O2 3.00% PY-4-O2 8.50%

additionally comprises 0.02% of ST-3a-1 and 0.01% of ST-8-1.

Example M259

The liquid-crystalline mixture

B—2O—O5 4.00% Clearing point [° C.]: 74.6 BCH-32 8.00% Δn [589 nm, 20° C.]: 0.1090 CC-3-V1 7.00% Δε [1 kHz, 20° C.]: −3.1 CCH-34 8.00% ε_(⊥) [1 kHz, 20° C.]: 6.7 CCH-35 7.00% K₁ [pN, 20° C.]: 14.2 CCP-3-1 8.00% K₃ [pN, 20° C.]: 16.5 CCP-V2-1 5.00% γ₁ [mPa · s, 20° C.]: 112 CCY-3-O2 8.50% V₀ [20° C., V]: 2.42 CCY-4-O2 1.50% CLY-3-O2 5.00% CY-3-O2 11.00%  PCH-301 10.00%  PY-3-O2 17.00% 

additionally comprises 0.01% of ST-3a-1.

Example M259a

For the preparation of a PS (polymer stabilised) mixture, for example for PS-IPS, PS-VA, PS-FFS applications, 99.65% of the mixture according to Example M259 are mixed with 0.35% of the polymerisable compound of the formula

Example M260

The liquid-crystalline mixture

CLY-3-O2 8.00% Clearing point [° C.]: 81.5 CLY-5-O2 6.00% Δn [589 nm, 20° C.]: 0.1017 CPY-3-O2 10.00%  Δε [1 kHz, 20° C.]: −4.1 B(S)—2O—O4 6.00% ε_(⊥) [1 kHz, 20° C.]: 7.7 B(S)—2O—O5 6.00% K₁ [pN, 20° C.]: 15.5 CC-3-V 36.00%  K₃ [pN, 20° C.]: 17.0 CC-3-V1 9.00% γ₁ [mPa · s, 20° C.]: 98 CY-3-O2 13.00%  V₀ [20° C., V]: 2.15 PGIY-2-O4 1.00% CCY-3-O2 5.00%

additionally comprises 0.03% of ST-3a-1.

Example M261

The liquid-crystalline mixture

CC-3-V 30.00%  Clearing point [° C.]: 87.0 CC-3-V1 10.00%  Δn [589 nm, 20° C.]: 0.1019 CCH-34 2.50% Δε [1 kHz, 20° C.]: −3.7 CCP—V-1 1.50% ε_(⊥) [1 kHz, 20° C.]: 7.1 PGIY-2-O4 4.00% K₁ [pN, 20° C.]: 15.2 CCY-3-O2 10.00%  K₃ [pN, 20° C.]: 18.0 CCY-5-O2 2.00% γ₁ [mPa · s, 20° C.]: 112 CLY-3-O2 8.00% V₀ [20° C., V]: 2.35 CPY-2-O2 6.00% CPY-3-O2 10.00%  CY-3-O2 12.00%  B—2O—O5 4.00%

additionally comprises 0.15% of ST-12.

Example M262

The liquid-crystalline mixture

CCY-3-O2 6.00% Clearing point [° C.]: 84.0 CCY-5-O2 6.00% Δn [589 nm, 20° C.]: 0.1018 CLY-3-O2 8.00% Δε [1 kHz, 20° C.]: −3.6 CLY-3-O3 8.00% ε_(⊥) [1 kHz, 20° C.]: 7.0 CPY-3-O2 10.00%  K₁ [pN, 20° C.]: 15.1 PGIY-2-O4 2.00% K₃ [pN, 20° C.]: 18.2 B—2O—O5 4.00% γ₁ [mPa · s, 20° C.]: 107 CC-3-V 29.50%  V₀ [20° C., V]: 2.38 CC-3-V1 10.00%  CY-3-O2 12.00%  PP-1-3 4.50%

additionally comprises 0.03% of ST-3a-1.

Example M263

The liquid-crystalline mixture

CY-3-O2 4.00% Clearing point [° C.]: 80.4 CCY-3-O1 3.50% Δn [589 nm, 20° C.]: 0.1007 CCY-3-O2 6.00% Δε [1 kHz, 20° C.]: −4.0 CCY-4-O2 6.00% ε_(⊥) [1 kHz, 20° C.]: 7.8 CPY-3-O2 10.00%  K₁ [pN, 20° C.]: 14.9 PYP-2-3 1.00% K₃ [pN, 20° C.]: 15.7 CLY-3-O2 6.00% γ₁ [mPa · s, 20° C.]: 101 CLY-3-O3 6.00% V₀ [20° C., V]: 2.07 Y—4O—O4 6.00% PGIY-2-O4 5.50% B—2O—O5 5.00% CC-3-V 33.00%  CC-3-V1 8.00%

additionally comprises 0.015% of ST-9-1.

Example M264

The liquid-crystalline mixture

CCY-3-O1 6.50% Clearing point [° C.]: 84.5 CCY-3-O2 9.00% Δn [589 nm, 20° C.]: 0.1106 CCY-4-O2 4.00% Δε [1 kHz, 20° C.]: −4.5 CCY-5-O2 4.00% ε_(⊥) [1 kHz, 20° C.]: 8.3 CLY-3-O2 8.00% K₁ [pN, 20° C.]: 15.6 CLY-3-O3 7.00% K₃ [pN, 20° C.]: 16.2 PGIY-2-O4 5.50% γ₁ [mPa · s, 20° C.]: 127 PGP-2-3 1.00% V₀ [20° C., V]: 2.01 B—2O—O5 5.00% CC-3-V 33.50%  CC-3-V1 1.00% PY-2-O4 5.00% PY-3-O2 10.50% 

additionally comprises 0.02% of ST-3a-1.

Example M265

The liquid-crystalline mixture

B—2O—O5 4.00% Clearing point [° C.]: 75 BCH-32 3.00% Δn [589 nm, 20° C.]: 0.1096 CC-3-V1 9.00% Δε [1 kHz, 20° C.]: −3.1 CCH-301 2.00% ε_(⊥) [1 kHz, 20° C.]: 6.6 CCH-34 8.00% K₁ [pN, 20° C.]: 13.6 CCH-35 8.00% K₃ [pN, 20° C.]: 16.3 CCP—V2-1 5.00% γ₁ [mPa · s, 20° C.]: 109 CCY-3-O2 1.50% V₀ [20° C., V]: 2.39 CLY-3-O2 10.00%  CPY-2-O2 8.00% CPY-3-O2 8.00% CY-3-O2 6.50% PCH-301 17.50%  PY-3-O2 9.50%

additionally comprises 0.02% of ST-3a-1 and 0.3% of the compound of the formula

Example M265a

For the preparation of a PS (polymer stabilised) mixture, for example for PS-IPS, PS-VA, PS-FFS applications, 99.65% of the mixture according to Example M265 are mixed with 0.35% of the polymerisable compound of the formula

Example M266

The liquid-crystalline mixture

B—2O—O5 4.00% Clearing point [° C.]: 74.4 BCH-32 8.00% Δn [589 nm, 20° C.]: 0.1087 CC-3-V1 9.00% Δε [1 kHz, 20° C.]: −3.1 CCH-301 2.00% ε_(⊥) [1 kHz, 20° C.]: 6.6 CCH-34 8.00% K₁ [pN, 20° C.]: 14.3 CCH-35 7.00% K₃ [pN, 20° C.]: 16.5 CCP-3-1 8.00% γ₁ [mPa · s, 20° C.]: 107 CCY-3-O2 4.00% V₀ [20° C., V]: 2.42 CCY-4-O2 2.50% CLY-3-O2 10.00%  CPY-3-O2 2.00% CY-3-O2 8.50% PCH-301 11.00%  PY-3-O2 16.00% 

additionally comprises 0.02% of ST-3a-1.

Example M267

The liquid-crystalline mixture

B—2O—O5 4.00% Clearing point [° C.]: 74.1 BCH-32 3.00% Δn [589 nm, 20° C.]: 0.1090 CC-3-V1 9.00% Δε [1 kHz, 20° C.]: −3.1 CCH-301 2.00% ε_(⊥) [1 kHz, 20° C.]: 6.7 CCH-34 8.00% K₁ [pN, 20° C.]: 14.2 CCH-35 8.00% K₃ [pN, 20° C.]: 16.5 CCP-3-1 5.00% γ₁ [mPa · s, 20° C.]: 109 CCY-3-O2 1.50% V₀ [20° C., V]: 2.43 CPY-3-O2 10.00%  CY-3-O2 8.00% PCH-301 8.00% PY-3-O2 6.50%

additionally comprises 0.01% of ST-8-1.

Example M268

The liquid-crystalline mixture

B—2O—O5 4.00% Clearing point [° C.]: 74.2 BCH-32 8.00% Δn [589 nm, 20° C.]: 0.1088 CC-3-V1 9.00% Δε [1 kHz, 20° C.]: −3.1 CCH-301 2.00% ε_(⊥) [1 kHz, 20° C.]: 6.7 CCH-34 9.00% K₁ [pN, 20° C.]: 14.1 CCH-35 7.00% K₃ [pN, 20° C.]: 16.5 CCP-3-1 8.50% γ₁ [mPa · s, 20° C.]: 109 CCY-3-O2 11.49%  V₀ [20° C., V]: 2.43 CLY-3-O2 0.01% CPY-3-O2 6.50% CY-3-O2 10.00%  PCH-301 9.00% PY-3-O2 15.50% 

additionally comprises 0.01% of ST-3a-1.

Example M269

The liquid-crystalline mixture

B-2O-O5 4.00% Clearing point [° C.]: 74.2 BCH-32 8.00% Δn [589 nm, 20° C.]: 0.1085 CC-3-V1 9.00% Δε [1 kHz, 20° C.]: −3.1 CCH-301 2.00% ε_(⊥) [1 kHz, 20° C.]: 6.7 CCH-34 9.00% K₁ [pN, 20° C.]: 14.2 CCH-35 7.00% K₃ [pN, 20° C.]: 16.5 CCP-3-1 8.50% γ₁ [mPa · s, 20° C.]: 109 CCY-3-O2 11.45% V₀ [20° C., V]: 2.42 CLY-3-O2 0.05% CPY-3-O2 6.50% CY-3-O2 10.00% PCH-301 9.00% PY-3-O2 15.50%

additionally comprises 0.03% of ST-3a-1.

Example M270

The liquid-crystalline mixture

B-2O-O5 4.00% Clearing point [° C.]: 74.2 BCH-32 8.00% Δn [589 nm, 20° C.]: 0.1088 CC-3-V1 9.00% Δε [1 kHz, 20° C.]: −3.1 CCH-301 2.00% ε_(⊥) [1 kHz, 20° C.]: 6.7 CCH-34 9.00% K₁ [pN, 20° C.]: 14.2 CCH-35 7.00% K₃ [pN, 20° C.]: 16.5 CCP-3-1 8.50% γ₁ [mPa · s, 20° C.]: 109 CCY-3-O2 11.40% V₀ [20° C., V]: 2.43 CLY-3-O2 0.10% CPY-3-O2 6.50% CY-3-O2 10.00% PCH-301 9.00% PY-3-O2 15.50%

additionally comprises 0.01% of ST-17.

Example M271

The liquid-crystalline mixture

B-2O-O5 4.00% Clearing point [° C.]: 74.2 BCH-32 8.00% Δn [589 nm, 20° C.]: 0.1091 CC-3-V1 9.00% Δε [1 kHz, 20° C.]: −3.1 CCH-301 2.00% ε_(⊥) [1 kHz, 20° C.]: 6.7 CCH-34 8.00% K₁ [pN, 20° C.]: 14.5 CCH-35 7.00% K₃ [pN, 20° C.]: 16.5 CCP-3-1 8.00% γ₁ [mPa · s, 20° C.]: 108 CCP-V2-1 5.00% V₀ [20° C., V]: 2.41 CCY-3-O2 10.50% CLY-3-O2 1.00% CPY-3-O2 2.50% CY-3-O2 11.50% PCH-301 5.50% PY-3-O2 18.00%

additionally comprises 0.02% of ST-3a-1 and 0.3% of the compound of the formula

Example M271a

For the preparation of a PS (polymer stabilised) mixture, for example for PS-IPS, PS-VA, PS-FFS applications, 99.65% of the mixture according to Example M271 are mixed with 0.35% of the polymerisable compound of the formula

Example M272

The liquid-crystalline mixture

B-2O-O5 2.00% Clearing point [° C.]: 100.0 BCH-32 2.00% Δn [589 nm, 20° C.]: 0.1166 CC-3-V 29.00% Δε [1 kHz, 20° C.]: −3.4 CCP-3-1 7.50% ε_(⊥) [1 kHz, 20° C.]: 6.9 CCY-3-O1 4.00% K₁ [pN, 20° C.]: 15.9 CCY-3-O2 6.50% K₃ [pN, 20° C.]: 17.4 CCY-4-O2 6.00% γ₁ [mPa · s, 20° C.]: 116 CLY-3-O2 4.00% V₀ [20° C., V]: 2.41 CPY-2-O2 7.50% CPY-3-O2 10.00% CY-3-O2 10.00% PGIY-2-O4 4.00% PYP-2-3 7.50%

additionally comprises 0.02% of ST-3a-1.

Example M273

The liquid-crystalline mixture

B-2O-O5 2.00% Clearing point [° C.]: 100.4 BCH-32 4.00% Δn [589 nm, 20° C.]: 0.1146 CC-3-V 22.00% Δε [1 kHz, 20° C.]: −4.1 CC-3V-1 4.00% ε_(⊥) [1 kHz, 20° C.]: 7.7 CCP-V-1 4.00% K₁ [pN, 20° C.]: 16.4 CCY-3-O1 5.00% K₃ [pN, 20° C.]: 18.4 CCY-3-O2 9.00% γ₁ [mPa · s, 20° C.]: 170 CCY-4-O2 5.00% V₀ [20° C., V]: 2.23 CCY-5-O2 4.50% CLY-2-O4 5.00% CPY-2-O2 8.00% CPY-3-O2 8.00% CY-3-O2 13.00% PGIY-2-O4 2.00% PYP-2-3 3.00% PYP-2-4 1.50%

additionally comprises 0.03% of ST-3a-1.

Example M274

The liquid-crystalline mixture

CLY-3-O2 7.00% Clearing point [° C.]: 71.1 CLY-3-O3 5.00% Δn [589 nm, 20° C.]: 0.1079 CPY-3-O2 11.00% Δε [1 kHz, 20° C.]: −2.6 PGIY-2-O4 7.00% ε_(⊥) [1 kHz, 20° C.]: 6.1 PYP-2-3 9.50% K₁ [pN, 20° C.]: 13.1 B-2O-O5 4.00% K₃ [pN, 20° C.]: 13.7 CC-3-V 41.50% γ₁ [mPa · s, 20° C.]: 70 CC-3-V1 9.00% V₀ [20° C., V]: 2.41 Y-4O-O4 6.00%

additionally comprises 0.03% of ST-3a-1.

Example M274a

For the preparation of a PS (polymer stabilised) mixture, for example for PS-IPS, PS-VA, PS-FFS applications, 99.55% of the mixture according to Example M274 are mixed with 0.25% of the polymerisable compound of the formula

and with 0.20% of the compound of the formula

Example M275

The liquid-crystalline mixture

CY-3-O2 8.00% Clearing point [° C.]: 89.5 CY-3-O4 10.00% Δn [589 nm, 20° C.]: 0.1050 CCY-3-O1 4.00% Δε [1 kHz, 20° C.]: −4.3 CCY-3-O2 5.00% ε_(⊥) [1 kHz, 20° C.]: 8.0 CCY-4-O2 4.00% K₁ [pN, 20° C.]: 15.7 CLY-3-O2 8.00% K₃ [pN, 20° C.]: 17.0 CLY-3-O3 8.00% γ₁ [mPa · s, 20° C.]: 141 CPY-3-O2 2.00% V₀ [20° C., V]: 2.11 PYP-2-3 2.00% B-2O-O5 5.00% PGIY-2-O4 6.00% CC-3-V 27.00% CCP-3-1 11.00%

additionally comprises 0.03% of ST-3a-1.

Example M276

The liquid-crystalline mixture

CCY-3-O2 6.00% Clearing point [° C.]: 75.0 CLY-3-O2 8.00% Δn [589 nm, 20° C.]: 0.1019 CLY-3-O3 3.50% Δε [1 kHz, 20° C.]: −3.6 CPY-2-O2 10.00% ε_(⊥) [1 kHz, 20° C.]: 7.1 CPY-3-O2 10.00% K₁ [pN, 20° C.]: 14.1 B-2O-O5 5.00% K₃ [pN, 20° C.]: 15.2 CC-3-V 33.50% γ₁ [mPa · s, 20° C.]: 97 CC-3-V1 5.50% V₀ [20° C., V]: 2.17 CY-3-O4 10.00% CY-5-O4 4.50% PP-1-3 4.00%

additionally comprises 0.03% of ST-9-1.

Example M277

The liquid-crystalline mixture

CC-3-V 28.00% Clearing point [° C.]: 84.8 CC-3-V1 6.50% Δn [589 nm, 20° C.]: 0.1111 CCY-3-O1 5.50% Δε [1 kHz, 20° C.]: −4.0 CCY-3-O2 7.00% ε_(⊥) [1 kHz, 20° C.]: 7.7 CCY-4-O2 7.00% K₁ [pN, 20° C.]: 14.4 CPY-2-O2 8.00% K₃ [pN, 20° C.]: 16.5 CPY-3-O2 11.00% γ₁ [mPa · s, 20° C.]: 124 PYP-2-3 8.50% V₀ [20° C., V]: 2.15 CY-3-O2 14.50% B-2O-O5 4.00%

additionally comprises 0.015% of ST-9-1.

Example M278

The liquid-crystalline mixture

CY-3-O2 8.00% Clearing point [° C.]: 89.6 CY-3-O4 10.00% Δn [589 nm, 20° C.]: 0.1030 CCY-3-O2 3.00% Δε [1 kHz, 20° C.]: −3.4 CCY-4-O2 1.50% ε_(⊥) [1 kHz, 20° C.]: 7.0 CLY-3-O2 8.00% K₁ [pN, 20° C.]: 14.8 CLY-3-O3 8.00% K₃ [pN, 20° C.]: 16.7 CPY-3-O2 4.00% γ₁ [mPa · s, 20° C.]: 97 B-2O-O5 5.00% V₀ [20° C., V]: 2.32 PGIY-2-O4 6.00% CC-3-V 22.00% CC-3-V1 6.00% CCP-V-1 14.00% CCP-V2-1 4.50%

additionally comprises 0.01% of ST-8-1.

Example M279

The liquid-crystalline mixture

CCY-3-O2 6.00% Clearing point [° C.]: 75.5 CLY-3-O2 8.00% Δn [589 nm, 20° C.]: 0.1014 CLY-3-O3 4.00% Δε [1 kHz, 20° C.]: −3.8 CPY-2-O2 10.00% ε_(⊥) [1 kHz, 20° C.]: 7.4 CPY-3-O2 10.00% K₁ [pN, 20° C.]: 13.7 PGIY-2-O4 1.00% K₃ [pN, 20° C.]: 14.7 B-2O-O5 5.00% γ₁ [mPa · s, 20° C.]: 99 CC-3-V 38.50% V₀ [20° C., V]: 2.09 CY-3-O4 10.00% CY-5-O4 5.00% PP-1-3 2.50%

additionally comprises 0.03% of ST-3a-1.

Example M280

The liquid-crystalline mixture

CCY-3-O2 8.00% Clearing point [° C.]: 84.5 CLY-2-O4 3.50% Δn [589 nm, 20° C.]: 0.1020 CLY-3-O2 8.00% Δε [1 kHz, 20° C.]: −3.8 CLY-3-O3 5.00% ε_(⊥) [1 kHz, 20° C.]: 7.4 CPY-3-O2 10.00% K₁ [pN, 20° C.]: 15.7 PGIY-2-O4 5.00% K₃ [pN, 20° C.]: 17.2 B-2O-O5 5.00% γ₁ [mPa · s, 20° C.]: 109 CC-3-V 27.00% V₀ [20° C., V]: 2.24 CC-3-V1 10.00% CCH-34 5.00% CY-3-O2 12.50% PP-1-3 1.00%

additionally comprises 0.03% of ST-3a-1.

Example M281

The liquid-crystalline mixture

CCY-3-O2 6.00% Clearing point [° C.]: 75.0 CLY-3-O2 8.00% Δn [589 nm, 20° C.]: 0.1019 CLY-3-O3 3.50% Δε [1 kHz, 20° C.]: −3.6 CPY-2-O2 10.00% ε_(⊥) [1 kHz, 20° C.]: 7.1 CPY-3-O2 10.00% K₁ [pN, 20° C.]: 14.1 B-2O-O5 5.00% K₃ [pN, 20° C.]: 15.2 CC-3-V 33.50% γ₁ [mPa · s, 20° C.]: 97 CC-3-V1 5.50% V₀ [20° C., V]: 2.17 CY-3-O4 10.00% CY-5-O4 4.50% PP-1-3 4.00%

additionally comprises 0.03% of ST-3a-1.

Example M282

The liquid-crystalline mixture

CY-3-O2 8.00% Clearing point [° C.]: 70.6 CY-5-O2 6.00% Δn [589 nm, 20° C.]: 0.1079 PY-3-O2 12.00% Δε [1 kHz, 20° C.]: −4.1 CLY-3-O2 10.00% ε_(⊥) [1 kHz, 20° C.]: 8.0 CPY-2-O2 10.00% K₁ [pN, 20° C.]: 12.6 CPY-3-O2 10.00% K₃ [pN, 20° C.]: 14.1 B-2O-O5 5.00% γ₁ [mPa · s, 20° C.]: 80 CCY-3-1 4.00% V₀ [20° C., V]: 1.94 CC-3-V 28.00% CC-3-V1 4.00% CCP-3-1 3.00%

additionally comprises 0.02% of ST-9-1.

Example M283

The liquid-crystalline mixture

CY-3-O2 10.00% Clearing point [° C.]: 70.3 CY-5-O2 8.00% Δn [589 nm, 20° C.]: 0.1105 PY-3-O2 10.00% Δε [1 kHz, 20° C.]: −4.4 CLY-3-O2 10.00% ε_(⊥) [1 kHz, 20° C.]: 8.3 CPY-2-O2 10.00% K₁ [pN, 20° C.]: 13.4 CPY-3-O2 10.00% K₃ [pN, 20° C.]: 14.9 B-2O-O5 5.00% γ₁ [mPa · s, 20° C.]: 106 CC-3-V 26.00% V₀ [20° C., V]: 1.96 CC-3-V1 5.00% CCP-3-1 4.00% BCH-32 2.00%

additionally comprises 0.02% of ST-9-1.

Example M284

The liquid-crystalline mixture

CY-3-O2  8.00% Clearing point [° C.]: 70.0 CY-5-O2  8.00% Δn [589 nm, 20° C.]: 0.1106 PY-3-O2 12.00% Δε [1 kHz, 20° C.]: −4.4 CLY-3-O2 10.00% ε_(⊥) [1 kHz, 20° C.]: 8.3 CPY-2-O2 10.00% K₁ [pN, 20° C.]: 13.4 CPY-3-O2 10.00% K₃ [pN, 20° C.]: 15.0 B—2O—O5  5.00% γ₁ [mPa · s, 20° C.]: 106 CC-3-V 27.00% CC-3-V1  4.00% CCP-3-1  6.00%

additionally comprises 0.03% of ST-3a-1 and 0.01% of ST-8-1.

Example M285

The liquid-crystalline mixture

CCP—V-1 7.50% Clearing point [° C.]: 88.0 CCY-3-O2 10.00%  Δn [589 nm, 20° C.]: 0.1020 CCY-5-O2 3.50% Δε [1 kHz, 20° C.]: −3.6 CLY-3-O2 8.00% ε_(⊥) [1 kHz, 20° C.]: 7.2 CPY-2-O2 3.50% K₁ [pN, 20° C.]: 15.2 CPY-3-O2 10.00%  K₃ [pN, 20° C.]: 18.1 PGIY-2-O4 4.00% γ₁ [mPa · s, 20° C.]: 112 B—O2—O5 4.00% V₀ [20° C., V]: 2.36 CC-3-V 26.50%  CC-3-V1 10.00%  CCH-34 2.00% CY-3-O2 7.00% Y—4O—O4 4.00%

additionally comprises 0.05% of ST-3b-1 and 0.15% of ST-12.

Example M286

B(S)—2O—O4 4.00% B(S)—2O—O5 4.00% CC-3-V 35.00%  CCP-3-1 4.50% CCY-3-O2 7.00% CCY-4-O2 4.50% CLY-3-O2 6.00% CLY-3-O3 6.00% CPY-3-O2 10.00%  CY-3-O2 13.00%  PYP-2-4 6.00%

additionally comprises 0.05% of ST-3b-1 and 0.15% of ST-12.

Example M287

The liquid-crystalline mixture

B(S)—2O—O4 4.00% B(S)—2O—O5 4.00% BCH-32 5.50% CC-3-V 35.00%  CCP-3-1 6.00% CCY-3-O2 8.00% CLY-3-O2 6.00% CLY-3-O3 6.00% CPY-3-O2 10.00%  CY-3-O2 13.00%  PYP-2-4 2.50%

additionally comprises 0.03% of ST-3a-1.

Example M288

The liquid-crystalline mixture

B(S)—2O—O4 4.00% B(S)—2O—O5 4.00% CC-3-V 36.50%  CC-3-V1 4.00% CCP-3-1 3.00% CCY-3-O2 5.50% CLY-3-O2 6.00% CLY-3-O3 6.00% CPY-2-O2 8.00% CPY-3-O2 8.00% CY-3-O2 5.00% PGIY-2-O4 5.00% Y—4O—O4 5.00%

additionally comprises 0.03% of ST-3a-1.

Example M289

The liquid-crystalline mixture

B(S)—2O—O4 4.00% B(S)—2O—O5 4.00% BCH-32 6.00% CC-3-V 35.50%  CCP-3-1 4.50% CCY-3-O2 5.50% CLY-3-O2 6.00% CLY-3-O3 6.00% CPY-3-O2 9.00% CY-3-O2 13.00%  CY-5-O2 2.50% PYP-2-O4 4.00%

additionally comprises 0.03% of ST-3a-1.

Example M290

The liquid-crystalline mixture

CCY-3-O1 2.00% Clearing point [° C.]: 80.0 CCY-3-O2 5.00% Δn [589 nm, 20° C.]: 0.1065 CCY-4-O2 5.00% Δε [1 kHz, 20° C.]: −3.8 CLY-2-O4 5.00% ε_(⊥) [1 kHz, 20° C.]: 7.4 CLY-3-O2 8.00% K₁ [pN, 20° C.]: 15.5 CLY-3-O3 5.00% K₃ [pN, 20° C.]: 15.0 PGIY-2-O4 6.00% γ₁ [mPa · s, 20° C.]: 93 B(S)—2O—O5 4.00% V₀ [20° C., V]: 2.08 B(S)—2O—O4 4.00% CC-3-V 39.50%  CC-3-V1 4.00% PY-3-O2 12.50% 

additionally comprises 0.03% of ST-3a-1.

Example M291

The liquid-crystalline mixture

CLY-2-O4 3.50% CLY-3-O2 8.00% CLY-3-O3 5.00% B(S)—2O—O5 4.00% B(S)—2O—O4 4.00% CC-3-V 35.00%  CC-3-V1 6.50% CY-3-O4 12.00%  CY-5-O4 1.50% CPY-3-O2 8.00% CPY-2-O2 8.00% PYP-2-3 4.50%

additionally comprises 0.03% of ST-3a-1.

Example M292

The liquid-crystalline mixture

B(S)—2O—O4 4.50% Clearing point [° C.]: 74.6 B(S)—2O—O5 4.00% Δn [589 nm, 20° C.]: 0.1096 BCH-32 7.00% Δε [1 kHz, 20° C.]: −3.1 CC-3-V1 6.00% ε_(⊥) [1 kHz, 20° C.]: 6.7 CCH-301 2.00% K₁ [pN, 20° C.]: 14.1 CCH-34 8.00% K₃ [pN, 20° C.]: 16.2 CCH-35 7.50% γ₁ [mPa · s, 20° C.]: 104 CCP-3-1 8.00% V₀ [20° C., V]: 2.39 CCP-V2-1 5.00% CCY-3-O2 11.00%  CLY-3-O2 1.00% CY-3-O2 8.00% PCH-301 13.00%  PY-3-O2 15.00% 

additionally comprises 0.02% of ST-3a-1.

Example M293

The liquid-crystalline mixture

B(S)—2O—O4 4.50% Clearing point [° C.]: 75.0 B(S)—2O—O5 4.00% Δn [589 nm, 20° C.]: 0.1088 BCH-32 6.50% Δε [1 kHz, 20° C.]: −3.1 CC-3-V1 6.00% ε_(⊥) [1 kHz, 20° C.]: 6.6 CCH-301 2.00% K₁ [pN, 20° C.]: 14.1 CCH-34 8.00% K₃ [pN, 20° C.]: 16.3 CCH-35 8.00% γ₁ [mPa · s, 20° C.]: 108 CCP-3-1 8.00% V₀ [20° C., V]: 2.41 CCP-3-3 3.00% CCY-3-O2 11.00%  CLY-3-O2 1.00% CPY-3-O2 2.50% CY-3-O2 7.50% PCH-301 15.00%  PY-3-O2 13.00% 

additionally comprises 0.02% of ST-3a-1.

Example M294

The liquid-crystalline mixture

B(S)—2O—O4 4.00% Clearing point [° C.]: 74.5 B(S)—2O—O5 4.00% Δn [589 nm, 20° C.]: 0.1092 BCH-32 2.50% Δε [1 kHz, 20° C.]: −3.1 CC-3-V1 6.00% ε_(∥) [1 kHz, 20° C.]: CCH-301 2.00% ε_(⊥) [1 kHz, 20° C.]: 6.7 CCH-34 8.00% K₁ [pN, 20° C.]: 14.0 CCH-35 8.00% K₃ [pN, 20° C.]: 16.1 CCP-3-1 8.00% γ₁ [mPa · s, 20° C.]: 106 CCP-3-3 6.00% CCY-3-O2 11.00%  CLY-3-O2 1.00% CPY-3-O2 4.50% CY-3-O2 3.00% PCH-301 15.00%  PY-3-O2 8.00% PY-2-O2 9.00%

additionally comprises 0.02% of ST-17.

Example M295

The liquid-crystalline mixture

B(S)—2O—O4 4.00% Clearing point [° C.]: 74.4 B(S)—2O—O5 4.00% Δn [589 nm, 20° C.]: 0.1093 BCH-32 3.00% Δε [1 kHz, 20° C.]: −3.1 CC-3-V1 6.00% ε_(⊥) [1 kHz, 20° C.]: 6.7 CCH-301 2.00% K₁ [pN, 20° C.]: 14.0 CCH-34 8.00% K₃ [pN, 20° C.]: 16.0 CCH-35 8.00% γ₁ [mPa · s, 20° C.]: 104 CCP-3-1 8.00% V₀ [20° C., V]: 2.38 CCP-3-3 6.00% CCY-3-O2 11.00%  CLY-3-O2 1.00% CPY-3-O2 4.00% CY-3-O2 3.00% PCH-301 15.00%  PY-3-O2 7.00% PY-2-O2 10.00% 

additionally comprises 0.02% of ST-3a-1.

Example M296

The liquid-crystalline mixture

B(S)—2O—O4 4.50% Clearing point [° C.]: 74.3 B(S)—2O—O5 4.00% Δn [589 nm, 20° C.]: 0.1093 BCH-32 3.50% Δε [1 kHz, 20° C.]: −3.3 CC-3-V1 6.00% ε_(⊥) [1 kHz, 20° C.]: 7.0 CCH-301 2.00% K₁ [pN, 20° C.]: 13.7 CCH-34 8.00% K₃ [pN, 20° C.]: 16.0 CCH-35 8.00% γ₁ [mPa · s, 20° C.]: 108 CCP-3-1 8.00% V₀ [20° C., V]: 2.30 CCP-3-3 3.00% CCY-3-O2 11.00%  CLY-3-O2 1.00% CPY-3-O2 6.00% CY-3-O2 6.50% PCH-301 15.00%  PY-3-O2 4.00% PY-2-O2 9.50%

additionally comprises 0.02% of ST-3a-1.

Example M297

The liquid-crystalline mixture

B(S)—2O—O4 4.00% Clearing point [° C.]: 74.3 B(S)—2O—O5 4.00% Δn [589 nm, 20° C.]: 0.1089 BCH-32 1.50% Δε [1 kHz, 20° C.]: −3.3 CC-3-V1 6.00% ε_(⊥) [1 kHz, 20° C.]: 7.0 CCH-301 2.00% K₁ [pN, 20° C.]: 14.0 CCH-34 8.00% K₃ [pN, 20° C.]: 16.0 CCH-35 8.00% γ₁ [mPa · s, 20° C.]: 108 CCP-3-1 8.00% V₀ [20° C., V]: 2.31 CCP-3-3 5.00% CCY-3-O1 2.50% CCY-3-O2 11.00%  CLY-3-O2 1.00% CPY-3-O2 4.00% CY-3-O2 3.00% PCH-301 14.50%  PY-3-O2 7.50% PY-2-O2 10.00% 

additionally comprises 0.02% of ST-3a-1.

Example M298

The liquid-crystalline mixture

CC-3-V 30.00%  CC-3-V1 8.00% CCP—V-1 10.00%  CCY-3-O2 5.00% CLY-3-O2 8.00% CLY-4-O2 5.00% CLY-5-O2 6.00% CY-3-O2 12.00%  CY-5-O2 2.50% PYP-2-3 3.50% B(S)—2O—O4 5.00% B(S)—2O—O5 5.00%

additionally comprises 0.02% of ST-3a-1.

Example M299

The liquid-crystalline mixture

CC-3-V 30.00% CC-3-V1 8.50% CCP—V-1 10.00% CCY-3-O2 5.00% CCY-5-O2 4.00% CLY-3-O2 9.00% CPY-3-O2 8.00% CY-3-O2 8.50% CY-5-O2 5.50% PYP-2-3 1.50% B(S)—2O—O4 5.00% B(S)—2O—O5 5.00%

additionally comprises 0.02% of ST-3a-1.

Example M300

The liquid-crystalline mixture

CC-3-V 30.00% Clearing point [° C.]: 93 CC-3-V1 8.00% Δn [589 nm, 20° C.]: 0.0993 CCP—V2-1 3.50% Δε [1 kHz, 20° C.]: −4.2 CCY-3-O2 5.00% ε_(⊥) [1 kHz, 20° C.]: 7.7 CCY-5-O2 6.00% K₁ [pN, 20° C.]: 17.3 CLY-3-O2 8.00% K₃ [pN, 20° C.]: 18.6 CLY-4-O2 8.00% γ₁ [mPa · s, 20° C.]: 2.21 CLY-5-O2 8.00% V₀ [20° C., V]: 118 CY-3-O2 11.50% CPY-3-O2 1.50% B(S)—2O—O4 5.50% B(S)—2O—O5 5.00%

additionally comprises 0.03% of ST-3a-1.

Example M301

The liquid-crystalline mixture

CC-3-V 40.00% CC-3-V1 7.50% CCP—V-1 1.50% PGIY-2-O4 2.00% CCY-3-O2 2.00% CLY-3-O2 8.00% CLY-4-O2 4.00% CLY-5-O2 7.00% CY-3-O2 8.00% CPY-3-O2 10.00% B(S)—2O—O4 5.00% B(S)—2O—O5 5.00%

additionally comprises 0.03% of ST-3a-1.

Example M302

The liquid-crystalline mixture

CC-3-V 38.00% CC-3-V1 8.00% CCP—V-1 2.50% CCY-3-O2 5.00% CCY-5-O2 6.00% CLY-3-O2 8.00% CPY-3-O2 9.50% CY-3-O2 9.00% PGIY-2-O4 4.00% B(S)—2O—O4 5.00% B(S)—2O—O5 5.00%

additionally comprises 0.03% of ST-3a-1.

Example M303

The liquid-crystalline mixture

CC-3-V 30.00% CC-3-V1 8.00% CCY-3-O2 6.00% CCY-5-O2 5.00% CLY-3-O2 9.00% CLY-4-O2 9.00% CLY-5-O2 9.50% CY-3-O2 10.00% CPY-3-O2 3.00% B(S)—2O—O4 5.00% B(S)—2O—O5 5.00%

additionally comprises 0.03% of ST-3a-1.

Example M304

The liquid-crystalline mixture

CLY-3-O2 8.00% Clearing point [° C.]: 82.0 CLY-5-O2 6.50% Δn [589 nm, 20° C.]: 10.19 CPY-3-O2 10.00% Δε [1 kHz, 20° C.]: −4.2 B(S)—2O—O4 5.00% ε_(⊥) [1 kHz, 20° C.]: 7.8 B(S)—2O—O5 5.00% K₁ [pN, 20° C.]: 15.5 CC-3-V 35.00% K₃ [pN, 20° C.]: 17.3 CC-3-V1 8.00% γ₁ [mPa · s, 20° C.]: 2.15 CY-3-O2 14.50% V₀ [20° C., V]: 102 PGIY-2-O2 2.00% CCY-3-O2 6.00%

additionally comprises 0.03% of ST-3a-1.

Example M305

The liquid-crystalline mixture

CLY-3-O2 8.00% CPY-3-O2 10.00% B(S)—2O—O4 5.00% B(S)—2O—O5 5.00% CC-3-V 34.00% CC-3-V1 7.50% CCP—V-1 1.50% CY-3-O2 14.50% CCY-3-O2 6.00% CCY-5-O2 6.00% PGIY-2-O4 2.50%

additionally comprises 0.03% of ST-3a-1.

Example M306

The liquid-crystalline mixture

CLY-3-O2 8.00% CLY-4-O2 1.50% CLY-5-O2 5.00% CPY-3-O2 10.00% B(S)—2O—O4 5.00% B(S)—2O—O5 5.00% CC-3-V 35.00% CC-3-V1 8.00% CY-3-O2 14.50% CCY-3-O2 6.00% PGIY-2-O4 2.00%

additionally comprises 0.03% of ST-3a-1.

Example M307

The liquid-crystalline mixture

CLY-3-O2 8.00% Clearing point [° C.]: 81.5 CLY-5-O2 6.00% Δn [589 nm, 20° C.]: 0.1015 CPY-3-O2 10.00% Δε [1 kHz, 20° C.]: −4.1 B(S)—2O—O4 5.00% ε_(⊥) [1 kHz, 20° C.]: 7.7 B(S)—2O—O5 5.00% K₁ [pN, 20° C.]: 15.7 B—2O—O5 2.00% K₃ [pN, 20° C.]: 17.1 CC-3-V 37.00% γ₁ [mPa · s, 20° C.]: 98 CC-3-V1 8.00% V₀ [20° C., V]: 2.14 CY-3-O2 12.00% CCY-3-O2 6.00% PGIY-2-O4 1.00%

additionally comprises 0.02% of ST-8-1.

Example M308

The liquid-crystalline mixture

CCY-3-O2 8.00% Clearing point [° C.]: 80.0 CCY-5-O2 6.00% Δn [589 nm, 20° C.]: 0.1071 CLY-2-O4 10.00% Δε [1 kHz, 20° C.]: −3.8 CLY-3-O2 5.00% ε_(⊥) [1 kHz, 20° C.]: 7.4 CLY-3-O3 5.00% K₁ [pN, 20° C.]: 16.0 PGIY-2-O4 2.00% K₃ [pN, 20° C.]: 15.3 B(S)—2O—O5 37.00% γ₁ [mPa · s, 20° C.]: 90 B(S)—2O—O4 8.00% V₀ [20° C., V]: 2.11 CC-3-V 12.00% CC-3-V1 6.00% PY-3-O2 1.00%

additionally comprises 0.03% of ST-3a-1.

Example M309

The liquid-crystalline mixture

CLY-3-O2 8.00% Clearing point [° C.]: 84.0 CLY-4-O2 3.00% Δn [589 nm, 20° C.]: 0.1016 CLY-5-O2 5.00% Δε [1 kHz, 20° C.]: −4.2 CPY-3-O2 10.00% ε_(⊥) [1 kHz, 20° C.]: 7.7 B(S)—2O—O4 5.00% K₁ [pN, 20° C.]: 15.9 B(S)—2O—O5 5.00% K₃ [pN, 20° C.]: 17.5 CC-3-V 35.00% γ₁ [mPa · s, 20° C.]: 104 CC-3-V1 8.00% V₀ [20° C., V]: 2.16 CY-3-O2 13.50% CCY-3-O2 6.00% PGIY-2-O4 1.50%

additionally comprises 0.02% of ST-3b-1.

Example M309a

For the preparation of a PS-VA mixture, 99.7% of the mixture according to Example M309 are mixed with 0.3% of the polymerisable compound of the formula

Example M310

The liquid-crystalline mixture

CLY-3-O2 8.00% CLY-4-O2 1.50% CLY-5-O2 6.00% CPY-3-O2 10.00% B(S)—2O—O4 5.00% B(S)—2O—O5 5.00% B—2O—O5 2.50% CC-3-V 37.00% CC-3-V1 8.00% CY-3-O2 11.00% CCY-3-O2 6.00%

additionally comprises 0.03% of ST-3a-1.

Example M311

The liquid-crystalline mixture

CLY-3-O2 8.00% Clearing point [° C.]: 83.0 CLY-5-O2 6.50% Δn [589 nm, 20° C.]: 0.1017 CPY-3-O2 10.50% Δε [1 kHz, 20° C.]: −4.1 B(S)—2O—O4 6.00% ε_(⊥) [1 kHz, 20° C.]: 7.7 B(S)—2O—O5 6.00% K₁ [pN, 20° C.]: 15.6 CC-3-V 36.50% K₃ [pN, 20° C.]: 17.5 CC-3-V1 8.50% γ₁ [mPa · s, 20° C.]: 2.18 CY-3-O2 12.00% V₀ [20° C., V]: 100 CCY-3-O2 5.50% PGIY-2-O4 0.50%

additionally comprises 0.03% of ST-3a-1.

Example M312

The liquid-crystalline mixture

CCY-3-O2 6.00% CPY-3-O2 5.50% CCY-4-O2 4.00% CLY-2-O4 5.00% CLY-3-O2 8.00% CLY-3-O3 5.00% PGIY-2-O4 5.00% B(S)—2O—O5 5.00% B(S)—2O—O4 5.00% CC-3-V 30.00% CY-5-O2 6.50% CY-3-O2 15.00%

additionally comprises 0.03% of ST-3a-1.

Example M313

The liquid-crystalline mixture

CC-3-V 6.00% B(S)—2O—O5 5.50% B(S)—2O—O4 4.00% CLY-2-O4 5.00% CLY-3-O2 8.00% CLY-3-O3 5.00% CY-3-O4 5.00% CY-5-O4 5.00% CPY-2-O2 5.00% CPY-3-O2 30.00% CCY-3-O1 6.50%

additionally comprises 0.015% of ST-3a-1.

Example M314

The liquid-crystalline mixture

CLY-3-O2 7.00% Clearing point [° C.]: 82.0 CLY-5-O2 5.00% Δn [589 nm, 20° C.]: 0.1016 CLY-4-O2 4.00% Δε [1 kHz, 20° C.]: −4.1 CPY-3-O2 10.00% ε_(⊥) [1 kHz, 20° C.]: 7.7 B(S)—2O—O4 5.00% K₁ [pN, 20° C.]: 15.7 B(S)—2O—O5 5.00% K₃ [pN, 20° C.]: 17.2 CC-3-V 36.00% γ₁ [mPa · s, 20° C.]: 101 CC-3-V1 7.50% CY-3-O2 14.00% PGIY-2-O4 2.00% CCY-3-O2 4.50%

additionally comprises 0.03% of ST-3a-1.

Example M315

The liquid-crystalline mixture

CLY-3-O2 7.00% Clearing point [° C.]: 82.0 CLY-4-O2 4.50% Δn [589 nm, 20° C.]: 0.1016 CLY-5-O2 5.00% Δε [1 kHz, 20° C.]: −4.1 CPY-3-O2 10.00% ε_(⊥) [1 kHz, 20° C.]: 7.7 B(S)—2O—O4 5.00% K₁ [pN, 20° C.]: 15.8 B(S)—2O—O5 5.00% K₃ [pN, 20° C.]: 17.2 CC-3-V 35.50% γ₁ [mPa · s, 20° C.]: 102 CC-3-V1 8.00% V₀ [20° C., V]: 2.16 CY-3-O2 13.50% CCY-3-O2 5.00% PGIY-2-O4 1.50%

additionally comprises 0.03% of ST-3a-1.

Example M316

The liquid-crystalline mixture

CCY-3-O2 6.00% Clearing point [° C.]: 79.5 CPY-3-O2 8.00% Δn [589 nm, 20° C.]: 0.1066 CPY-2-O2 6.00% Δε [1 kHz, 20° C.]: −5.5 CLY-2-O4 5.00% ε_(⊥) [1 kHz, 20° C.]: 9.5 CLY-3-O2 8.00% K₁ [pN, 20° C.]: 17.7 CLY-3-O3 5.00% K₃ [pN, 20° C.]: 15.5 B(S)—2O—O5 5.00% γ₁ [mPa · s, 20° C.]: 127 B(S)—2O—O4 5.00% V₀ [20° C., V]: 1.76 CC-3-V 30.00% CY-5-O2 7.00% CY-3-O2 15.00%

additionally comprises 0.03% of ST-3a-1.

Example M317

The liquid-crystalline mixture

CCY-3-O2 6.00% CPY-2-O2 6.00% CPY-3-O2 8.00% CLY-2-O4 5.00% CLY-3-O2 8.00% CLY-3-O3 5.00% B(S)—2O—O5 5.00% B(S)—2O—O4 5.00% CC-3-V 30.00% CY-5-O2 7.00% CY-3-O2 15.00%

additionally comprises 0.03% of ST-3a-1.

Example M318

The liquid-crystalline mixture

CCY-3-O2 6.00% Clearing point [° C.]: 79.0 CCY-4-O2 5.50% Δn [589 nm, 20° C.]: 10.65 CPY-3-O2 8.00% Δε [1 kHz, 20° C.]: −5.2 CPY-2-O2 8.00% ε_(⊥) [1 kHz, 20° C.]: 9.1 CLY-2-O4 5.00% K₁ [pN, 20° C.]: 14.1 CLY-3-O3 5.00% K₃ [pN, 20° C.]: 14.8 B(S)—2O—O5 5.00% γ₁ [mPa · s, 20° C.]: 121 B(S)—2O—O4 5.00% V₀ [20° C., V]: 1.78 CC-3-V 31.50% CY-5-O2 4.50% CY-3-O2 15.00% PYP-2-3 1.50%

additionally comprises 0.03% of ST-3a-1.

Example M319

The liquid-crystalline mixture

B(S)—2O—O4 4.00% BCH-32 8.00% CC-3-V1 9.00% CCH-301 2.00% CCH-34 8.00% CCH-35 7.00% CCP-3-1 8.00% CCP—V2-1 5.00% CCY-3-O2 10.50% CLY-3-O2 1.00% CPY-3-O2 2.50% CY-3-O2 11.50% PCH-301 5.00% PY-3-O2 18.00%

additionally comprises 0.015% of ST-3a-1.

Example M320

The liquid-crystalline mixture

B(S)—2O—O4 2.00% B(S)—2O—O5 2.00% BCH-32 8.00% CC-3-V1 9.00% CCH-301 2.00% CCH-34 8.00% CCH-35 7.00% CCP-3-1 8.00% CCP—V2-1 5.00% CCY-3-O2 10.50% CLY-3-O2 1.00% CPY-3-O2 2.50% CY-3-O2 11.50% PCH-301 5.50% PY-3-O2 18.00%

additionally comprises 0.03% of ST-3a-1.

Example M321

The liquid-crystalline mixture

B(S)—2O—O4 4.00% Clearing point [° C.]: 74.2 B(S)—2O—O5 4.00% Δn [589 nm, 20° C.]: 0.1096 BCH-32 2.50% Δε [1 kHz, 20° C.]: −3.1 CC-3-V1 6.00% ε_(⊥) [1 kHz, 20° C.]: 6.6 CCH-301 2.00% K₁ [pN, 20° C.]: 14.2 CCH-34 8.00% K₃ [pN, 20° C.]: 16.5 CCH-35 8.00% γ₁ [mPa · s, 20° C.]: 105 CCP-3-1 8.00% V₀ [20° C., V]: 2.43 CCP-3-3 1.50% CCP—V2-1 5.00% CCY-3-O2 11.00% CLY-3-O2 1.00% CPY-3-O2 2.50% CY-3-O2 3.00% PCH-301 15.50% PY-3-O2 18.00%

additionally comprises 0.03% of ST-3a-1.

Example M322

The liquid-crystalline mixture

B(S)—2O—O4 5.00% Clearing point [° C.]: 74.8 B(S)—2O—O5 3.00% Δn [589 nm, 20° C.]: 0.1092 BCH-32 4.50% Δε [1 kHz, 20° C.]: −3.0 CC-3-V1 6.00% ε_(⊥) [1 kHz, 20° C.]: 6.6 CCH-301 2.00% K₁ [pN, 20° C.]: 13.7 CCH-34 8.00% K₃ [pN, 20° C.]: 15.8 CCH-35 8.00% γ₁ [mPa · s, 20° C.]: 101 CCP-3-1 8.00% V₀ [20° C., V]: 2.42 CCP-3-3 6.00% CCY-3-O2 11.00% CLY-3-O2 1.00% CPY-3-O2 3.00% CY-3-O2 3.00% PCH-301 15.00% PY-3-O2 4.00% PY-2-O2 12.50%

additionally comprises 0.015% of ST-3a-1.

Example M323

The liquid-crystalline mixture

B(S)—2O—O4 4.00% Clearing point [° C.]: 74.7 B(S)—2O—O5 4.00% Δn [589 nm, 20° C.]: 0.1095 BCH-32 5.00% Δε [1 kHz, 20° C.]: −3.5 CC-3-V1 6.00% ε_(⊥) [1 kHz, 20° C.]: 7.1 CCH-34 9.00% K₁ [pN, 20° C.]: 14.1 CCH-35 7.00% K₃ [pN, 20° C.]: 16.0 CCP-3-1 8.00% γ₁ [mPa · s, 20° C.]: 111 CCP-3-3 3.50% V₀ [20° C., V]: 2.26 CCY-3-O2 10.50% CLY-3-O2 1.00% CPY-3-O2 5.50% CY-3-O2 11.50% PCH-301 13.00% PY-3-O2 2.00% PY-2-O2 10.00%

additionally comprises 0.015% of ST-3a-1.

Example M324

The liquid-crystalline mixture

CCY-3-O2 6.00% CCY-3-O1 7.00% CCY-4-O2 6.00% CLY-2-O4 5.00% CLY-3-O2 8.00% CLY-3-O3 5.00% PGIY-2-O4 3.50% B(S)—2O—O5 4.00% B(S)—2O—O4 4.00% CC-3-V 28.00% PY-3-O2 8.50% CY-3-O2 15.00%

additionally comprises 0.03% of ST-3a-1.

Example M325

The liquid-crystalline mixture

B(S)—2O—O4 5.00% Clearing point [° C.]: 74.2 B(S)—2O—O5 3.00% Δn [589 nm, 20° C.]: 0.1090 BCH-32 6.00% Δε [1 kHz, 20° C.]: −3.1 CC-3-V1 6.00% ε_(⊥) [1 kHz, 20° C.]: 6.7 CCH-301 2.00% K₁ [pN, 20° C.]: 14.4 CCH-34 8.00% K₃ [pN, 20° C.]: 16.3 CCH-35 8.50% γ₁ [mPa · s, 20° C.]: 104 CCP-3-1 7.50% V₀ [20° C., V]: 2.40 CCP—V2-1 5.00% CCY-3-O2 12.00% CLY-3-O2 1.00% CY-3-O2 6.50% PCH-301 13.00% PY-3-O2 16.50%

additionally comprises 0.015% of ST-3a-1.

Example M326

The liquid-crystalline mixture

B(S)—2O—O4 3.50% Clearing point [° C.]: 75.2 B(S)—2O—O5 4.00% Δn [589 nm, 20° C.]: 0.1101 CC-3-V1 6.00% Δε [1 kHz, 20° C.]: −3.1 CCH-34 9.00% ε_(⊥) [1 kHz, 20° C.]: 6.7 CCH-35 8.50% K₁ [pN, 20° C.]: 14.0 CCP-3-1 8.00% K₃ [pN, 20° C.]: 16.5 CCP-3-3 6.00% γ₁ [mPa · s, 20° C.]: 107 CCY-3-O2 11.50% V₀ [20° C., V]: 2.42 CLY-3-O2 1.00% CPY-3-O2 6.50% PCH-301 17.50% PY-3-O2 8.50% PY-2-O2 10.00%

additionally comprises 0.015% of ST-3a-1.

Example M327

The liquid-crystalline mixture

B(S)—2O—O4 3.50% Clearing point [° C.]: 75.0 B(S)—2O—O5 5.00% Δn [589 nm, 20° C.]: 0.1094 CC-3-V1 6.00% Δε [1 kHz, 20° C.]: −3.4 CCH-301 3.00% ε_(⊥) [1 kHz, 20° C.]: 7.0 CCH-34 9.00% K₁ [pN, 20° C.]: 13.9 CCH-35 8.00% K₃ [pN, 20° C.]: 16.4 CCP-3-1 8.50% γ₁ [mPa · s, 20° C.]: 108 CCY-3-O2 11.50% V₀ [20° C., V]: 2.32 CLY-3-O2 1.00% CPY-3-O2 11.50% CY-3-O2 1.50% PCH-301 18.50% PY-3-O2 4.00% PY-2-O2 9.50%

additionally comprises 0.015% of ST-3a-1.

Example M328

The liquid-crystalline mixture

B(S)—2O—O4 5.00% Clearing point [° C.]: 74.4 B(S)—2O—O5 5.00% Δn [589 nm, 20° C.]: 0.1089 BCH-32 1.00% Δε [1 kHz, 20° C.]: −3.4 CC-3-V1 6.00% ε_(⊥) [1 kHz, 20° C.]: 7.0 CCH-301 3.00% K₁ [pN, 20° C.]: 14.3 CCH-34 9.00% K₃ [pN, 20° C.]: 16.5 CCH-35 8.00% γ₁ [mPa · s, 20° C.]: 109 CCP-3-1 7.00% V₀ [20° C., V]: 2.31 CCP-3-3 2.50% CCY-3-O2 12.00% CLY-3-O2 1.00% CPY-3-O2 6.50% CY-3-O2 3.00% PCH-301 17.50% PY-3-O2 13.50%

additionally comprises 0.015% of ST-3a-1.

Example M329

The liquid-crystalline mixture

CY-3-O2 15.00% PY-3-O2 5.50% CCY-3-O1 7.50% CCY-3-O2 11.00% CCY-4-O2 6.00% CPY-3-O2 11.00% CC-3-V 34.00% B(S)—2O—O5 3.00% B(S)—2O—O4 3.00% B—2O—O5 4.00%

additionally comprises 0.03% of ST-3a-1.

Example M330

The liquid-crystalline mixture

CY-3-O2 10.00% Clearing point [° C.]: 75.5 CCY-3-O1 7.50% Δn [589 nm, 20° C.]: 0.1019 CCY-3-O2 11.00% Δε [1 kHz, 20° C.]: −5.1 CCY-4-O2 5.00% ε_(⊥) [1 kHz, 20° C.]: 9.3 CPY-3-O2 11.50% K₁ [pN, 20° C.]: 14.0 CC-3-V 36.00% K₃ [pN, 20° C.]: 14.7 B(S)—2O—O5 3.00% γ₁ [mPa · s, 20° C.]: 103 B(S)—2O—O4 3.00% V₀ [20° C., V]: 1.79 B—2O—O5 4.00% LTS [bulk, −20° C.]: >1000 h PGIY-2O—O4 4.50% Y—4O—O4 4.50%

additionally comprises 0.03% of ST-3a-1.

Example M331

The liquid-crystalline mixture

B(S)—2O—O4 5.00% B(S)—2O—O5 5.00% B—2O—O5 3.50% BCH-52 12.00% CCY-5-O2 12.00% CCH-301 6.50% CCH-34 23.00% PCH-302 12.00% PCH-53 13.00% PGIY-2-O4 8.00% PCH-301 17.50% PY-3-O2 13.50%

additionally comprises 0.03% of ST-3a-1.

Example M332

The liquid-crystalline mixture

CCY-3-O1 1.00% Clearing point [° C.]: 96.5 CLY-4-O2 5.50% Δn [589 nm, 20° C.]: 0.1039 CLY-3-O2 9.00% Δε [1 kHz, 20° C.]: −3.9 CLY-3-O3 5.50% ε_(⊥) [1 kHz, 20° C.]: 7.4 CPY-3-O2 10.00% K₁ [pN, 20° C.]: 17.7 CLY-5-O2 10.00% K₃ [pN, 20° C.]: 18.8 CC-3-V 35.00% γ₁ [mPa · s, 20° C.]: 122 CC-3-V1 7.00% V₀ [20° C., V]: 2.31 CY-3-O2 8.00% B(S)—2O—O4 3.00% B(S)—2O—O5 4.00% PGIY-2-O4 2.00%

additionally comprises 0.03% of ST-3a-1.

Example M333

The liquid-crystalline mixture

CC-3-V 42.50% Clearing point [° C.]: 80.0 B(S)—2O—O5 4.00% Δn [589 nm, 20° C.]: 0.1078 B(S)—2O—O4 4.00% Δε [1 kHz, 20° C.]: −3.9 CY-3-O2 2.00% ε_(⊥) [1 kHz, 20° C.]: 7.5 CCY-3-O2 7.00% K₁ [pN, 20° C.]: 15.1 CLY-2-O4 4.00% K₃ [pN, 20° C.]: 15.0 CLY-3-O2 6.00% γ₁ [mPa · s, 20° C.]: 92 CLY-3-O3 5.00% V₀ [20° C., V]: 2.08 CLY-4-O2 4.00% LTS [bulk, −20° C.]: >1000 h CLY-5-O2 4.00% PGIY-2-O4 5.00% PYP-2-3 2.00% PY-3-O2 10.50%

additionally comprises 0.03% of ST-3a-1.

Example M334

The liquid-crystalline mixture

CC-3-V 40.50% Clearing point [° C.]: 80.0 CCP—V-1 7.00% Δn [589 nm, 20° C.]: 0.1020 CLY-2-O4 4.00% Δε [1 kHz, 20° C.]: −3.6 CLY-3-O2 6.00% ε_(⊥) [1 kHz, 20° C.]: 7.3 CLY-3-O3 5.00% K₁ [pN, 20° C.]: 14.1 CLY-4-O2 4.00% K₃ [pN, 20° C.]: 14.8 CLY-5-O2 4.00% γ₁ [mPa · s, 20° C.]: 79 CPY-3-O2 3.50% V₀ [20° C., V]: 2.14 CY-3-O2 6.00% PY-3-O2 4.00% PY-1-O2 8.00% B(S)—2O—O5 4.00% B(S)—2O—O4 4.00%

additionally comprises 0.03% of ST-3a-1.

Example M335

The liquid-crystalline mixture

B—2O—O5 4.50% Clearing point [° C.]: 75.5 CC-3-V 34.50% Δn [589 nm, 20° C.]: 0.1014 CCP-3-1 3.00% Δε [1 kHz, 20° C.]: −5.1 CLY-3-O2 8.00% ε_(⊥) [1 kHz, 20° C.]: 9.2 CLY-3-O3 6.00% K₁ [pN, 20° C.]: 14.2 CLY-5-O2 6.00% K₃ [pN, 20° C.]: 14.8 CLY-4-O2 6.00% γ₁ [mPa · s, 20° C.]: 100 CPY-3-O2 8.50% V₀ [20° C., V]: 1.80 Y—4O—O4 5.00% CY-3-O2 12.00% B(S)—2O—O5 4.00% B(S)—2O—O4 3.00%

additionally comprises 0.03% of ST-3a-1.

Example M336

The liquid-crystalline mixture

CC-3-V 40.00% Clearing point [° C.]: 76.0 CCP—V-1 6.50% Δn [589 nm, 20° C.]: 0.1017 CLY-2-O4 4.00% Δε [1 kHz, 20° C.]: −3.6 CLY-3-O2 6.00% ε_(⊥) [1 kHz, 20° C.]: 7.3 CLY-3-O3 5.00% K₁ [pN, 20° C.]: 14.2 CLY-4-O2 4.00% K₃ [pN, 20° C.]: 14.7 CLY-5-O2 4.00% γ₁ [mPa · s, 20° C.]: 83 CPY-3-O2 4.50% V₀ [20° C., V]: 2.12 CY-3-O2 7.00% PY-3-O2 11.00% B(S)—2O—O5 4.00% B(S)—2O—O4 4.00%

additionally comprises 0.03% of ST-3a-1.

Example M337

The liquid-crystalline mixture

CC-3-V 39.00% Clearing point [° C.]: 75.5 CCP—V-1 8.50% Δn [589 nm, 20° C.]: 0.1011 CLY-2-O4 4.00% Δε [1 kHz, 20° C.]: −3.6 CLY-3-O2 6.00% ε_(⊥) [1 kHz, 20° C.]: 7.2 CLY-3-O3 5.00% K₁ [pN, 20° C.]: 13.8 CLY-4-O2 4.00% K₃ [pN, 20° C.]: 14.4 CLY-5-O2 4.00% γ₁ [mPa · s, 20° C.]: 79 CPY-3-O2 3.50% V₀ [20° C., V]: 2.12 CY-3-O2 6.50% LTS [bulk, −20° C.]: >1000 h PY-3-O2 3.50% PY-2-O2 8.00% B(S)—2O—O5 4.00% B(S)—2O—O4 4.00%

additionally comprises 0.03% of ST-3a-1.

Example M338

The liquid-crystalline mixture

CCY-3-O1 0.50% Clearing point [° C.]: 96.5 CLY-4-O2 5.50% Δn [589 nm, 20° C.]: 0.1041 CLY-3-O2 9.00% Δε [1 kHz, 20° C.]: −4.0 CLY-3-O3 5.50% ε_(⊥) [1 kHz, 20° C.]: 7.4 CLY-5-O2 10.00% K₁ [pN, 20° C.]: 17.7 CPY-3-O2 10.50% K₃ [pN, 20° C.]: 18.9 CC-3-V 35.50% γ₁ [mPa · s, 20° C.]: 119 CC-3-V1 7.00% V₀ [20° C., V]: 2.31 CY-3-O2 7.50% LTS [bulk, −20° C.]: >1000 h B(S)—2O—O5 4.00% B(S)—2O—O4 4.00% PGIY-2-O4 1.00%

additionally comprises 0.02% of ST-3a-1.

Example M339

The liquid-crystalline mixture

CLY-4-O2 5.50% Clearing point [° C.]: 96.5 CLY-3-O2 9.00% Δn [589 nm, 20° C.]: 0.1039 CLY-3-O3 5.50% Δε [1 kHz, 20° C.]: −4.0 CLY-5-O2 10.00% ε_(⊥) [1 kHz, 20° C.]: 7.4 CPY-2-O2 2.00% K₁ [pN, 20° C.]: 17.5 CPY-3-O2 10.00% K₃ [pN, 20° C.]: 18.7 CC-3-V 35.50% γ₁ [mPa · s, 20° C.]: 119 CC-3-V1 7.00% V₀ [20° C., V]: 2.30 CY-3-O2 7.50% B(S)—2O—O5 4.00% B(S)—2O—O4 4.00%

additionally comprises 0.03% of ST-3a-1 and 0.01% of ST-8-1.

Example M340

The liquid-crystalline mixture

CLY-4-O2 5.00% Clearing point [° C.]: 93.5 CLY-3-O2 9.00% Δn [589 nm, 20° C.]: 0.1041 CLY-3-O3 5.50% Δε [1 kHz, 20° C.]: −3.9 CLY-5-O2 10.00% ε_(⊥) [1 kHz, 20° C.]: 7.4 CPY-3-O2 8.50% K₁ [pN, 20° C.]: 17.2 CC-3-V 36.00% K₃ [pN, 20° C.]: 18.3 CC-3-V1 7.00% γ₁ [mPa · s, 20° C.]: 113 CY-3-O2 8.50% V₀ [20° C., V]: 2.28 B(S)—2O—O4 4.00% B(S)—2O—O5 4.00% PGIY-2-O4 2.50%

additionally comprises 0.02% of ST-8-1.

Example M341

The liquid-crystalline mixture

CC-3-V 18.50% CC-3-V1 7.00% CCP-3-1 11.00% CCY-3-O1 5.00% CCY-3-O2 8.00% CCY-4-O2 2.50% CLY-2-O4 4.50% CLY-3-O2 7.50% CLY-3-O3 6.50% CPY-3-O2 8.00% CY-3-O2 11.50% PGIY-2-O4 3.00% B(S)—2O—O4 4.00% B(S)—2O—O5 3.00%

additionally comprises 0.02% of ST-3a-1.

Example M342

The liquid-crystalline mixture

CC-3-V 35.50% CCP-3-1 2.50% CCY-3-O2 9.50% CLY-3-O2 8.00% CPY-2-O2 4.50% CPY-3-O2 10.50% CY-3-O2 14.50% PGIY-2-O4 6.00% PYP-2-3 2.00% B(S)—2O—O4 4.00% B(S)—2O—O5 3.00%

additionally comprises 0.03% of ST-3a-1.

Example M343

The liquid-crystalline mixture

B(S)—2O—O5 4.00% Clearing point [° C.]: 74.5 B(S)—2O—O4 3.00% Δn [589 nm, 20° C.]: 0.1091 BCH-32 8.00% Δε [1 kHz, 20° C.]: −3.1 CC-3-V1 9.00% ε_(⊥) [1 kHz, 20° C.]: 6.7 CCH-301 2.00% K₁ [pN, 20° C.]: 15.2 CCH-34 8.00% K₃ [pN, 20° C.]: 16.2 CCH-35 7.00% γ₁ [mPa · s, 20° C.]: 100 CCP-3-1 11.00% V₀ [20° C., V]: 2.41 CCP—V2-1 5.00% LTS [bulk, −20° C.]: >1000 h CCY-3-O2 7.00% CLY-3-O2 1.00% CY-3-O2 13.00% PCH-301 5.50% PY-3-O2 16.50%

additionally comprises 0.015% of ST-3a-1.

Example M344

The liquid-crystalline mixture

CY-3-O2 7.50% Clearing point [° C.]: 74.5 CCY-3-O1 6.00% Δn [589 nm, 20° C.]: 0.1031 CCY-3-O2 11.00% Δε [1 kHz, 20° C.]: −5.0 CCY-4-O2 4.50% ε_(⊥) [1 kHz, 20° C.]: 9.1 CPY-3-O2 10.50% K₁ [pN, 20° C.]: 13.5 CC-3-V 39.00% K₃ [pN, 20° C.]: 14.4 B(S)-2O-O5 4.00% γ₁ [mPa · s, 20° C.]: 95 B(S)-2O-O4 4.00% V₀ [20° C., V]: 1.79 B-2O-O5 5.00% PGIY-2-O4 4.50% Y-4O-O4 4.00%

additionally comprises 0.025% of ST-3a-1.

Example M345

The liquid-crystalline mixture

CY-3-O2 2.50% Clearing point [° C.]: 80.1 CCY-3-O2 6.00% Δn [589 nm, 20° C.]: 0.1104 CCY-4-O2 1.50% Δε [1 kHz, 20° C.]: −4.0 CPY-2-O2 8.00% ε_(⊥) [1 kHz, 20° C.]: 7.8 CPY-3-O2 10.00% K₁ [pN, 20° C.]: 14.5 PYP-2-3 3.00% K₃ [pN, 20° C.]: 15.3 CLY-3-O2 6.00% γ₁ [mPa · s, 20° C.]: 102 CLY-3-O3 6.00% V₀ [20° C., V]: 2.05 Y-4O-O4 6.00% PGIY-2-O4 6.00% B-2O-O5 5.00% CC-3-V 32.00% CC-3-V1 8.00%

additionally comprises 0.015% of ST-9-1.

Example M346

The liquid-crystalline mixture

B-2O-O5 5.00% Clearing point [° C.]: 75.5 CC-3-V 39.00% Δn [589 nm, 20° C.]: 0.1047 CCY-3-O2 11.00% Δε [1 kHz, 20° C.]: −5.9 CCY-3-O1 6.00% ε_(⊥) [1 kHz, 20° C.]: 10.2 CCY-4-O2 4.50% K₁ [pN, 20° C.]: 14.8 CLY-3-O2 3.00% K₃ [pN, 20° C.]: 14.4 CPY-3-O2 7.50% γ₁ [mPa · s, 20° C.]: 96 Y-4O-O4 5.00% V₀ [20° C., V]: 1.65 B(S)-2O-O5 8.00% B(S)-2O-O4 8.00% CY-3-O2 3.00%

additionally comprises 0.03% of ST-3a-1.

Example M347

The liquid-crystalline mixture

B(S)-2O-O5 4.00% B(S)-2O-O4 3.00% BCH-32 8.00% CC-3-V 15.00% CC-3-V1 9.00% CCP-3-1 8.00% CCY-3-O1 7.00% CCY-3-O2 11.50% CLY-3-O2 1.00% CY-3-O2 15.00% PCH-301 5.00% PY-3-O2 13.50%

additionally comprises 0.025% of ST-3a-1.

Example M348

The liquid-crystalline mixture

B(S)-2O-O5 4.00% B(S)-2O-O4 3.00% BCH-32 8.00% CC-3-V 15.00% CC-3-V1 9.00% CCP-3-1 7.00% CCY-3-O1 7.00% CCY-3-O2 11.00% CCY-4-O2 2.50% CLY-3-O2 1.00% CY-3-O2 14.00% PCH-301 5.00% PY-1-O2 6.50% PY-2-O2 7.00%

Example M349

The liquid-crystalline mixture

B(S)-2O-O5 4.00% Clearing point [° C.]: 74.0 B(S)-2O-O4 3.00% Δn [589 nm, 20° C.]: 0.1094 BCH-32 8.00% Δε [1 kHz, 20° C.]: −3.7 CC-3-V1 9.00% ε_(⊥) [1 kHz, 20° C.]: 7.4 CCH-301 2.00% K₁ [pN, 20° C.]: 14.6 CCH-34 8.00% K₃ [pN, 20° C.]: 16.0 CCH-35 7.00% γ₁ [mPa · s, 20° C.]: 107 CCP-3-1 9.50% V₀ [20° C., V]: 2.20 CCY-3-O1 3.50% CCY-3-O2 11.00% CLY-3-O2 1.00% CY-3-O2 12.50% PCH-301 5.50% PY-1-O2 8.00% PY-2-O2 8.00%

additionally comprises 0.02% of ST-3a-1.

Example M350

The liquid-crystalline mixture

B(S)-2O-O5 4.00% B(S)-2O-O4 4.00% BCH-32 16.00% CCH-23 19.00% CCH-301 6.50% CCH-34 5.00% CCH-35 5.00% CCP-3-1 11.50% CLY-3-O2 8.00% PY-3-O2 10.00% PYP-2-3 4.00% Y-4O-O4 7.00%

additionally comprises 0.025% of ST-2a-1.

Example M351

The liquid-crystalline mixture

CC-3-V 47.00% CC-3-V1 6.50% CC-3-2V1 1.00% CCP-V-1 6.50% PGP-2-2V 13.00% PGP-3-2V 3.50% PGU-2-F 6.00% PGUQU-3-F 4.50% CLP-3-T 5.00% B(S)-2O-O5 3.50% B(S)-2O-O4 3.50%

additionally comprises 0.025% of ST-2a-1.

Example M352

The liquid-crystalline mixture

B(S)-2O-O5 4.00% B(S)-2O-O4 4.00% BCH-32 16.00% CCH-23 19.50% CCH-301 7.00% CCH-34 5.00% CCH-35 5.00% CCP-3-1 11.00% CLY-3-O2 8.00% PYP-3-O2 5.50% Y-4O-O4 7.00% PY-1-O2 4.00% PY-2-O2 4.00%

additionally comprises 0.025% of ST-3b-1.

Example M353

The liquid-crystalline mixture

B(S)-2O-O5 4.00% B(S)-2O-O4 4.00% BCH-32 16.00% CCH-23 18.00% CCH-301 3.00% CCH-34 4.00% CCH-35 4.00% CCP-3-1 13.50% CCP-3-3 4.00% CLY-3-O2 8.00% CPY-3-O2 1.50% PY-3-O2 2.00% PYP-2-3 5.50% Y-4O-O4 12.50%

additionally comprises 0.025% of ST-3b-1.

Example M354

The liquid-crystalline mixture

B(S)-2O-O5 4.00% B(S)-2O-O4 4.00% BCH-32 14.00% CCH-23 18.00% CCH-301 2.00% CCH-34 4.50% CCH-35 3.00% CCP-3-1 15.50% CCP-3-3 6.00% CLY-3-O2 8.00% PY-1-O2 4.00% PY-2-O2 4.00% PYP-2-3 3.00% Y-4O-O4 10.00%

additionally comprises 0.025% of ST-3b-1.

Example M355

The liquid-crystalline mixture

CCY-3-O1 7.00% Clearing point [° C.]: 92.5 CCY-3-O2 11.00% Δn [589 nm, 20° C.]: 0.0992 CCY-4-O2 5.00% Δε [1 kHz, 20° C.]: −4.5 CLY-3-O2 5.00% ε_(⊥) [1 kHz, 20° C.]: 8.1 CLY-3-O3 5.00% K₁ [pN, 20° C.]: 16.0 CLY-5-O2 5.00% K₃ [pN, 20° C.]: 17.8 CPY-3-O2 2.50% γ₁ [mPa · s, 20° C.]: 124 PGIY-2-O4 4.00% V₀ [20° C., V]: 2.10 CC-3-V 37.00% CY-3-O2 11.50% B(S)-2O-O5 4.00% B(S)-2O-O4 3.00%

additionally comprises 0.03% of ST-3a-1.

Example M356

The liquid-crystalline mixture

CCY-3-O1 6.50% Clearing point [° C.]: 91.5 CCY-3-O2 11.00% Δn [589 nm, 20° C.]: 0.0995 CLY-3-O2 5.00% Δε [1 kHz, 20° C.]: −4.5 CLY-3-O3 5.00% ε_(⊥) [1 kHz, 20° C.]: 8.1 CLY-4-O2 5.00% K₁ [pN, 20° C.]: 16.1 CLY-5-O2 5.00% K₃ [pN, 20° C.]: 17.5 CPY-3-O2 2.00% γ₁ [mPa · s, 20° C.]: 120 PGIY-2-O4 4.00% V₀ [20° C., V]: 2.09 CC-3-V 37.50% CY-3-O2 12.00% B(S)-2O-O5 4.00% B(S)-2O-O4 3.00%

additionally comprises 0.03% of ST-3a-1.

Example M357

The liquid-crystalline mixture

B(S)-2O-O5 4.00% Clearing point [° C.]: 74.5 B(S)-2O-O4 3.00% Δn [589 nm, 20° C.]: 0.1094 BCH-32 8.00% Δε [1 kHz, 20° C.]: −3.4 CC-3-V1 9.00% ε_(⊥) [1 kHz, 20° C.]: 7.1 CCH-301 2.00% K₁ [pN, 20° C.]: 15.4 CCH-34 8.00% K₃ [pN, 20° C.]: 16.4 CCH-35 7.00% γ₁ [mPa · s, 20° C.]: 104 CCP-3-1 12.00% V₀ [20° C., V]: 2.31 CCY-3-O2 11.00% CLY-3-O2 1.00% CY-3-O2 13.00% PCH-301 5.50% PY-2-3 16.50%

additionally comprises 0.02% of ST-3a-1.

Example M358

The liquid-crystalline mixture

CC-3-V 45.50% Clearing point [° C.]: 76.0 CCY-3-O2 1.00% Δn [589 nm, 20° C.]: 0.1036 CLY-3-O2 7.00% Δε [1 kHz, 20° C.]: −3.5 CLY-3-O3 7.00% ε_(⊥) [1 kHz, 20° C.]: 7.1 CPY-3-O2 11.00% K₁ [pN, 20° C.]: 13.5 CY-3-O2 13.00% K₃ [pN, 20° C.]: 14.6 B(S)-2O-O4 3.00% γ₁ [mPa · s, 20° C.]: 80 B(S)-2O-O5 4.00% V₀ [20° C., V]: 2.16 PGIY-2-O4 7.50% PYP-2-3 1.50%

additionally comprises 0.03% of ST-3a-1.

Example M359

The liquid-crystalline mixture

CC-3-V 44.00% Clearing point [° C.]: 75.0 CCY-3-O2 7.50% Δn [589 nm, 20° C.]: 0.1035 CLY-3-O2 7.00% Δε [1 kHz, 20° C.]: −3.7 CPY-3-O2 11.00% ε_(⊥) [1 kHz, 20° C.]: 7.3 CY-3-O2 15.00% K₁ [pN, 20° C.]: 13.4 B(S)—2O—O4 3.00% K₃ [pN, 20° C.]: 14.9 B(S)—2O—O5 4.00% γ₁ [mPa · s, 20° C.]: 82 PGIY-2-O4 7.00% V₀ [20° C., V]: 2.13 PYP-2-3 1.50%

additionally comprises 0.03% of ST-3a-1.

Example M360

The liquid-crystalline mixture

CC-3-V 41.00% Clearing point [° C.]: 74 CCY-3-O1 3.00% Δn [589 nm, 20° C.]: 0.1007 CCY-3-O2 10.00% Δε [1 kHz, 20° C.]: −3.8 CPY-2-O2 10.50% ε_(⊥) [1 kHz, 20° C.]: 7.5 CPY-3-O2 11.00% K₁ [pN, 20° C.]: 12.7 CY-3-O2 16.00% K₃ [pN, 20° C.]: 14.6 PGIY-2-O4 4.50% γ₁ [mPa · s, 20° C.]: 90 B—2O—O5 4.00% V₀ [20° C., V]: 2.07

additionally comprises 0.03% of ST-3a-1.

Example M361

The liquid-crystalline mixture

B—2O—O5 4.00% Clearing point [° C.]: 109.8 BCH-32 2.00% Δn [589 nm, 20° C.]: 0.1059 CC-3-V 25.00% Δε [1 kHz, 20° C.]: −4.1 CC-3-V1 4.00% ε_(⊥) [1 kHz, 20° C.]: 7.6 CCP-3-1 4.00% K₁ [pN, 20° C.]: 19.0 CCY-3-O1 5.00% K₃ [pN, 20° C.]: 18.9 CCY-3-O2 6.00% γ₁ [mPa · s, 20° C.]: 145 CCY-4-O2 6.00% V₀ [20° C., V]: 2.28 CCY-5-O2 6.00% CLY-3-O2 6.00% CLY-3-O3 6.00% CPY-2-O2 9.00% CPY-3-O2 9.00% CY-5-O4 8.00%

additionally comprises 0.04% of ST-3b-1.

Example M362

The liquid-crystalline mixture

B—2O—O5 4.00% Clearing point [° C.]: CC-3-V 37.00% Δn [589 nm, 20° C.]: CCP-3-1 4.00% Δε [1 kHz, 20° C.]: CCY-3-O2 8.00% ε_(⊥) [1 kHz, 20° C.]: CCY-4-O2 3.00% K₁ [pN, 20° C.]: CLY-3-O2 6.00% K₃ [pN, 20° C.]: CLY-3-O3 6.00% γ₁ [mPa · s, 20° C.]: CPY-3-O2 9.50% V₀ [20° C., V]: CY-3-O2 13.00% PGIY-2-O4 2.00% PYP-2-3 4.00% PYP-2-4 3.50%

additionally comprises 0.03% of ST-3a-1.

Example M363

The liquid-crystalline mixture

B—2O—O5 4.00% Clearing point [° C.]: 104 CC-3-V 14.00% Δn [589 nm, 20° C.]: 0.1059 CC-3-V1 5.00% Δε [1 kHz, 20° C.]: −5.2 CCP-3-1 7.00% ε_(⊥) [1 kHz, 20° C.]: 9.0 CCY-3-O1 6.00% K₁ [pN, 20° C.]: 17.5 CCY-3-O2 7.50% K₃ [pN, 20° C.]: 19.0 CCY-4-O2 7.00% γ₁ [mPa · s, 20° C.]: 171 CCY-5-O2 4.00% V₀ [20° C., V]: 2.02 CLY-2-O4 4.00% CLY-3-O2 6.00% CLY-3-O3 6.00% CPY-3-O2 8.00% CY-3-O2 12.00% CY-5-O4 7.50% PGIY-2-O4 2.00%

additionally comprises 0.04% of ST-3b-1.

Example M364

The liquid-crystalline mixture

B—2O—O5 3.00% Clearing point [° C.]: 75.4 CC-3-V 39.00% Δn [589 nm, 20° C.]: 0.1074 CC-3-V1 8.00% Δε [1 kHz, 20° C.]: −2.7 CCP—V-1 4.50% ε_(⊥) [1 kHz, 20° C.]: 6.2 CLY-3-O2 8.00% K₁ [pN, 20° C.]: 13.7 CPY-2-O2 10.00% K₃ [pN, 20° C.]: 14.3 CPY-3-O2 10.00% γ₁ [mPa · s, 20° C.]: 77 PGIY-2-O4 6.00% V₀ [20° C., V]: 2.44 PYP-2-3 3.50% PYP-2-4 2.00% Y—4O—O4 6.00%

additionally comprises 0.03% of ST-3a-1.

Example M365

The liquid-crystalline mixture

B—2O—O5 4.00% Clearing point [° C.]: 70.6 CC-3-V 40.00% Δn [589 nm, 20° C.]: 0.1072 CC-3-V1 1.50% Δε [1 kHz, 20° C.]: −2.5 CC-4-V 10.50% ε_(⊥) [1 kHz, 20° C.]: 5.9 CLY-3-O2 8.00% K₁ [pN, 20° C.]: 13.1 CPY-2-O2 6.50% K₃ [pN, 20° C.]: 13.1 CPY-3-O2 10.00% γ₁ [mPa · s, 20° C.]: 70 PGIY-2-O4 6.00% V₀ [20° C., V]: 2.40 PY-3-O2 9.50% PYP-2-3 4.00%

additionally comprises 0.03% of ST-3a-1.

Example M366

The liquid-crystalline mixture

B—2O—O5 4.00% Clearing point [° C.]: 75.5 CC-3-V 40.00% Δn [589 nm, 20° C.]: 0.1083 CC-3-V1 3.00% Δε [1 kHz, 20° C.]: −2.7 CC-4-V 6.50% ε_(⊥) [1 kHz, 20° C.]: 6.1 CCP—V-1 2.50% K₁ [pN, 20° C.]: 13.7 CLY-3-O2 8.00% K₃ [pN, 20° C.]: 14.2 CPY-2-O2 10.00% γ₁ [mPa · s, 20° C.]: 76 CPY-3-O2 10.00% V₀ [20° C., V]: 2.42 PGIY-2-O4 6.00% PY-3-O2 9.00% PYP-2-3 1.00%

additionally comprises 0.02% of ST-2a-1.

Example M367

The liquid-crystalline mixture

B—2O—O5 4.00% Clearing point [° C.]: 70.2 CC-3-V 40.00% Δn [589 nm, 20° C.]: 0.1066 CC-3-V1 6.00% Δε [1 kHz, 20° C.]: −2.5 CC-4-V 3.50% ε_(⊥) [1 kHz, 20° C.]: 6.0 CCP—V-1 3.00% K₁ [pN, 20° C.]: 12.8 CLY-3-O2 8.00% K₃ [pN, 20° C.]: 13.2 CPY-2-O2 4.50% γ₁ [mPa · s, 20° C.]: 69 CPY-3-O2 10.00% V₀ [20° C., V]: 2.43 PGIY-2-O4 6.00% PYP-2-3 9.00% Y—4O—O4 6.00%

additionally comprises 0.03% of ST-3a-1.

Example M368

The liquid-crystalline mixture

CY-3-O2 12.00% Clearing point [° C.]: 74.8 CY-5-O2 12.00% Δn [589 nm, 20° C.]: 0.1026 CCY-3-O2 3.50% Δε [1 kHz, 20° C.]: −4.0 CLY-3-O2 10.00% ε_(⊥) [1 kHz, 20° C.]: 7.9 CPY-2-O21 10.00% K₁ [pN, 20° C.]: 12.8 CPY-3-O2 10.00% K₃ [pN, 20° C.]: 14.2 B—2O—O5 5.00% γ₁ [mPa · s, 20° C.]: 83 CC-3-V 32.00% V₀ [20° C., V]: 1.98 BCH-32 5.50%

additionally comprises 0.03% of ST-3a-1.

Example M369

The liquid-crystalline mixture

B—2O—O5 4.00% Clearing point [° C.]: 74.2 BCH-32 8.00% Δn [589 nm, 20° C.]: 0.1089 CC-3-V1 9.00% Δε [1 kHz, 20° C.]: −3.1 CCH-301 2.00% ε_(⊥) [1 kHz, 20° C.]: 6.7 CCH-34 9.00% K₁ [pN, 20° C.]: 14.1 CCH-35 7.00% K₃ [pN, 20° C.]: 16.5 CCP-3-1 8.50% γ₁ [mPa · s, 20° C.]: 109 CCY-3-O2 11.00% V₀ [20° C., V]: 2.43 CLY-3-O2 0.50% CPY-3-O2 6.50% CY-3-O2 10.00% PCH-301 9.00% PY-3-O2 15.50%

additionally comprises 0.015% of ST-3a-1.

Example M370

The liquid-crystalline mixture

B—2O—O5 4.00% Clearing point [° C.]: 74.2 BCH-32 8.00% Δn [589 nm, 20° C.]: 0.1094 CC-3-V1 9.00% Δε [1 kHz, 20° C.]: −3.1 CCH-301 2.00% ε_(⊥) [1 kHz, 20° C.]: 6.7 CCH-34 9.00% K₁ [pN, 20° C.]: 14.2 CCH-35 7.00% K₃ [pN, 20° C.]: 16.5 CCP-3-1 8.50% γ₁ [mPa · s, 20° C.]: 108 CCY-3-O2 10.00% V₀ [20° C., V]: 2.43 CLY-3-O2 1.50% CPY-3-O2 6.50% CY-3-O2 10.00% PCH-301 9.00% PY-3-O2 15.50%

additionally comprises 0.015% of ST-3a-1.

Example M371

The liquid-crystalline mixture

CC-3-V 44.50% Clearing point [° C.]: 74.0 CCY-3-O2 11.00% Δn [589 nm, 20° C.]: 0.1010 CPY-2-O2 9.50% Δε [1 kHz, 20° C.]: −3.7 CPY-3-O2 11.00% ε_(∥) [1 kHz, 20° C.]: 3.7 CY-3-O2 13.00% ε_(⊥) [1 kHz, 20° C.]: 7.4 PGIY-2-O4 4.00% K₁ [pN, 20° C.]: 13.0 B—2O—O5 4.00% K₃ [pN, 20° C.]: 14.5 B(S)—2O—O4 3.00% γ₁ [mPa · s, 20° C.]: 83 V₀ [20° C., V]: 2.09

additionally comprises 0.02% of ST-8-1.

The mixtures of Examples M1 to M371 comprising one or more stabilisers are distinguished by very good reliability. 

1. Liquid-crystalline medium, characterised in that it comprises at least one compound of the formula I,

in which R¹ and R^(1*) each, independently of one another, denote H, an alkyl or alkoxy radical having 1 to 15 C atoms, where, in addition, one or more CH₂ groups in these radicals may each be replaced, independently of one another, by —C≡C—, —CF₂O—, —OCF₂—, —CH═CH—,

—O—, —CO—O—, —O—CO— in such a way that O atoms are not linked directly to one another, and in which, in addition, one or more H atoms may be replaced by halogen, A¹ and A1* each, independently of one another, denote a) a 1,4-cyclohexenylene or 1,4-cyclohexylene radical, in which one or two non-adjacent CH₂ groups may be replaced by —O— or —S—, b) a 1,4-phenylene radical, in which one or two CH groups may be replaced by N, c) a radical from the group piperidine-1,4-diyl, 1,4-bicyclo-[2.2.2]octylene, naphthalene-2,6-diyl, decahydronaphthalene-2,6-diyl, 1,2,3,4-tetrahydronaphthalene-2,6-diyl, phenanthrene-2,7-diyl and fluorene-2,7-diyl, where the radicals a), b) and c) may be mono- or polysubstituted by halogen atoms, Z¹ and Z¹* each, independently of one another, denote —CO—O—, —O—CO—, —CF₂O—, —OCF₂—, —CH₂O—, —OCH₂—, —CH₂—, —CH₂CH₂—, —(CH₂)₄—, —CH═CH—CH₂O—, —C₂F₄—, —CH₂CF₂—, —CF₂CH₂—, —CF═CF—, —CH═CF—, —CF═CH—, —CH═CH—, —C≡C— or a single bond, X denotes —S— or —O—, and L¹ and L² each, independently of one another, denote F, Cl, CF₃ or CHF₂, and at least one compound selected from the group of the compounds of the formulae ST,

in which R^(ST) denotes H, an alkyl or alkoxy radical having 1 to 15 C atoms, where, in addition, one or more CH₂ groups in these radicals may each be replaced, independently of one another, by —C≡C—, —CF₂O—, —OCF₂—, —CH═CH—,

—O—, —CO—O—, —O—CO— in such a way that O atoms are not linked directly to one another, and in which, in addition, one or more H atoms may be replaced by halogen,

Z^(ST) each, independently of one another, denotes —CO—O—, —O—CO—, —CF₂O—, —OCF₂—, —CH₂O—, —OCH₂—, —CH₂—, —CH₂CH₂—, —(CH₂)₄—, —CH═CH—CH₂O—, —C₂F₄—, —CH₂CF₂—, —CF₂CH₂—, —CF═CF—, —CH═CF—, —CF═CH—, —CH═CH—, —C≡C— or a single bond, L¹ and L² each, independently of one another, denote F, Cl, CF₃ or CHF₂, p denotes 1 or 2, q denotes 1, 2, 3, 4, 5, 6, 7, 8, 9 or
 10. 2. Liquid-crystalline medium according to claim 1, characterised in that the medium comprises at least one compound of the formulae I-1 to I-20,

in which alkyl and alkyl* each, independently of one another, denote a straight-chain alkyl radical having 1-6 C atoms, alkenyl and alkenyl* each, independently of one another, denote a straight-chain alkenyl radical having 2-6 C atoms, alkoxy and alkoxy* each, independently of one another, denote a straight-chain alkoxy radical having 1-6 C atoms, and L¹ and L² each, independently of one another, denote F, Cl, CF₃ or CHF₂.
 3. Liquid-crystalline medium according to claim 1, characterised in that L¹ and L² in the formula I each denote F.
 4. Liquid-crystalline medium according to claim 1, characterised in that it comprises one or more compounds selected from the group of the compounds of the formulae ST-1, ST-2a, ST-3a, ST-3b, ST-8-1, ST-9-1, ST-12, ST-15, ST-16

where n=1, 2, 3, 4, 5, 6 or
 7. 5. Liquid-crystalline medium according to claim 1, characterised in that it additionally comprises one or more compounds selected from the group of the compounds of the formulae IIA, IIB and IIC,

in which R^(2A), R^(2B) and R^(2C) each, independently of one another, denote H, an alkyl or alkenyl radical having up to 15 C atoms which is un-substituted, monosubstituted by CN or CF₃ or at least monosubstituted by halogen, where, in addition, one or more CH₂ groups in these radicals may be replaced by —O—, —S—,

—C≡C—, —CF₂O—, —OCF₂—, —OC—O— or —O—CO— in such a way that O atoms are not linked directly to one another, L¹⁻⁴ each, independently of one another, denote F or Cl, Z² and Z^(2′) each, independently of one another, denote a single bond, —CH₂CH₂—, —CH═CH—, —CF₂O—, —OCF₂—, —CH₂O—, —O CH₂—, —COO—, —OCO—, —C₂F₄—, —CF═CF—, —CH═CHCH₂O—, p denotes 0, 1 or 2, q denotes 0 or 1, and v denotes 1 to
 6. 6. Liquid-crystalline medium according to claim 1, characterised in that the medium additionally comprises one or more compounds of the formula III,

in which R³¹ and R³² each, independently of one another, denote a straight-chain alkyl, alkoxyalkyl or alkoxy radical having up to 12 C atoms, and

Z³ denotes a single bond, —CH₂CH₂—, —CH═CH—, —CF₂O—, —OCF₂—, —CH₂O—, —OCH₂—, —COO—, —OCO—, —C₂F₄—, —C₄H₉—, —CF═CF—.
 7. Liquid-crystalline medium according to claim 1, characterised in that the medium additionally comprises one or more compounds of the formulae L-1 to L-11,

in which R, R¹ and R² each, independently of one another, denote H, an alkyl or alkenyl radical having up to 15 C atoms which is unsubstituted, monosubstituted by CN or CF₃ or at least monosubstituted by halogen, where, in addition, one or more CH₂ groups in these radicals may be replaced by —O—, —S—,

—C≡C—, —CF₂O—, —OCF₂—, —OC—O— or —O—CO— in such a way that O atoms are not linked directly to one another, and alkyl denotes an alkyl radical having 1-6 C atoms, and s denotes 1 or
 2. 8. Liquid-crystalline medium according to claim 1, characterised in that the medium additionally comprises one or more terphenyls of the formulae T-1 to T-21,

in which R denotes a straight-chain alkyl or alkoxy radical having 1-6 C atoms, and m denotes 1-6.
 9. Liquid-crystalline medium according to claim 1, characterised in that the medium additionally comprises one or more compounds of the formulae O-1 to O-18,

in which R¹ and R² each, independently of one another, denote H, an alkyl or alkenyl radical having up to 15 C atoms which is unsubstituted, monosubstituted by CN or CF₃ or at least monosubstituted by halogen, where, in addition, one or more CH₂ groups in these radicals may be replaced by —O—, —S—,

—C≡C—, —CF₂O—, —OCF₂—, —OC—O— or —O—CO— in such a way that O atoms are not linked directly to one another.
 10. Liquid-crystalline medium according to claim 1, characterised in that the medium additionally comprises one or more compounds selected from the group of the compounds of the formulae O-6, O-7 and O-17,

in which R¹ denotes alkyl or alkenyl having 1-6 or 2-6 C atoms respectively and R² denotes alkenyl having 2-6 C atoms.
 11. Liquid-crystalline medium according to claim 1, characterised in that the medium additionally comprises one or more indane compounds of the formula In,

in which R¹¹, R¹², R¹³ denote a straight-chain alkyl, alkoxy, alkoxyalkyl or alkenyl radical having 1-5 C atoms, R¹² and R¹³ additionally also denote halogen,

i denotes 0, 1 or
 2. 12. Liquid-crystalline medium according to claim 1, characterised in that the medium additionally comprises one or more compounds of the formulae BF-1 and BF-2,

in which R¹ and R² each, independently of one another, denote H, an alkyl or alkenyl radical having up to 15 C atoms which is unsubstituted, monosubstituted by CN or CF₃ or at least monosubstituted by halogen, where, in addition, one or more CH₂ groups in these radicals may be replaced by —O—, —S—,

—C≡C—, —CF₂O—, —OCF₂—, —OC—O— or —O—CO— in such a way that O atoms are not linked directly to one another, c denotes 0, 1 or 2 and d denotes 1 or
 2. 13. Liquid-crystalline medium according to claim 1, characterised in that the proportion of compounds of the formula I in the mixture as a whole is 1-40% by weight.
 14. Liquid-crystalline medium according to claim 1, characterised in that the medium comprises at least one polymerisable compound.
 15. Liquid-crystalline medium according to claim 1, characterised in that the medium comprises one or more additives.
 16. Liquid-crystalline medium according to claim 1, characterised in that the additive is selected from the group free-radical scavenger, antioxidant and/or UV stabiliser.
 17. Process for the preparation of a liquid-crystalline medium according to claim 1, characterised in that at least one compound of the formula I is mixed with at least one further liquid-crystalline compound, and optionally one or more additives and optionally at least one polymerisable compound are added.
 18. Use of the liquid-crystalline medium according to claim 1 in electro-optical displays.
 19. Electro-optical display having active-matrix addressing, characterised in that it contains, as dielectric, a liquid-crystalline medium according to claim
 1. 20. Electro-optical display according to claim 19, characterised in that it is a VA, PSA, PA-VA, SS-VA, SA-VA, PS-VA, PALC, IPS, PS-IPS, FFS, UB-FFS, U-IPS or PS-FFS display. 